Tech Center 2800 • Art Units: 1712 1715 1764 1787 1792 2875
This examiner grants 61% of resolved cases
Robert A. Vetere is an examiner in Art Unit 1712 within Tech Center 2800. The examiner has a total of 901 resolved cases. The data shows an allowance rate of 61.4% for these applications. This 61.4% rate provides a baseline for applicants to evaluate their chances of securing a patent grant. The 901 resolved cases indicate a consistent record of examination within this specific art unit.
The median days to allowance for successful cases is 1322. This 1322-day figure represents the typical duration of the prosecution cycle from filing to grant. An important metric in this profile is the 12.9% interview lift. This 12.9% lift shows that the likelihood of an allowance increases when an interview is conducted with the examiner. Practitioners should consider the 12.9% lift as a reason to engage in verbal discussion to address rejections. The 1322-day median pendency and the 61.4% allowance rate are key factors for strategic planning. By leveraging the 12.9% interview lift, applicants may find a more effective path to allowance than through written responses alone.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18949297 | METHODS AND COMPOSITIONS FOR MINIMIZING X-RAY SCATTERING ARTIFACTS | Final Rejection | University of Florida Research Foundation, Inc. |
| 18621273 | SUBSTRATE SUPPORT APPARATUS AND SUBSTRATE PROCESSING APPARATUS HAVING THE SAME | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 17965029 | APPARATUS AND METHOD FOR MANUFACTURING DISPLAY APPARATUS | Final Rejection | Samsung Display Co., Ltd. |
| 18808261 | TRANSPARENT MEMBER AND IMAGE PICKUP APPARATUS, AND METHOD OF MANUFACTURING TRANSPARENT MEMBER | Final Rejection | CANON KABUSHIKI KAISHA |
| 18706228 | Process for the Pulsed Laser Ejection of Multiple Epitaxial Structures from one Thin Film Growth | Non-Final OA | The Board of Trustees of the Leland Stanford Junior University |
| 18139121 | HALIDE AND ORGANIC PRECURSORS FOR METAL DEPOSITION | Non-Final OA | Applied Materials, Inc. |
| 18999454 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 19033687 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | KOKUSAI ELECTRIC CORPORATION |
| 19243830 | METHOD FOR PREPARING PIXEL DEFINE LAYER | Non-Final OA | DUK SAN NEOLUX CO., LTD. |
| 18039875 | METHOD OF TRANSFERRING PARTICLES TO A COATING SURFACE | Final Rejection | 3M INNOVATIVE PROPERTIES COMPANY |
| 17651506 | POWDER COATING COMPOSITION | Non-Final OA | SWIMC LLC |
| 18784997 | BINDER FOR MOLDING CASTING MOLD AND COMPOSITION FOR MOLDING CASTING MOLD | Non-Final OA | SINTOKOGIO, LTD. |
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