Listed by the USPTO as RONO, VINCENT KIPKEMOI
Tech Center 2800 • Art Units: 2891
This examiner grants 85% of resolved cases
RONO, VINCENT KIPKEMOI works in tech center 2800 and art unit 2891. The record contains 20 resolved cases, an 85.0% allowance rate, and a median of 1397 days to allowance. The 18.8% interview lift indicates a positive association between interviews and allowance outcomes, but the small case history warrants caution in relying on the pattern.
The listed companies are Taiwan Semiconductor Manufacturing Company, Ltd., Sony Group Corporation, and Avago Technologies International Sales Pte. Limited. The listed firms are BIRCH STEWART KOLASCH & BIRCH, LLP, CHIP LAW GROUP, and J.C. PATENTS. The median timing remains relevant for planning, while the limited record supports using these figures as directional rather than conclusive guidance.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18844268 | SOLID-STATE IMAGING DEVICE | Non-Final OA | SONY SEMICONDUCTOR SOLUTIONS CORPORATION |
| 17875647 | SMALLER MODULE BY STACKING | Final Rejection | Avago Technologies International Sales Pte. Limited |
| 17929584 | DUAL SIDED MOLDED PACKAGE WITH VARYING INTERCONNECT PAD SIZES AND UNIFORM EXPOSED SOLDERABLE AREA | Non-Final OA | Skyworks Solutions, Inc. |
| 18098547 | SUBSTRATE MODIFICATION FOR SUPERLATTICE CRITICAL THICKNESS IMPROVEMENT | Non-Final OA | Applied Materials, Inc. |
| 18178522 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18152938 | SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING THE SAME | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 17691359 | SEMICONDUCTOR DEVICE STRUCTURE WITH GLUE LAYER AND METHOD FOR FORMING THE SAME | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18738774 | SEMICONDUCTOR PACKAGE AND METHOD FOR FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18422057 | Spin-Orbit Torque Material and Device, and Use of Delafossite Oxide Thin Film | Final Rejection | Tsinghua University |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy85.0% of resolved applications examined by Vincent Kipkemoi Rono were allowed (20 resolved cases), compared with 69.5% across Art Unit 2891 over the last five years.
This examiner's interview lift is +18.8 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Vincent Kipkemoi Rono took 1,397 days on average from filing to allowance.
Vincent Kipkemoi Rono examines applications in Art Unit 2891 in Tech Center 2800 (Semiconductors, Circuits & Optics).
