Prosecution Insights
Prosecution Insights
Technology area: Chemistry & Materials
4 pending office actions • 2 art units • 4 examiners • 0 of 4 (0%) have an AI response strategy ready • 2 patents granted in the last 365 days
Dupont Electronic Materials Holding Inc. currently manages 3 pending office actions within the Chemistry & Materials technology area. These actions are distributed across 3 distinct examiners, yet they are all located within 1 distinct art unit. This arrangement indicates that while the technical subject matter is concentrated in one administrative area, the company must address the individual review styles of three different examiners for its 3 pending office actions.
The busiest examiner for the portfolio is PHAM, THOMAS T, who is handling 1 busiest examiner pending action. Since each of the 3 distinct examiners is responsible for exactly one action, the workload is evenly spread. The concentration of the 3 pending office actions within 1 distinct art unit suggests a consistent technical focus. Practitioners must provide tailored responses to PHAM, THOMAS T and the other two examiners to successfully advance the portfolio and resolve the pending matters in the Chemistry & Materials sector.
Based on the USPTO statutory response window for each pending office action. 2 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 2 (50%) |
| §112 only | 1 (25%) |
| No statute on record | 1 (25%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| PHAM, THOMAS T | 1 | 51.4% | +15.7% |
| TRAN, BINH X | 1 | 81.7% | +12.0% |
| SERGENT, RABON A | 1 | 55.0% | +24.1% |
| LU, JIONG-PING | 1 | 83.6% | +7.8% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18351031 | CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD FOR PREVENTING POLISHING PAD GROOVE CLOGGING | LU, JIONG-PING | 1d overdue |
| 18373692 | METHOD OF POLISHING USING CHEMICAL MECHANICAL POLISHING PAD | TRAN, BINH X | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 3 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18409615 | Functionalized Metal and Nitride CMP Slurry | PHAM, THOMAS T | 14d |
| 18373692 | METHOD OF POLISHING USING CHEMICAL MECHANICAL POLISHING PAD | TRAN, BINH X | — |
| 18360947 | POLISHING PAD FORMED FROM DUAL CURATIVE | SERGENT, RABON A | — |
| Art Unit | Apps |
|---|---|
| 1713 | 3 |
| 1765 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18409615 | Functionalized Metal and Nitride CMP Slurry | PHAM, THOMAS T | 1713 | Other | Non-Final OA | 14d | Pending | Jan 10, 2024 |
| 18373692 | METHOD OF POLISHING USING CHEMICAL MECHANICAL POLISHING PAD | TRAN, BINH X | 1713 | §112 | Non-Final OA | — | Pending | Sep 27, 2023 |
| 18360947 | POLISHING PAD FORMED FROM DUAL CURATIVE | SERGENT, RABON A | 1765 | §103 | Non-Final OA | — | Pending | Jul 28, 2023 |
| 18351031 | CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD FOR PREVENTING POLISHING PAD GROOVE CLOGGING | LU, JIONG-PING | 1713 | §103 | Non-Final OA | 1d overdue | Pending | Jul 12, 2023 |
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