Tech Center 2800 • Art Units: 1713 1714 1718 2817 2891 2893
This examiner grants 66% of resolved cases
Yuechuan Yu has handled 538 resolved cases in Art Unit 1713, with the profile listing Technology Center 2800. The allowance rate is 66.4 percent, indicating the level of difficulty for applicants. The median days to allowance is 1229, which serves as the timeline metric for this examiner's docket. The interview lift of 19.5 percent suggests that direct communication provides an advantage during prosecution.
With 538 cases resolved, the data reflects a pattern where a portion of applications reach allowance. Practitioners should utilize the 19.5 percent lift to address initial rejections. The 1229-day median pendency is the duration for this art unit. The 66.4 percent allowance rate suggests that the examiner grants patents when claims are supported. Strategic use of the 19.5 percent lift can help move the prosecution process forward and avoid delays in reaching the final grant status.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18522132 | EQUIPMENT FRONT-END MODULES FOR SEMICONDUCTOR PROCESSING SYSTEMS AND METHODS OF MAKING SEMICONDUCTOR PROCESSING SYSTEMS | Non-Final OA | ASM IP Holding B.V. |
| 18411274 | APPARATUS AND METHOD FOR COATING A SUBSTRATE | Non-Final OA | FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. |
| 18381893 | MULTIZONE REFLECTOR FOR TEMPERATURE PLANAR NON-UNIFORMITY | Non-Final OA | Applied Materials, Inc. |
| 18633928 | PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18227370 | PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING SOURCE FREQUENCY OF SOURCE RADIO-FREQUENCY POWER | Non-Final OA | Tokyo Electron Limited |
| 18808738 | SUBSTRATE PROCESSING APPARATUS, PLURALITY OF ELECTRODES AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | Kokusai Electric Corporation |
| 18082044 | SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Final Rejection | Kokusai Electric Corporation |
| 18469707 | SUBSTRATE TREATING APPARATUS | Non-Final OA | SCREEN Holdings Co., Ltd. |
| 18576984 | COIL DEVICE FOR GENERATING PLASMA AND SEMICONDUCTOR EQUIPMENT | Non-Final OA | BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD. |
| 17288070 | PLASMA SOURCE AND METHOD FOR PREPARING AND COATING SURFACES USING ATMOSPHERIC PLASMA PRESSURE WAVES | Final Rejection | Atmospheric Plasma Solutions, Inc. |
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