Listed by the USPTO as WALL, VINCENT
Tech Center 2800 • Art Units: 2816 2822 2838 2893 2898
This examiner grants 63% of resolved cases
WALL, VINCENT is assigned to Tech Center 2800 and Art Unit 2816, with 828 resolved cases. The allowance rate is 62.6%, and the median time to allowance is 1016 days. Interview lift is 24.4%, indicating a meaningful positive association between interviews and allowance outcomes.
Taiwan Semiconductor Manufacturing Company, Ltd., Intel Corporation, and Semiconductor Energy Laboratory Co., Ltd. are the leading companies. Akona IP PC - Intel, OBLON, MCCLELLAND, MAIER & NEUSTADT, L.L.P., and BIRCH STEWART KOLASCH & BIRCH, LLP are the leading firms. Interview preparation may improve prosecution prospects where technical distinctions are central.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18255760 | VERTICAL POWER TRANSISTOR | Non-Final OA | Robert Bosch GmbH |
| 18763799 | DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME | Non-Final OA | Samsung Display Co., LTD. |
| 18707097 | LIGHT EMISSION DEVICE AND IMAGE DISPLAY APPARATUS | Non-Final OA | SONY GROUP CORPORATION |
| 18594551 | SEMICONDUCTOR DEVICE AND SEMICONDUCTOR CIRCUIT | Final Rejection | Toshiba Electronic Devices & Storage Corporation |
| 18540329 | METHODS FOR FORMING MULTILAYER STRUCTURES ON A SUBSTRATE AND RELATED MULTILAYER STRUCTURES | Final Rejection | ASM IP Holding B.V. |
| 18390103 | METHOD FOR MANUFACTURING A PHASE CHANGE MEMORY DEVICE | Non-Final OA | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES |
| 18338404 | MEMORY WITH ONE ACCESS TRANSISTOR COUPLED TO MULTIPLE CAPACITORS | Non-Final OA | Intel Corporation |
| 18089945 | TRANSISTOR INCLUDING WIDE BAND GAP MATERIALS | Final Rejection | Intel Corporation |
| 18064362 | MULTI-PITCH PATTERNING THROUGH ONE-STEP FLOW | Final Rejection | Intel Corporation |
| 18213311 | COMPOSITE OXIDE SEMICONDUCTOR AND METHOD FOR MANUFACTURING THE SAME | Final Rejection | Semiconductor Energy Laboratory Co., Ltd. |
| 18448703 | SEMICONDUCTOR DEVICE | Non-Final OA | Kioxia Corporation |
| 18503801 | ELECTRONIC COMPONENT AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT | Final Rejection | Murata Manufacturing Co., Ltd. |
| 18148658 | INTERLEAVED HIGH SIDE AND LOW SIDE POWER TRANSISTORS WITH VARIABLE FINGER SPACING | Non-Final OA | TEXAS INSTRUMENTS INCORPORATED |
| 18647687 | SEMICONDUCTOR DEVICE INCLUDING ELECTRODE AND ISOLATION PATTERN AND METHOD OF FORMING THE SAME | Non-Final OA | SK hynix Inc. |
| 18430647 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | Non-Final OA | SK hynix Inc. |
| 18366938 | THIN FILM TRANSISTOR AND METHOD OF MANUFACTRUTING THIN FILM TRANSISTOR | Final Rejection | TOPPAN Inc. |
| 18597057 | CONTACT CONSTRUCTION FOR SEMICONDUCTOR DEVICES WITH LOW-DIMENSIONAL MATERIALS | Non-Final OA | Applied Materials, Inc. |
| 18671424 | INTEGRATED CIRCUIT CHIP COMPRISING A RADIOFREQUENCY COMPONENT | Non-Final OA | STMicroelectronics International N.V. |
| 18649262 | Dielectric Frame Structures to Mitigate Lay-Out-Dependent Effect in Semiconductor Devices | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18595429 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18226849 | Methods and Structure for Shielding Semiconductors From Ultraviolet Light | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18151141 | SEMICONDUCTOR DEVICE INCLUDING A BLOCKING LAYER | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18597219 | SEMICONDUCTOR DEVICE AND METHOD | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18779020 | ACCESS TRANSISTORS IN A DUAL GATE LINE CONFIGURATION AND METHODS FOR FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company Limited |
| 18652774 | SEMICONDUCTOR PACKAGE AND MANUFACTURING METHOD THEREOF | Non-Final OA | NANYA TECHNOLOGY CORPORATION |
| 18395233 | COMPONENT PITCH REALIGNMENT FROM BOND PAD METAL PITCH | Final Rejection | Advanced Micro Devices, Inc. |
| 18148745 | DRIVING BACKPLANE AND DISPLAY PANEL | Final Rejection | SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD. |
| 18777621 | MEMORY CELL, CAPACITIVE MEMORY STRUCTURE, AND METHODS THEREOF | Non-Final OA | Ferroelectric Memory GmbH |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy62.6% of resolved applications examined by Vincent Wall were allowed (828 resolved cases), compared with 65.8% across Art Unit 2816 over the last five years.
This examiner's interview lift is +24.4 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Vincent Wall took 1,016 days on average from filing to allowance.
Vincent Wall examines applications in Art Unit 2816 in Tech Center 2800 (Semiconductors, Circuits & Optics).
