Tech Center 1700 • Art Units: 1715 1716 1717 1718 1759 1781 1792
This examiner grants 47% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18496021 | EVAPORATION MASK AND MANUFACTURING METHOD THEREOF | Non-Final OA | WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD. |
| 18096336 | Customized Thin Film Optical Element Fabrication System and Method | Non-Final OA | Halliburton Energy Services, Inc. |
| 18736838 | PULSE-MANAGED PLASMA METHOD FOR COATING ON INTERNAL SURFACES OF WORKPIECES | Non-Final OA | PRATT & WHITNEY CANADA CORP. |
| 18234937 | DEPOSITION APPARATUS | Final Rejection | Samsung Display Co., LTD. |
| 18991699 | FIBERBOARD STRUCTURE MANUFACTURING METHOD, FIBERBOARD STRUCTURE MANUFACTURING SYSTEM, AND FIBERBOARD STRUCTURE | Final Rejection | FUJIFILM Corporation |
| 18689523 | Electrode Manufacturing Apparatus | Non-Final OA | LG ENERGY SOLUTION, LTD. |
| 18273448 | Manufacturing Apparatus Of Electrode For Secondary Battery | Final Rejection | LG Energy Solution, Ltd. |
| 18925862 | METHOD AND SYSTEM FOR DEPOSITING METAL PHOSPHIDE | Non-Final OA | ASM IP Holding B.V. |
| 18494430 | VAPOR PHASE PRECURSOR DELIVERY SYSTEM | Final Rejection | ASM IP Holding B.V. |
| 18205766 | METHODS AND APPARATUSES FOR FLOWABLE GAP FILL | Final Rejection | ASM IP Holding B.V. |
| 19017876 | METHOD FOR ELECTROCATALYTIC REDUCTION OF CARBON DIOXIDE | Non-Final OA | KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS |
| 18401087 | HYDROPHOBIC-ICEPHOBIC ORGANOSILANE COMPOSITIONS, COATINGS, AND METHODS | Final Rejection | The Boeing Company |
| 18649125 | COATING MACHINE | Final Rejection | ABB SCHWEIZ AG |
| 18185161 | ROBOT FOR COATING VEHICLE BODY | Non-Final OA | ABB Schweiz AG |
| 17516139 | ADVANCED PRECURSORS FOR SELECTIVE ATOMIC LAYER DEPOSITION USING SELF-ASSEMBLED MONOLAYERS | Final Rejection | The Board of Trustees of the Leland Stanford Junior University |
| 17132215 | METHOD FOR METAL VAPOR INFILTRATION OF CMC PARTS AND ARTICLES CONTAINING THE SAME | Non-Final OA | RTX Corporation |
| 18264649 | METHOD OF PRODUCING A WATER REPELLENT COATING ONTO TEXTILE SUBSTRATES USING A PLASMA GENERATED BY HOLLOW CATHODES | Non-Final OA | AGC GLASS EUROPE |
| 17847372 | REVERSIBLE NOZZLE IN ULTRASONIC ATOMIZER FOR CLOG PREVENTION | Non-Final OA | Ford Motor Company |
| 16606055 | Nanowire-Mesh Templated Growth of Out-of-Plane Three-Dimensional Fuzzy Graphene | Non-Final OA | CARNEGIE MELLON UNIVERSITY |
| 18788717 | DEPOSITION APPARATUS AND METHOD WITH EM RADIATION | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18188929 | PRE-TREATMENT APPARATUS | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 17750145 | SYSTEM AND METHOD FOR PLASMA ENHANCED ATOMIC LAYER DEPOSITION WITH PROTECTIVE GRID | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 19175364 | METHODS OF OPERATING A SPATIAL DEPOSITION TOOL | Non-Final OA | Applied Materials, Inc. |
| 18635639 | SEMICONDUCTOR DEVICE PATTERNING METHODS | Final Rejection | Applied Materials, Inc. |
| 18377316 | METAL MASK STRUCTURE | Final Rejection | Darwin Precisions Corporation |
| 18917538 | FILM FORMING METHOD | Non-Final OA | Tokyo Electron Limited |
| 17820962 | FILM FORMING METHOD AND FILM FORMING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 17753886 | GAS SUPPLY DEVICE AND GAS SUPPLY METHOD | Non-Final OA | Tokyo Electron Limited |
| 18932057 | METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM | Non-Final OA | Kokusai Electric Corporation |
| 18927145 | METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, RECORDING MEDIUM, AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | KOKUSAI ELECTRIC CORPORATION |
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