Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1737
This examiner grants 72% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 17440387 | PHOTO-PATTERNABLE CROSS-BRED ORGANIC SEMICONDUCTOR POLYMERS FOR ORGANIC THIN-FILM TRANSISTORS | Non-Final OA | Corning Incorporated |
| 18023039 | PHOTOSENSITIVE STRUCTURE FOR FLEXOGRAPHIC PRINTING PLATE AND METHOD FOR PRODUCING FLEXOGRAPHIC PRINTING PLATE | Final Rejection | ASAHI KASEI KABUSHIKI KAISHA |
| 17813704 | PHOTOSENSITIVE RESIN COMPOSITION, SHAPED PRODUCT, METHOD FOR MANUFACTURING SHAPED PRODUCT AND METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD | Non-Final OA | CANON KABUSHIKI KAISHA |
| 17646108 | PHOTOCURABLE COMPOSITION WITH ENHANCED THERMAL STABILITY | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18358150 | Onium Salt, Acid Diffusion Inhibitor, Resist Composition, And Patterning Process | Non-Final OA | SHIN-ETSU CHEMICAL CO., LTD. |
| 18103733 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | Final Rejection | Shin-Etsu Chemical Co., Ltd. |
| 17984366 | RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | Final Rejection | SHIN-ETSU CHEMICAL CO., LTD. |
| 17852692 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18174732 | INDIUM BASED SOL-GEL OXIDE PRECURSOR FILMS AS EXTREME ULTRAVIOLET AND LOW-ENERGY ELECTRON BEAM RESISTS | Non-Final OA | Board of Regents, The University of Texas System |
| 18190207 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Final Rejection | Sumitomo Chemical Company, Limited |
| 18124180 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Final Rejection | SUMITOMO CHEMICAL COMPANY, LIMITED |
| 17977185 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Non-Final OA | SUMITOMO CHEMICAL COMPANY, LIMITED |
| 18324450 | COMPOUNDS, MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | Non-Final OA | DuPont Electronic Materials International, LLC |
| 17633856 | COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND, AS WELL AS METHOD FOR PRODUCING IODINE-CONTAINING VINYL POLYMER AND ACETYLATED DERIVATIVE THEREOF | Non-Final OA | Mitsubishi Gas Chemical Company, Inc. |
| 18190714 | NEGATIVE-TONE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | Final Rejection | TOKYO OHKA KOGYO CO., LTD. |
| 18233932 | ADDITIVES FOR METAL OXIDE PHOTORESISTS, POSITIVE TONE DEVELOPMENT WITH ADDITIVES, AND DOUBLE BAKE DOUBLE DEVELOP PROCESSING | Non-Final OA | JSR Corporation |
| 18025989 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | Final Rejection | JSR CORPORATION |
| 18024309 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | Final Rejection | JSR CORPORATION |
| 17922867 | PHOTOSENSITIVE FILM, PHOTOSENSITIVE ELEMENT, AND METHOD FOR PRODUCING LAMINATE | Non-Final OA | Showa Denko Materials Co., Ltd. |
| 18009628 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT THEREOF, AND WIRING STRUCTURE CONTAINING CURED PRODUCT | Final Rejection | NAMICS CORPORATION |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy