Prosecution Insights
Last updated: October 27, 2026

Hai Y Zhang, USPTO Patent Examiner

Listed by the USPTO as ZHANG, HAI Y

Tech Center 2800 • Art Units: 1717 1732 1783 2872 2877

This examiner grants 69% of resolved cases

Analysis

ZHANG, HAI Y has resolved 336 cases in Tech Center 2800 and Art Unit 1717. The allowance rate is 69.0%, while the interview lift is 41.8%. The median time to allowance is 1175 days. The profile combines a substantial allowance record with a meaningful interview effect, supporting attention to both claim construction and examiner communications.

The listed companies are Canon Inc., King Fahd University of Petroleum and Minerals, and Northwestern University. The leading firms are OBLON, MCCLELLAND, MAIER & NEUSTADT, L.L.P., BIRCH STEWART KOLASCH & BIRCH, LLP, and Capitol City TechLaw, PLLC. Their presence identifies organizations and counsel with relevant experience in this art unit.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

69.0%
Allow Rate
+1.0% vs TC avg
359
Total Applications
+41.8%
Interview Lift
1175
Avg Prosecution Days
Based on 336 resolved cases, 2023–2026

Rejection Statute Breakdown

1.1%
§101 Eligibility
18.0%
§102 Novelty
46.5%
§103 Obviousness
23.0%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18513745 INK JET RECORDING METHOD AND INK JET RECORDING APPARATUS Non-Final OA CANON KABUSHIKI KAISHA
18677308 GOLD NANOPARTICLES-EMBEDDED ZINC OXIDE NANOSHEETS AS SURFACE-ENHANCED RAMAN SCATTERING-ACTIVE SUBSTRATE Non-Final OA KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS
18281648 MULTI-LAYER BOROPHENE AND METHOD OF SYNTHESIZING SAME Non-Final OA NORTHWESTERN UNIVERSITY
18995474 PROCESSING APPARATUS FOR PROCESSING A FLEXIBLE SUBSTRATE AND METHODS THEREFOR Non-Final OA Applied Materials, Inc.
18825730 HOT-DIP PLATED STEEL MATERIAL Final Rejection NIPPON STEEL CORPORATION
18994148 ION TRANSPORT STRUCTURE USING TWO-DIMENSIONAL NANOMATERIAL HAVING DEFECTS, METHOD FOR PREPARING SAME AND LITHIUM EXTRACTION APPARATUS COMPRISING SAME Non-Final OA IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
18277518 METHOD FOR PRODUCING A MINERAL FIBRE PRODUCT Non-Final OA ROCKWOOL A/S
19024943 ASSEMBLED MXENE NANOMATERIAL COATING BY SOLUTE-ASSISTED ASSEMBLY AND METHOD OF USING THE SAME Non-Final OA Drexel University
18602585 PRE-TREATING ALUMINUM SURFACES WITH ZIRCONIUM- AND MOLYBDENUM-CONTAINING COMPOSITIONS Non-Final OA Chemetall GmbH

Facing This Examiner?

IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.

Build Your Strategy

Who Appears Before This Examiner

Top companies before this examiner

Law firms appearing most often

Frequently Asked Questions

What is examiner Hai Y Zhang's allowance rate?

69.0% of resolved applications examined by Hai Y Zhang were allowed (336 resolved cases), compared with 49.3% across Art Unit 1717 over the last five years.

Does an interview help with examiner Hai Y Zhang?

This examiner's interview lift is +41.8 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.

How long does examiner Hai Y Zhang take to allow a patent?

Applications allowed by Hai Y Zhang took 1,175 days on average from filing to allowance.

Which art unit does examiner Hai Y Zhang work in?

Hai Y Zhang examines applications in Art Unit 1717 in Tech Center 2800 (Semiconductors, Circuits & Optics).

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month