4 pending office actions • 3 art units • 4 examiners • 0 of 4 (0%) have an AI response strategy ready • 2 patents granted in the last 365 days
Based on the USPTO statutory response window for each pending office action. 2 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 1 (25%) |
| §112 only | 1 (25%) |
| Multi-statute (no §101) | 1 (25%) |
| No statute on record | 1 (25%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| PHAM, THOMAS T | 1 | 51.7% | +15.8% |
| LOUGHRAN, RYAN PATRICK | 1 | 76.9% | +27.3% |
| TRAN, BINH X | 1 | 81.6% | +11.9% |
| SERGENT, RABON A | 1 | 54.8% | +24.2% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18373692 | METHOD OF POLISHING USING CHEMICAL MECHANICAL POLISHING PAD | TRAN, BINH X | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18373660 | CHEMICAL MECHANICAL POLISHING PAD | LOUGHRAN, RYAN PATRICK | 23d |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 4 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18409615 | Functionalized Metal and Nitride CMP Slurry | PHAM, THOMAS T | 14d |
| 18373660 | CHEMICAL MECHANICAL POLISHING PAD | LOUGHRAN, RYAN PATRICK | 23d |
| 18373692 | METHOD OF POLISHING USING CHEMICAL MECHANICAL POLISHING PAD | TRAN, BINH X | — |
| 18360947 | POLISHING PAD FORMED FROM DUAL CURATIVE | SERGENT, RABON A | — |
| Art Unit | Apps |
|---|---|
| 1713 | 2 |
| 1731 | 1 |
| 1765 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18409615 | Functionalized Metal and Nitride CMP Slurry | PHAM, THOMAS T | 1713 | Other | Non-Final OA | 14d | Pending | Jan 10, 2024 |
| 18373660 | CHEMICAL MECHANICAL POLISHING PAD | LOUGHRAN, RYAN PATRICK | 1731 | §103§112 | Non-Final OA | 23d | Pending | Sep 27, 2023 |
| 18373692 | METHOD OF POLISHING USING CHEMICAL MECHANICAL POLISHING PAD | TRAN, BINH X | 1713 | §112 | Non-Final OA | — | Pending | Sep 27, 2023 |
| 18360947 | POLISHING PAD FORMED FROM DUAL CURATIVE | SERGENT, RABON A | 1765 | §103 | Final Rejection | — | Pending | Jul 28, 2023 |
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