Listed by the USPTO as TADAYYON ESLAMI, TABASSOM
Tech Center 2800 • Art Units: 1712 1715 1718 1784 1792 2818
This examiner grants 49% of resolved cases
TADAYYON ESLAMI, TABASSOM works in Tech Center 2800 and art unit 1712. Across 805 resolved cases, the profile shows a 49.4% allowance rate and a 26.4% interview lift. The median time to allowance is 1274 days. The allowance figure supports careful claim and response planning, while interviews appear to offer a meaningful avenue for improving prosecution outcomes.
The leading companies are ASM IP Holding B.V., Lam Research Corporation, and Tokyo Electron Limited. The listed firms are Snell & Wilmer (ASM IP Holding B.V.), HAUPTMAN HAM, LLP, and Alleman Hall LLP. The client and counsel mix provides a semiconductor equipment context for practitioners evaluating this docket.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19180592 | SUBSTRATE PROCESSING METHOD | Non-Final OA | ASM IP Holding B.V. |
| 18596144 | REACTANT VAPORIZER AND RELATED SYSTEMS AND METHODS | Final Rejection | ASM IP Holding B.V. |
| 18530444 | SUBSTRATE PROCESSING SYSTEM | Non-Final OA | ASM IP Holding B.V. |
| 18234549 | METHOD OF FORMING MATERIAL WITHIN A RECESS | Final Rejection | ASM IP Holding B.V. |
| 18214656 | METHOD OF FORMING P-TYPE DOPED SILICON-GERMANIUM LAYERS AND SYSTEM FOR FORMING SAME | Non-Final OA | ASM IP Holding B.V. |
| 18818999 | Electrode Coating Apparatus and Electrode Coating Method | Non-Final OA | LG Energy Solution, Ltd. |
| 19207361 | ELECTRODE SHEET PROCESSING METHOD AND ELECTRODE SHEET MANUFACTURING DEVICE | Non-Final OA | JTEKT CORPORATION |
| 19124236 | SELECTIVE MOLYBDENUM FILL | Final Rejection | Lam Research Corporation |
| 18856864 | LATERAL GAP FILL | Final Rejection | Lam Research Corporation |
| 18854240 | NONCONFORMAL OXIDE FILM DEPOSITION USING CARBON-CONTAINING INHIBITOR | Final Rejection | Lam Research Corporation |
| 18840453 | THERMAL FILM DEPOSITION | Non-Final OA | Lam Research Corporation |
| 19035837 | MANUFACTURING METHOD OF MOLDED BODY FOR SHEET-LIKE ELECTRODE | Final Rejection | KYOCERA CORPORATION |
| 18684088 | FILM FORMING METHOD AND FILM FORMING APPARATUS | Final Rejection | TOKYO ELECTRON LIMITED |
| 18857016 | FILM-FORMING METHOD AND SUBSTRATE-PROCESSING DEVICE | Final Rejection | Tokyo Electron Limited |
| 18561503 | METHOD FOR MANUFACTURING CONDUCTIVE PIGMENT PASTE | Non-Final OA | KANSAI PAINT CO., LTD. |
| 18980063 | HYDROGEN ADDITION TO LOW-K DIELECTRIC BARRIER FILMS | Non-Final OA | Applied Materials, Inc. |
| 18412071 | DEPOSITION TOOL WITH DIELECTRIC COATED CHAMBER SIDEWALLS TO IMPROVE ELECTROMANGNETIC FIELD UNIFORMITY | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18896017 | METHOD FOR MANUFACTURING MAGNETIC RECORDING MEDIUM AND HEAT TREATMENT APPARATUS USED THEREFOR | Non-Final OA | Resonac Corporation |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy49.4% of resolved applications examined by Tabassom Tadayyon Eslami were allowed (805 resolved cases), compared with 43.3% across Art Unit 1712 over the last five years.
This examiner's interview lift is +26.4 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Tabassom Tadayyon Eslami took 1,274 days on average from filing to allowance.
Tabassom Tadayyon Eslami examines applications in Art Unit 1712 in Tech Center 2800 (Semiconductors, Circuits & Optics).
