Prosecution Insights
Last updated: October 26, 2026

Jing Wang, USPTO Patent Examiner

Listed by the USPTO as WANG, JING

Tech Center 3600 • Art Units: 2844 2881 3646 3685

This examiner grants 100% of resolved cases

Analysis

WANG, JING works in Tech Center 3600 and Art Unit 2844. The record contains 11 resolved cases, with a 100.0% allowance rate and a median of 921 days to allowance. Every resolved matter in this limited record reached allowance, while the median timing indicates that allowance still required more than two years.

The interview lift is 0.0%, showing no measured association between interviews and allowance in the available matters. The leading companies are ASML Holding N.V., SHIMADZU Corporation, and Dh Technologies Development Pte. Ltd. The leading firms are GOODWIN PROCTER LLP, RENNER, OTTO, BOISSELLE & SKLAR, LLP, and THE WEBB LAW FIRM, P.C. Because the sample is small, practitioners should avoid treating the allowance result as predictive and should maintain disciplined written prosecution.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

100.0%
Allow Rate
+48.0% vs TC avg
97
Total Applications
+0.0%
Interview Lift
921
Avg Prosecution Days
Based on 11 resolved cases, 2023–2026

Rejection Statute Breakdown

5.2%
§101 Eligibility
17.3%
§102 Novelty
47.8%
§103 Obviousness
28.9%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18833957 UV-B LIGHT GENERATING SYSTEM Non-Final OA SIGNIFY HOLDING B.V.
18940959 Charged Particle Beam Apparatus Non-Final OA Hitachi, Ltd.
18910644 PARTICLE BEAM SYSTEM WITH COOLING SYSTEM Non-Final OA Carl Zeiss Microscopy GmbH
18722784 SAMPLE SUPPORT BODY AND METHOD FOR MANUFACTURING SAMPLE SUPPORT BODY Final Rejection HAMAMATSU PHOTONICS K.K.
18868113 ELECTRON-OPTICAL APPARATUS AND METHOD OF OBTAINING TOPOGRAPHICAL INFORMATION ABOUT A SAMPLE SURFACE Non-Final OA ASML NETHERLANDS B.V.
18866014 METHOD AND SYSTEM FOR FINE FOCUSING SECONDARY BEAM SPOTS ON DETECTOR FOR MULTI-BEAM INSPECTION APPARATUS Non-Final OA ASML Netherlands B.V.
18691828 SYSTEM AND METHOD FOR INSPECTION BY FAILURE MECHANISM CLASSIFICATION AND IDENTIFICATION IN A CHARGED PARTICLE SYSTEM Non-Final OA ASML Netherlands B.V.
18710286 INDUCTIVELY COUPLED PLASMA MASS SPECTROMETER Final Rejection SHIMADZU CORPORATION
18699230 MASS SPECTROMETER Final Rejection SHIMADZU CORPORATION
18541196 ION GENERATOR, MASS SPECTROMETER AND METHOD OF GENERATING IONS Final Rejection SHIMADZU CORPORATION
18645058 Radiation Effects Testing System with a Beam Accelerator Non-Final OA SHINE Technologies, LLC

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Who Appears Before This Examiner

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Frequently Asked Questions

What is examiner Jing Wang's allowance rate?

100.0% of resolved applications examined by Jing Wang were allowed (11 resolved cases), compared with 72.3% across Art Unit 2844 over the last five years.

Does an interview help with examiner Jing Wang?

This examiner's interview lift is +0.0 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.

How long does examiner Jing Wang take to allow a patent?

Applications allowed by Jing Wang took 921 days on average from filing to allowance.

Which art unit does examiner Jing Wang work in?

Jing Wang examines applications in Art Unit 2844 in Tech Center 3600 (Transportation, E-Commerce & Mechanical Systems).

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