Prosecution Insights
Prosecution Insights
Tech Center 3700 • Art Units: 1713 1718 1746 2893 3723
This examiner grants 41% of resolved cases
Joshua Nathaniel Pi Reyes is an examiner in Tech Center 3700, specifically Art Unit 1713, with 69 resolved cases. His allowance rate of 40.6% suggests a rigorous examination process where a majority of the applications do not reach a grant. This baseline rate indicates that applicants should be prepared for challenges during the prosecution of their patent applications.
The median days to allowance is 1363, which points toward a lengthy timeline for those cases that are eventually allowed. However, the data also highlights a high interview lift of 50.3%. This metric indicates that the probability of allowance increases significantly when an interview is conducted, suggesting that direct communication is a powerful tool for navigating this examiner's requirements and overcoming objections.
For the 69 resolved cases, the 50.3% interview lift is a vital strategic consideration. The 1363-day median duration underscores the need for proactive measures. Practitioners should prioritize interviews to take advantage of this high lift and potentially improve the 40.6% baseline allowance rate, making it a more favorable environment for their clients.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18774793 | METHOD AND SYSTEM FOR MONITORING SUBSTRATE PROCESSING APPARATUS | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18328298 | CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18421655 | APPARATUS FOR MANUFACTURING DISPLAY APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS | Non-Final OA | Samsung Display Co., Ltd. |
| 18452933 | REMOVING SCALE FROM A PIPELINE | Final Rejection | Saudi Arabian Oil Company |
| 18517837 | VAPOR PHASE PRECURSOR DELIVERY SYSTEM | Non-Final OA | ASM IP Holding B.V. |
| 18179187 | SEMICONDUCTOR PROCESSING SYSTEM WITH GAS LINE FOR TRANSPORTING EXCITED SPECIES AND RELATED METHODS | Non-Final OA | ASM IP HOLDING B.V. |
| 17840870 | SUSCEPTOR CLEANING | Non-Final OA | ASM IP Holding B.V. |
| 18037373 | MANUFACTURING EQUIPMENT OF LIGHT-EMITTING DEVICE | Final Rejection | Semiconductor Energy Laboratory Co., Ltd. |
| 17433693 | PLASMA PROCESSING APPARATUS | Final Rejection | Hitachi High-Tech Corporation |
| 18050155 | SUBSTRATE PROCESSING APPARATUS | Final Rejection | JUSUNG ENGINEERING CO., LTD. |
| 18800410 | HIGH POWER ELECTROSTATIC CHUCK WITH FEATURES PREVENTING HE HOLE LIGHT-UP/ARCING | Non-Final OA | Lam Research Corporation |
| 17915573 | EDGE RING FOR LOCALIZED DELIVERY OF TUNING GAS | Final Rejection | LAM RESEARCH CORPORATION |
| 17612536 | SHOWERHEAD INSERT FOR UNIFORMITY TUNING | Non-Final OA | Lam Research Corporation |
| 18775749 | CLEANING CHAMBER FOR METAL OXIDE REMOVAL | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18524955 | HYBRID SEAL FOR SEMICONDUCTOR PROCESSING CHAMBERS | Non-Final OA | Applied Materials, Inc. |
| 18228393 | CLUSTER PROCESSING SYSTEM FOR FORMING A METAL CONTAINING MATERIAL | Final Rejection | Applied Materials, Inc. |
| 18138733 | MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING | Final Rejection | Applied Materials, Inc. |
| 17455197 | RING FOR SUBSTRATE EXTREME EDGE PROTECTION | Non-Final OA | Applied Materials, Inc. |
| 17510111 | HORIZONTAL BUFFING MODULE | Final Rejection | Applied Materials, Inc. |
| 17156957 | METHODS AND APPARATUS FOR TUNING SEMICONDUCTOR PROCESSES | Final Rejection | APPLIED MATERIALS, INC. |
| 17064389 | MODULAR ZONE CONTROL FOR A PROCESSING CHAMBER | Final Rejection | Applied Materials, Inc. |
| 18372995 | SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 17848596 | PLASMA PROCESSING APPARATUS AND SUBSTRATE SUPPORT | Final Rejection | Tokyo Electron Limited |
| 17757781 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | Final Rejection | Tokyo Electron Limited |
| 18609531 | SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM | Non-Final OA | Kokusai Electric Corporation |
| 18198780 | SUBSTRATE PROCESSING APPARATUS | Non-Final OA | SEMES CO., LTD. |
| 17846166 | APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE | Non-Final OA | SEMES CO., LTD. |
| 17315322 | SUBSTRATE TREATING APPARATUS | Non-Final OA | SEMES CO., LTD. |
| 18584816 | BIAS SUPPLY WITH RESONANT SWITCHING | Non-Final OA | Advanced Energy Industries, Inc. |
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