Prosecution Insights
Last updated: October 02, 2026

Examiner: YU, YUECHUAN

Tech Center 2800 • Art Units: 1713 1714 1718 2817 2891 2893

This examiner grants 66% of resolved cases

Analysis

Yuechuan Yu has handled 538 resolved cases in Art Unit 1713, with the profile listing Technology Center 2800. The allowance rate is 66.4 percent, indicating the level of difficulty for applicants. The median days to allowance is 1229, which serves as the timeline metric for this examiner's docket. The interview lift of 19.5 percent suggests that direct communication provides an advantage during prosecution.

With 538 cases resolved, the data reflects a pattern where a portion of applications reach allowance. Practitioners should utilize the 19.5 percent lift to address initial rejections. The 1229-day median pendency is the duration for this art unit. The 66.4 percent allowance rate suggests that the examiner grants patents when claims are supported. Strategic use of the 19.5 percent lift can help move the prosecution process forward and avoid delays in reaching the final grant status.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

66.4%
Allow Rate
-1.6% vs TC avg
555
Total Applications
+19.5%
Interview Lift
1229
Avg Prosecution Days
Based on 538 resolved cases, 2023–2026

Rejection Statute Breakdown

1.6%
§101 Eligibility
16.8%
§102 Novelty
57.3%
§103 Obviousness
19.0%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18522132 EQUIPMENT FRONT-END MODULES FOR SEMICONDUCTOR PROCESSING SYSTEMS AND METHODS OF MAKING SEMICONDUCTOR PROCESSING SYSTEMS Non-Final OA ASM IP Holding B.V.
18411274 APPARATUS AND METHOD FOR COATING A SUBSTRATE Non-Final OA FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
18381893 MULTIZONE REFLECTOR FOR TEMPERATURE PLANAR NON-UNIFORMITY Non-Final OA Applied Materials, Inc.
18633928 PROCESSING APPARATUS Non-Final OA Tokyo Electron Limited
18227370 PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING SOURCE FREQUENCY OF SOURCE RADIO-FREQUENCY POWER Non-Final OA Tokyo Electron Limited
18808738 SUBSTRATE PROCESSING APPARATUS, PLURALITY OF ELECTRODES AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Non-Final OA Kokusai Electric Corporation
18082044 SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Final Rejection Kokusai Electric Corporation
18469707 SUBSTRATE TREATING APPARATUS Non-Final OA SCREEN Holdings Co., Ltd.
18576984 COIL DEVICE FOR GENERATING PLASMA AND SEMICONDUCTOR EQUIPMENT Non-Final OA BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
17288070 PLASMA SOURCE AND METHOD FOR PREPARING AND COATING SURFACES USING ATMOSPHERIC PLASMA PRESSURE WAVES Final Rejection Atmospheric Plasma Solutions, Inc.

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