Prosecution Insights
Last updated: October 02, 2026

Examiner: TRAYWICK, ANDREW PRESTON

Tech Center 4100 • Art Units: 1737 2899 4100

This examiner grants 72% of resolved cases

Analysis

Andrew Preston Traywick is an examiner in Art Unit 1737 within Tech Center 4100. He has overseen 127 resolved cases, resulting in an allowance rate of 71.7%. This rate indicates a generally accessible path to allowance for applications under his review. However, the median days to allowance of 1152 suggests that the prosecution process may be lengthy and requires a sustained effort from applicants.

The data shows an interview lift pct of 27.3%, which provides a clear incentive for practitioners to engage in direct dialogue with the examiner. For the applications resolved, the examiner has established a predictable pattern where interviews significantly improve the chances of a grant. The 71.7% allowance rate serves as a positive baseline for applicants in Tech Center 4100, provided they are prepared for the timeline.

Counsel should account for the 1152 days median timeline when setting client expectations for their applications. While the 27.3% interview lift pct is a valuable tool for overcoming obstacles, the overall volume of 127 resolved cases suggests a focused but thorough examination style. Navigating Art Unit 1737 with this examiner involves balancing the high allowance probability against the extended pendency to achieve a successful outcome.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

71.7%
Allow Rate
+11.7% vs TC avg
166
Total Applications
+27.3%
Interview Lift
1152
Avg Prosecution Days
Based on 127 resolved cases, 2023–2026

Rejection Statute Breakdown

0%
§101 Eligibility
18.3%
§102 Novelty
61.5%
§103 Obviousness
12.5%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18615901 METHOD FOR FABRICATING MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
18185115 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE Non-Final OA FUJIFILM Corporation
17813704 PHOTOSENSITIVE RESIN COMPOSITION, SHAPED PRODUCT, METHOD FOR MANUFACTURING SHAPED PRODUCT AND METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD Final Rejection CANON KABUSHIKI KAISHA
18147535 METHODS, SYSTEMS, APPARATUS, AND ARTICLES OF MANUFACTURE TO PRODUCE INTEGRATED CIRCUIT PACKAGES HAVING SILICON NITRIDE ADHESION PROMOTERS Non-Final OA Intel Corporation
18687180 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PRINTED CIRCUIT BOARD, AND METHOD FOR MANUFACTURING PRINTED CIRCUIT BOARD Non-Final OA Resonac Corporation
18415986 Extreme Ultraviolet (EUV) Mask and Method of Fabrication Thereof Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18174732 INDIUM BASED SOL-GEL OXIDE PRECURSOR FILMS AS EXTREME ULTRAVIOLET AND LOW-ENERGY ELECTRON BEAM RESISTS Final Rejection Board of Regents, The University of Texas System
18539218 THREE-DIMENSIONAL NANOLITHOGRAPHY SYSTEMS AND METHODS Non-Final OA Purdue Research Foundation
18699225 RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT Non-Final OA TOKYO OHKA KOGYO CO., LTD.
18190803 PHOTORESIST STRIPPER AND METHOD OF TREATING SUBSTRATE USING SAME Non-Final OA TOKYO OHKA KOGYO CO., LTD.
18176900 METHOD FOR PRODUCING WIRING CIRCUIT BOARD Final Rejection NITTO DENKO CORPORATION
17783206 METHOD FOR PRODUCING WIRING CIRCUIT BOARD Final Rejection NITTO DENKO CORPORATION
18358150 Onium Salt, Acid Diffusion Inhibitor, Resist Composition, And Patterning Process Non-Final OA SHIN-ETSU CHEMICAL CO., LTD.
18321897 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS Non-Final OA Shin-Etsu Chemical Co., Ltd.
17984448 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS Final Rejection Shin-Etsu Chemical Co., Ltd.
18190207 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Non-Final OA Sumitomo Chemical Company, Limited
18124180 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Non-Final OA SUMITOMO CHEMICAL COMPANY, LIMITED
17977185 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Non-Final OA SUMITOMO CHEMICAL COMPANY, LIMITED
17896138 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Final Rejection SUMITOMO CHEMICAL COMPANY, LIMITED
18025989 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN Final Rejection JSR CORPORATION

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