Prosecution Insights
Prosecution Insights
Technology areas: Chemistry & Materials • Medical Devices & Mechanical Engineering
4 pending office actions • 4 art units • 4 examiners • 0 of 4 (0%) have an AI response strategy ready • 5 patents granted in the last 365 days
Jiangsu Leuven Instruments Co. Ltd. currently has 4 pending office actions in the Chemistry & Materials technology area. These actions are spread across 4 distinct art units, indicating a broad technical footprint within the chemistry sector. The involvement of 4 distinct examiners means that each of the pending office actions is being reviewed by a different individual, requiring a unique approach for each case.
TRAN, BINH X is the busiest examiner, though they are only responsible for 1 pending office action. This indicates that the 4 pending office actions are distributed among the distinct examiners. This lack of concentration means that no single examiner's decisions will dominate the outcome of the overall portfolio. Practitioners must manage multiple examiner relationships simultaneously to advance the Chemistry & Materials filings.
The fact that 4 distinct art units are involved suggests that the company's innovations are highly diverse. Practitioners must ensure that responses are tailored to the specific requirements of each unit to achieve consistent results. Successfully navigating the 1 pending office action with the busiest examiner while coordinating across the other units will be essential for the company's intellectual property strategy.
Based on the USPTO statutory response window for each pending office action. 4 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 4 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 2 (50%) |
| §102 only | 1 (25%) |
| Multi-statute (no §101) | 1 (25%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| TRAN, BINH X | 1 | 81.7% | +12.0% |
| CHEN, KEATH T | 1 | 30.2% | +24.7% |
| LEE, CHEE-CHONG | 1 | 64.4% | +52.4% |
| ALEJANDRO MULERO, LUZ L | 1 | 47.8% | +40.2% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18293322 | PLASMA TREATMENT METHOD | TRAN, BINH X | 27d |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17999427 | SEPARATED GAS INLET STRUCTURE FOR BLOCKING PLASMA BACKFLOW | LEE, CHEE-CHONG | 78d overdue |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 4 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17999427 | SEPARATED GAS INLET STRUCTURE FOR BLOCKING PLASMA BACKFLOW | LEE, CHEE-CHONG | 78d overdue |
| 18043492 | ION BEAM ETCHING MACHINE AND LIFTING AND ROTATING PLATFORM DEVICE THEREOF | CHEN, KEATH T | 30d overdue |
| 18293322 | PLASMA TREATMENT METHOD | TRAN, BINH X | 27d |
| 17626501 | PLASMA ETCHING SYSTEM | ALEJANDRO MULERO, LUZ L | 72d |
| Art Unit | Apps |
|---|---|
| 1713 | 1 |
| 1718 | 1 |
| 3752 | 1 |
| 1716 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18293322 | PLASMA TREATMENT METHOD | TRAN, BINH X | 1713 | §102 | Final Rejection | 27d | Pending | Jan 29, 2024 |
| 18043492 | ION BEAM ETCHING MACHINE AND LIFTING AND ROTATING PLATFORM DEVICE THEREOF | CHEN, KEATH T | 1718 | §103 | Final Rejection | 30d overdue | Pending | Feb 28, 2023 |
| 17999427 | SEPARATED GAS INLET STRUCTURE FOR BLOCKING PLASMA BACKFLOW | LEE, CHEE-CHONG | 3752 | §103§112 | Non-Final OA | 78d overdue | Pending | Nov 21, 2022 |
| 17626501 | PLASMA ETCHING SYSTEM | ALEJANDRO MULERO, LUZ L | 1716 | §103 | Final Rejection | 72d | Pending | Jan 12, 2022 |
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