Listed by the USPTO as RIDDLE, CHRISTINA A
Tech Center 3600 • Art Units: 1724 1754 2851 2882 3652
This examiner grants 81% of resolved cases
RIDDLE, CHRISTINA A is a USPTO patent examiner in tech center 3600 and art unit 1724. The profile records 940 resolved cases, an allowance rate of 81.0%, and a median of 1071 days to allowance. The large case record supports a substantial assessment of prosecution outcomes. The allowance rate indicates that most recorded matters reached allowance, while the median interval shows that favorable outcomes still require sustained prosecution effort.
The interview lift is 14.0%, suggesting that interviews have a meaningful but limited relationship to allowance outcomes in this record. ASML Holding N.V., Carl Zeiss SMT GmbH, and Gigaphoton Inc. are the listed leading companies. Studebaker Brackett PLLC, Pillsbury Winthrop Shaw Pittman, LLP, and CARTER, DELUCA & FARRELL LLP are the listed leading firms. Practitioners can combine disciplined written prosecution with selective interviews and plan around the 1071-day median.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19056497 | MEASURING METHOD, MEASURING APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD | Non-Final OA | CANON KABUSHIKI KAISHA |
| 19005395 | VIBRATION CONTROL OF STRUCTURAL ELEMENTS OF EXPOSURE APPARATUS | Non-Final OA | Nikon Corporation |
| 18933209 | SYSTEMS AND METHODS FOR MONITORING SPATIAL LIGHT MODULATOR (SLM) FLARE | Final Rejection | NIKON CORPORATION |
| 18353300 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND RECORDING MEDIUM | Final Rejection | Tokyo Electron Limited |
| 18397265 | CONSTRUCTING A SUBSTRATE TOPOLOGY MAP BASED ON MEASURED PROPERTIES | Non-Final OA | APPLIED MATERIALS, INC. |
| 19032570 | SYSTEM AND METHOD FOR DYNAMICALLY CONTROLLING TEMPERATURE OF THERMOSTATIC RETICLES | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18878055 | REPLICATION METHOD WITH A CONTACT BODY | Non-Final OA | Carl Zeiss Jena GmbH |
| 18376237 | APPARATUS AND METHOD FOR DETERMINING A CONDITION ASSOCIATED WITH A PELLICLE | Final Rejection | ASML HOLDING N.V |
| 19123378 | OPTICAL SYSTEM FOR METROLOGY | Non-Final OA | ASML NETHERLANDS B.V. |
| 19121669 | POSITION MEASUREMENT SYSTEM AND LITHOGRAPHIC APPARATUS | Non-Final OA | ASML Netherlands B.V. |
| 19121106 | METHOD AND APPARATUS FOR INSPECTION FOCUS MEASUREMENT | Non-Final OA | ASML NETHERLANDS B.V. |
| 18875601 | A PATTERNING DEVICE VOLTAGE BIASING SYSTEM FOR USE IN EUV LITHOGRAPHY | Final Rejection | ASML Netherlands B.V. |
| 18868802 | SENSOR MODULE, ILLUMINATOR, METROLOGY DEVICE AND ASSOCIATED METROLOGY METHOD | Final Rejection | ASML Netherlands B.V. |
| 18869149 | A RADIATION SOURCE | Final Rejection | ASML Netherlands B.V. |
| 18726728 | A PELLICLE CLEANING SYSTEM | Final Rejection | ASML NETHERLANDS B.V. |
| 18251261 | CONDITIONING APPARATUS AND METHOD | Final Rejection | ASML Netherlands B.V. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy81.0% of resolved applications examined by Christina A Riddle were allowed (940 resolved cases), compared with 63.2% across Art Unit 1724 over the last five years.
This examiner's interview lift is +14.0 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Christina A Riddle took 1,071 days on average from filing to allowance.
Christina A Riddle examines applications in Art Unit 1724 in Tech Center 3600 (Transportation, E-Commerce & Mechanical Systems).
