Listed by the USPTO as SEHAR, FAKEHA
Tech Center 2800 • Art Units: 2893
This examiner grants 83% of resolved cases
SEHAR, FAKEHA is assigned to Tech Center 2800 and art unit 2893. The examiner has 104 resolved cases, an 82.7% allowance rate, and a 19.3% interview lift. The median time to allowance is 1141 days, showing that favorable allowance outcomes may still require extended prosecution activity.
The listed companies are Taiwan Semiconductor Manufacturing Company, Ltd., Samsung Display Co., Ltd., and Texas Instruments Incorporated. The listed firms are Harrity & Harrity, LLP, Womble Bond Dickinson US LLP, and ARENTFOX SCHIFF LLP - New York. Applicants may benefit from combining interview requests with disciplined written responses and clear amendment support.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18769794 | IMAGE SENSOR | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18661996 | DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME | Non-Final OA | SAMSUNG DISPLAY CO., LTD. |
| 17871550 | DISPLAY APPARATUS | Non-Final OA | Samsung Display Co., Ltd. |
| 17837484 | DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME | Final Rejection | SAMSUNG DISPLAY CO., LTD. |
| 17491918 | DISPLAY PANEL | Non-Final OA | Samsung Display Co., Ltd. |
| 18045683 | OPTICAL DEVICES WITH LATERAL CURRENT INJECTION | Non-Final OA | GOOGLE LLC |
| 17486674 | ELECTROLUMINESCENT ELEMENT, DISPLAY PANEL AND DISPLAY DEVICE | Non-Final OA | BOE Technology Group Co., Ltd. |
| 17129854 | METAL INSULATOR METAL (MIM) CAPACITOR WITH PEROVSKITE DIELECTRIC | Final Rejection | Intel Corporation |
| 18499871 | METAL SENSE LINE CONTACT | Final Rejection | Micron Technology, Inc. |
| 18033847 | LIGHT-EMITTING ELEMENT, DISPLAY DEVICE AND LIGHT-EMITTING ELEMENT MANUFACTURING METHOD | Non-Final OA | SHARP KABUSHIKI KAISHA |
| 18666087 | SEMICONDUCTOR DEVICE, MATCHING CIRCUIT, AND FILTERING CIRCUIT | Non-Final OA | Murata Manufacturing Co., Ltd. |
| 18498126 | DIRECT COPPER WIRE BONDING ON NANOTWIN COPPER STRUCTURES | Final Rejection | TEXAS INSTRUMENTS INCORPORATED |
| 17590697 | TEMPERATURE-BASED SEMICONDUCTOR WAFER SINGULATION | Final Rejection | TEXAS INSTRUMENTS INCORPORATED |
| 18279809 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND PLASMA PROCESSING METHOD | Final Rejection | Hitachi High-Tech Corporation |
| 17730896 | SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR MEMORY DEVICE | Non-Final OA | SK hynix Inc. |
| 18785024 | SEMICONDUCTOR DEVICE AND METHODS OF FORMATION | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18770166 | SEMICONDUCTOR STRUCTURE WITH DIELECTRIC FEATURE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18469014 | THERMAL DISSIPATION IN SEMICONDUCTOR DEVICES | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18152157 | SEMICONDUCTOR DEVICE AND FABRICATING METHOD THEREOF | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18788591 | SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURE | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18786531 | GATE STRUCTURES IN TRANSISTORS AND METHOD OF FORMING SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18761640 | NANOSTRUCTURE FIELD-EFFECT TRANSISTOR DEVICE AND METHODS OF FORMING | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18779006 | THIN FILM TRANSISTOR INCLUDING A COMPOSITIONALLY-MODULATED ACTIVE REGION AND METHODS FOR FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company Limited |
| 17650312 | SEMICONDUCTOR DEVICE AND METHODS OF FORMATION | Non-Final OA | Taiwan Semiconductor Manufacturing Company Limited |
| 18632181 | LIGHT IRRADIATION TYPE HEAT TREATMENT METHOD | Final Rejection | SCREEN Holdings Co., Ltd. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy82.7% of resolved applications examined by Fakeha Sehar were allowed (104 resolved cases), compared with 79.0% across Art Unit 2893 over the last five years.
This examiner's interview lift is +19.3 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Fakeha Sehar took 1,141 days on average from filing to allowance.
Fakeha Sehar examines applications in Art Unit 2893 in Tech Center 2800 (Semiconductors, Circuits & Optics).
