Tech Center 4100 • Art Units: 1737 2899 4100
This examiner grants 72% of resolved cases
Andrew Preston Traywick is an examiner in Art Unit 1737 within Tech Center 4100. He has overseen 127 resolved cases, resulting in an allowance rate of 71.7%. This rate indicates a generally accessible path to allowance for applications under his review. However, the median days to allowance of 1152 suggests that the prosecution process may be lengthy and requires a sustained effort from applicants.
The data shows an interview lift pct of 27.3%, which provides a clear incentive for practitioners to engage in direct dialogue with the examiner. For the applications resolved, the examiner has established a predictable pattern where interviews significantly improve the chances of a grant. The 71.7% allowance rate serves as a positive baseline for applicants in Tech Center 4100, provided they are prepared for the timeline.
Counsel should account for the 1152 days median timeline when setting client expectations for their applications. While the 27.3% interview lift pct is a valuable tool for overcoming obstacles, the overall volume of 127 resolved cases suggests a focused but thorough examination style. Navigating Art Unit 1737 with this examiner involves balancing the high allowance probability against the extended pendency to achieve a successful outcome.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18615901 | METHOD FOR FABRICATING MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18185115 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Non-Final OA | FUJIFILM Corporation |
| 17813704 | PHOTOSENSITIVE RESIN COMPOSITION, SHAPED PRODUCT, METHOD FOR MANUFACTURING SHAPED PRODUCT AND METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD | Final Rejection | CANON KABUSHIKI KAISHA |
| 18147535 | METHODS, SYSTEMS, APPARATUS, AND ARTICLES OF MANUFACTURE TO PRODUCE INTEGRATED CIRCUIT PACKAGES HAVING SILICON NITRIDE ADHESION PROMOTERS | Non-Final OA | Intel Corporation |
| 18687180 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PRINTED CIRCUIT BOARD, AND METHOD FOR MANUFACTURING PRINTED CIRCUIT BOARD | Non-Final OA | Resonac Corporation |
| 18415986 | Extreme Ultraviolet (EUV) Mask and Method of Fabrication Thereof | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18174732 | INDIUM BASED SOL-GEL OXIDE PRECURSOR FILMS AS EXTREME ULTRAVIOLET AND LOW-ENERGY ELECTRON BEAM RESISTS | Final Rejection | Board of Regents, The University of Texas System |
| 18539218 | THREE-DIMENSIONAL NANOLITHOGRAPHY SYSTEMS AND METHODS | Non-Final OA | Purdue Research Foundation |
| 18699225 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | Non-Final OA | TOKYO OHKA KOGYO CO., LTD. |
| 18190803 | PHOTORESIST STRIPPER AND METHOD OF TREATING SUBSTRATE USING SAME | Non-Final OA | TOKYO OHKA KOGYO CO., LTD. |
| 18176900 | METHOD FOR PRODUCING WIRING CIRCUIT BOARD | Final Rejection | NITTO DENKO CORPORATION |
| 17783206 | METHOD FOR PRODUCING WIRING CIRCUIT BOARD | Final Rejection | NITTO DENKO CORPORATION |
| 18358150 | Onium Salt, Acid Diffusion Inhibitor, Resist Composition, And Patterning Process | Non-Final OA | SHIN-ETSU CHEMICAL CO., LTD. |
| 18321897 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 17984448 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | Final Rejection | Shin-Etsu Chemical Co., Ltd. |
| 18190207 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Non-Final OA | Sumitomo Chemical Company, Limited |
| 18124180 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Non-Final OA | SUMITOMO CHEMICAL COMPANY, LIMITED |
| 17977185 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Non-Final OA | SUMITOMO CHEMICAL COMPANY, LIMITED |
| 17896138 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Final Rejection | SUMITOMO CHEMICAL COMPANY, LIMITED |
| 18025989 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | Final Rejection | JSR CORPORATION |
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