Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1716 1792
This examiner grants 47% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 17063824 | LOW CURRENT HIGH ION ENERGY PLASMA CONTROL SYSTEM | Final Rejection | Applied Materials, Inc. |
| 16898244 | CLEAN UNIT FOR CHAMBER EXHAUST CLEANING | Final Rejection | Applied Materials, Inc. |
| 18141700 | PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 17421001 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 17927328 | DISTRIBUTED PLASMA SOURCE ARRAY | Non-Final OA | LAM RESEARCH CORPORATION |
| 17800168 | PLANAR MULTI-LAYER RADIO FREQUENCY FILTERS INCLUDING STACKED COILS WITH STRUCTURAL CAPACITANCE | Non-Final OA | LAM RESEARCH CORPORATION |
| 17819663 | WAFER PLACEMENT TABLE | Final Rejection | NGK Insulators, Ltd. |
| 17626501 | PLASMA ETCHING SYSTEM | Final Rejection | JIANGSU LEUVEN INSTRUMENTS CO. LTD |
| 18276620 | STAGE FOR HEATING AND COOLING OBJECT | Non-Final OA | ADVANTEC CO., LTD. |
| 17790959 | METHOD FOR MANUFACTURING OXIDE-REMOVED OBJECT AND OXIDE REMOVING APPARATUS | Non-Final OA | ORIGIN COMPANY, LIMITED |
| 16642187 | PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS | Non-Final OA | Hitachi High-Technologies Corporation |
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