Listed by the USPTO as WILCZEWSKI, MARY A
Tech Center 2800 • Art Units: 2819 2822 2898
This examiner grants 85% of resolved cases
WILCZEWSKI, MARY A is assigned to tech center 2800 and art unit 2819. The profile reports 844 resolved cases and an allowance rate of 84.7%. Median time to allowance is 963 days, with an interview lift of 10.3%. The record therefore combines a substantial case base and a frequently allowed outcome with a prosecution timeline that extends beyond two years at the median.
The listed companies are Taiwan Semiconductor Manufacturing Company, Ltd., Samsung Electronics Co., Ltd., and Silanna UV Technologies Pte. Ltd. The listed firms are Haynes and Boone, LLP (24061), BIRCH STEWART KOLASCH & BIRCH, LLP, and HARNESS, DICKEY & PIERCE, P.L.C. Practitioners can use these entities as indicators of the technologies and representation patterns appearing in the examiner’s docket.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18796633 | INTEGRATED CIRCUIT DEVICES HAVING ENHANCED POWER DELIVERY NETWORKS THEREIN | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18340419 | MEMORY DEVICES INCLUDING VERTICAL STACK STRUCTURE, METHODS OF MANUFACTURING AND OPERATING THE SAME, AND ELECTRONIC APPARATUSES INCLUDING MEMORY DEVICE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18781527 | LIGHT EMITTING DISPLAY APPARATUS | Non-Final OA | LG Display Co., Ltd. |
| 18665907 | DISPLAY DEVICE AND MANUFACTURING METHOD OF DISPLAY DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 18496081 | SEMICONDUCTOR PROCESSING CHAMBER WITH FILAMENT LAMPS HAVING NONUNIFORM HEAT OUTPUT | Final Rejection | ASM IP Holding B.V. |
| 18028957 | APPARATUS FOR PROCESSING WAFER-SHAPED ARTICLES | Final Rejection | LAM RESEARCH AG |
| 17788238 | COMPONENT AND METHOD FOR PRODUCING A COMPONENT | Non-Final OA | ams-OSRAM International GmbH |
| 18321844 | METHOD FOR PERFORMING TRENCH ISOLATION PROCESS | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18197968 | FINFET DEVICE STRUCTURE AND METHOD | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18170845 | Interconnect Structure for Improving Memory Performance and/or Logic Performance | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18786886 | INTERFACE TRAP CHARGE DENSITY REDUCTION | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18783352 | SYSTEMS AND METHODS FOR PROCESSING A SUBSTRATE | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18782255 | Dual Dopant Source/Drain Regions and Methods of Forming Same | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18363554 | FINFET DEVICE AND METHOD | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18329396 | INTERFACE TRAP CHARGE DENSITY REDUCTION | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 17814725 | Semiconductor Device and Method | Non-Final OA | Taiwan Semiconductor Manufacturing Co.,Ltd. |
| 17150044 | FINFET DEVICE AND METHOD | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy84.7% of resolved applications examined by Mary A Wilczewski were allowed (844 resolved cases), compared with 69.7% across Art Unit 2819 over the last five years.
This examiner's interview lift is +10.3 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Mary A Wilczewski took 963 days on average from filing to allowance.
Mary A Wilczewski examines applications in Art Unit 2819 in Tech Center 2800 (Semiconductors, Circuits & Optics).
