Technology areas: Chemistry & Materials • Semiconductors, Circuits & Optics
10 pending office actions • 5 art units • 9 examiners • 0 of 10 (0%) have an AI response strategy ready • 34 patents granted in the last 365 days
NuFlare Technology Inc. has 10 pending office actions in Semiconductors, Circuits & Optics. The matters are assigned to 9 examiners and 5 art units, indicating broad examiner coverage within a smaller set of art-unit environments.
WANG, JING is the listed busiest examiner, with 2 pending matters. That examiner represents the only stated repeated examiner assignment, while the art-unit distribution indicates that several matters are examined within shared technical groupings.
The combination of many examiners and fewer art units makes art-unit comparison particularly useful for identifying recurring treatment of semiconductor or optical claim features. Such comparisons can inform a consistent technical narrative without assuming identical examiner positions.
Counsel should maintain a unified record of amendments, cited references, and claim constructions across the portfolio. Response drafting can then use common technical support where appropriate while addressing the distinct examination posture of each examiner.
Based on the USPTO statutory response window for each pending office action. 1 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 3 (30%) |
| §112 only | 3 (30%) |
| Multi-statute (no §101) | 4 (40%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| WANG, JING | 2 | 100.0% | +0.0% |
| FEATHERLY, HANA SANEI | 1 | 74.4% | +18.3% |
| GOURLIE, LAURA ELOISE | 1 | 68.8% | +33.3% |
| MCCORMACK, JASON L | 1 | 84.7% | +8.1% |
| EINHORN, MICA JILLIAN | 1 | 80.0% | +25.0% |
| KALISZEWSKI, ALINA ROSE | 1 | 84.6% | +23.3% |
| LOGIE, MICHAEL J | 1 | 63.1% | +9.5% |
| FORD, NATHAN K | 1 | 32.6% | +35.2% |
| LEE, AIDEN Y | 1 | 48.1% | +24.6% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18911476 | METHOD OF ADJUSTING CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRITING APPARATUS AND COMPUTER-READABLE RECORDING MEDIUM | WANG, JING | — |
| 18890971 | MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS | MCCORMACK, JASON L | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 4 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18885828 | ELECTRONIC COMPONENT AND CHARGED PARTICLE BEAM IRRADIATION APPARATUS | EINHORN, MICA JILLIAN | — |
| 18823820 | MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD | WANG, JING | — |
| 18760092 | BEAM POSITION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM WRITING METHOD | KALISZEWSKI, ALINA ROSE | — |
| 18595532 | ELECTRONIC COMPONENT AND CHARGED PARTICLE BEAM IRRADIATION APPARATUS | LOGIE, MICHAEL J | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 6 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18136461 | VAPOR PHASE GROWTH APPARATUS | FORD, NATHAN K | 3d overdue |
| 19008101 | PHOTOELECTRON SOURCE, MULTI-PHOTOELECTRON SOURCE AND MULTI-BEAM IRRADIATION APPARATUS | FEATHERLY, HANA SANEI | — |
| 18914392 | BLANKING APERTURE ARRAY SYSTEM, CHARGED PARTICLE BEAM WRITING APPARATUS, AND METHOD FOR INSPECTING BLANKING APERTURE ARRAY SYSTEM | GOURLIE, LAURA ELOISE | — |
| 18885828 | ELECTRONIC COMPONENT AND CHARGED PARTICLE BEAM IRRADIATION APPARATUS | EINHORN, MICA JILLIAN | — |
| 18760092 | BEAM POSITION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM WRITING METHOD | KALISZEWSKI, ALINA ROSE | — |
| 17971701 | FILM FORMING APPARATUS AND PLATE | LEE, AIDEN Y | — |
| Art Unit | Apps |
|---|---|
| 2881 | 6 |
| 2875 | 1 |
| 4100 | 1 |
| 1716 | 1 |
| 1718 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19008101 | PHOTOELECTRON SOURCE, MULTI-PHOTOELECTRON SOURCE AND MULTI-BEAM IRRADIATION APPARATUS | FEATHERLY, HANA SANEI | 2875 | §103 | Non-Final OA | — | Pending | Jan 02, 2025 |
| 18914392 | BLANKING APERTURE ARRAY SYSTEM, CHARGED PARTICLE BEAM WRITING APPARATUS, AND METHOD FOR INSPECTING BLANKING APERTURE ARRAY SYSTEM | GOURLIE, LAURA ELOISE | 2881 | §112 | Non-Final OA | — | Pending | Oct 14, 2024 |
| 18911476 | METHOD OF ADJUSTING CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRITING APPARATUS AND COMPUTER-READABLE RECORDING MEDIUM | WANG, JING | 2881 | §103 | Non-Final OA | — | Pending | Oct 10, 2024 |
| 18890971 | MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS | MCCORMACK, JASON L | 2881 | §112 | Non-Final OA | — | Pending | Sep 20, 2024 |
| 18885828 | ELECTRONIC COMPONENT AND CHARGED PARTICLE BEAM IRRADIATION APPARATUS | EINHORN, MICA JILLIAN | 2881 | §102§103§112 | Non-Final OA | — | Pending | Sep 16, 2024 |
| 18823820 | MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD | WANG, JING | 2881 | §102§103§112 | Non-Final OA | — | Pending | Sep 04, 2024 |
| 18760092 | BEAM POSITION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM WRITING METHOD | KALISZEWSKI, ALINA ROSE | 2881 | §102§103§112 | Non-Final OA | — | Pending | Jul 01, 2024 |
| 18595532 | ELECTRONIC COMPONENT AND CHARGED PARTICLE BEAM IRRADIATION APPARATUS | LOGIE, MICHAEL J | 4100 | §102§103 | Final Rejection | — | Pending | Mar 05, 2024 |
| 18136461 | VAPOR PHASE GROWTH APPARATUS | FORD, NATHAN K | 1716 | §103 | Final Rejection | 3d overdue | Pending | Apr 19, 2023 |
| 17971701 | FILM FORMING APPARATUS AND PLATE | LEE, AIDEN Y | 1718 | §112 | Non-Final OA | — | Pending | Oct 24, 2022 |
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Start Free TrialNuFlare Technology Inc. has 10 pending office actions as of October 2026, spread across 5 art units and 9 examiners.
Jing Wang has the most, with 2 of NuFlare Technology Inc.'s pending office actions.
Mostly Semiconductors, Circuits & Optics (USPTO Tech Center 2800), based on where its pending office actions are examined.