Prosecution Insights
Prosecution Insights
4 pending office actions • 4 art units • 4 examiners • 0 of 4 (0%) have an AI response strategy ready • 5 patents granted in the last 365 days
Based on the USPTO statutory response window for each pending office action. 4 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 4 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 3 (75%) |
| §102 only | 1 (25%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| TRAN, BINH X | 1 | 81.4% | +12.3% |
| SEOANE, TODD MICHAEL | 1 | 61.5% | +52.4% |
| LEE, CHEE-CHONG | 1 | 64.0% | +52.9% |
| ALEJANDRO MULERO, LUZ L | 1 | 47.2% | +40.0% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18293322 | PLASMA TREATMENT METHOD | TRAN, BINH X | 27d |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 4 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17999427 | SEPARATED GAS INLET STRUCTURE FOR BLOCKING PLASMA BACKFLOW | LEE, CHEE-CHONG | 78d overdue |
| 18043492 | ION BEAM ETCHING MACHINE AND LIFTING AND ROTATING PLATFORM DEVICE THEREOF | SEOANE, TODD MICHAEL | 30d overdue |
| 18293322 | PLASMA TREATMENT METHOD | TRAN, BINH X | 27d |
| 17626501 | PLASMA ETCHING SYSTEM | ALEJANDRO MULERO, LUZ L | 72d |
| Art Unit | Apps |
|---|---|
| 1713 | 1 |
| 1718 | 1 |
| 3752 | 1 |
| 1716 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18293322 | PLASMA TREATMENT METHOD | TRAN, BINH X | 1713 | §102 | Non-Final OA | 27d | Pending | Jan 29, 2024 |
| 18043492 | ION BEAM ETCHING MACHINE AND LIFTING AND ROTATING PLATFORM DEVICE THEREOF | SEOANE, TODD MICHAEL | 1718 | §103 | Non-Final OA | 30d overdue | Pending | Feb 28, 2023 |
| 17999427 | SEPARATED GAS INLET STRUCTURE FOR BLOCKING PLASMA BACKFLOW | LEE, CHEE-CHONG | 3752 | §103 | Non-Final OA | 78d overdue | Pending | Nov 21, 2022 |
| 17626501 | PLASMA ETCHING SYSTEM | ALEJANDRO MULERO, LUZ L | 1716 | §103 | Final Rejection | 72d | Pending | Jan 12, 2022 |
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