Listed by the USPTO as SULLIVAN, CALEEN O
Tech Center 2800 • Art Units: 1722 1795 2812 2896 2899
This examiner grants 89% of resolved cases
SULLIVAN, CALEEN O works in tech center 2800 and art unit 1722. The record includes 1146 resolved cases, an allowance rate of 88.7%, and a median of 763 days to allowance. The large case record gives the favorable allowance outcome substantial support, while the median indicates a comparatively shorter path to allowance within the available data. These figures can inform portfolio timing and response planning.
Interviews are associated with an 11.4% lift, indicating a limited positive measure in the record. Fujifilm Corporation, Shin-Etsu Chemical Co., Ltd., and Applied Materials Inc. are the listed companies. Knobbe, Martens, Olson & Bear, LLP, GREENBLUM & BERNSTEIN, P.L.C., and JCIPRNET are the listed firms with recorded experience before this examiner.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18603775 | METHOD FOR INSPECTING TREATMENT LIQUID AND METHOD FOR PRODUCING TREATMENT LIQUID | Non-Final OA | FUJIFILM Corporation |
| 18584952 | PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING CIRCUIT WIRING, AND METHOD FOR MANUFACTURING TOUCH PANEL | Non-Final OA | FUJIFILM Corporation |
| 18418331 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Non-Final OA | FUJIFILM Corporation |
| 18418023 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, RESIN, AND METHOD FOR MANUFACTURING RESIN | Non-Final OA | FUJIFILM Corporation |
| 18268340 | METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND EXPOSURE APPARATUS | Non-Final OA | NIKON CORPORATION |
| 18617380 | MULTIPATTERNING WITH CROSSLINKABLE OVERCOAT | Non-Final OA | Tokyo Electron Limited |
| 18498698 | ENDPOINT DETECTION IN DRY DEVELOPMENT OF PHOTORESIST | Non-Final OA | Tokyo Electron Limited |
| 18598857 | ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18205125 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18630544 | PHOTO-PATTERNABLE LATENT-CHEMISTRY INORGANIC MATERIALS | Non-Final OA | Meta Platforms Technologies, LLC |
| 18765710 | ADVANCED-PACKAGING HIGH-VOLUME-MODE DIGITAL-LITHOGRAPHY-TOOL | Non-Final OA | Applied Materials, Inc. |
| 18581290 | EUV SENSITIVE METAL OXIDE MATERIAL AS UNDERLAYER FOR THIN CAR TO IMPROVE PATTERN TRANSFER | Non-Final OA | Applied Materials, Inc. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy88.7% of resolved applications examined by Caleen O Sullivan were allowed (1,146 resolved cases), compared with 60.4% across Art Unit 1722 over the last five years.
This examiner's interview lift is +11.4 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Caleen O Sullivan took 763 days on average from filing to allowance.
Caleen O Sullivan examines applications in Art Unit 1722 in Tech Center 2800 (Semiconductors, Circuits & Optics).
