Prosecution Insights
Last updated: October 01, 2026

Examiner: RICHARDS, NORMAN DREW

Tech Center 2800 • Art Units: 2800 2871 2872 2892 2895

This examiner grants 48% of resolved cases

Analysis

Norman Drew Richards serves in Tech Center 2800 and Art Unit 2800, with a history of 75 resolved cases. His allowance rate of 46.7 percent indicates a competitive environment where just under half of the applications result in a patent. This 46.7 percent rate suggests that the examiner maintains a strict standard for patentability.

The median days to allowance for his cases is 1216. This 1216 day period reflects the typical time required to navigate the prosecution process to a successful conclusion. With 75 resolved cases, the data provides a reliable benchmark for the duration of proceedings within this specific art unit.

An interview lift of 14.9 percent offers a tactical advantage for practitioners. This 14.9 percent boost suggests that direct dialogue can help clarify technical points and move the application closer to a grant. When facing the 46.7 percent baseline allowance rate, leveraging the 14.9 percent lift during the 1216 day prosecution cycle can be a vital part of an effective patent strategy.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

48.1%
Allow Rate
-19.9% vs TC avg
95
Total Applications
+14.8%
Interview Lift
1224
Avg Prosecution Days
Based on 77 resolved cases, 2023–2026

Rejection Statute Breakdown

0%
§101 Eligibility
28.2%
§102 Novelty
55.6%
§103 Obviousness
11.9%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
17692654 THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING SAME, DISPLAY PANEL AND DISPLAY DEVICE Non-Final OA BOE Technology Group Co., Ltd.
17806173 Semiconductor Devices and Methods of Making Same Final Rejection Georgia Tech Research Corporation
17789308 WIRING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME Non-Final OA NEC Corporation
17827356 HIGHLY CONFORMAL METAL ETCH IN HIGH ASPECT RATIO SEMICONDUCTOR FEATURES Non-Final OA Applied Materials, Inc.

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