Tech Center 1700 • Art Units: 1716 1792
This examiner grants 48% of resolved cases
Luz L. Alejandro Mulero has 431 resolved cases in Tech Center 1700. The allowance rate is 47.8% and the interview lift is 40.2%. The median days to allowance is 1529. In Art Unit 1716, the 47.8% allowance rate is moderate, but the 40.2% interview lift is very high. The 1529-day median indicates a long prosecution timeline for 431 cases. The 40.2% lift is a key strategic insight.
The 47.8% allowance rate provides a baseline for success in Art Unit 1716. The 40.2% interview lift suggests that direct communication is highly beneficial. The 1529-day median is a significant duration for the 431 cases. Practitioners should prioritize interviews to leverage the 40.2% lift. These figures offer a detailed look at the examiner's history in Tech Center 1700. The 47.8% allowance rate is a key metric.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19032149 | METHODS AND SYSTEM FOR PRECURSOR RECYCLING | Non-Final OA | ASM IP Holding B.V. |
| 16642187 | PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS | Final Rejection | Hitachi High-Technologies Corporation |
| 17927328 | DISTRIBUTED PLASMA SOURCE ARRAY | Final Rejection | LAM RESEARCH CORPORATION |
| 18472267 | SEMICONDUCTOR PROCESSING APPARATUS FOR GENERATING PLASMA | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 16927638 | Pre-Clean for Contacts | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 16898244 | CLEAN UNIT FOR CHAMBER EXHAUST CLEANING | Non-Final OA | Applied Materials, Inc. |
| 18487581 | INDUCTIVELY COUPLED PLASMA ETCHING APPARATUS, AND INDUCTIVELY COUPLED PLASMA ETCHING METHOD USING SAME | Non-Final OA | KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION, SEJONG CAMPUS |
| 17749394 | SINGLE-TURN AND LAMINATED-WALL INDUCTIVELY COUPLED PLASMA SOURCES | Non-Final OA | Advanced Energy Industries, Inc. |
| 17626501 | PLASMA ETCHING SYSTEM | Final Rejection | JIANGSU LEUVEN INSTRUMENTS CO. LTD |
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