Technology area: Semiconductors, Circuits & Optics
4 pending office actions • 3 art units • 4 examiners • 0 of 4 (0%) have an AI response strategy ready
Parcan Nanotech Co. Ltd. has 4 pending office actions in the Semiconductors, Circuits & Optics technology area. These 4 actions are assigned to 4 distinct examiners, so each examiner is responsible for a single pending case. MOHAMED BARAKAT is the busiest examiner for the portfolio, holding 1 pending office action. This distribution shows that the company's current prosecution is not concentrated under any single examiner.
The 4 pending actions are located within 3 distinct art units, indicating a range of technical specialties within the semiconductor field. With 4 examiners and 3 art units for only 4 pending office actions, the company faces a relatively fragmented prosecution environment. This profile suggests that the company must coordinate across multiple technical groups and individual examiners to manage its 4 pending matters effectively.
Because each of the 4 examiners handles only 1 pending office action, there is no opportunity to leverage a relationship with a single examiner across multiple cases. Practitioners must treat each of the 4 pending matters as a standalone negotiation. The 3 distinct art units provide some technical grouping, but the overall prosecution landscape remains highly individualized for each of the 4 pending actions, with MOHAMED BARAKAT being one of the 4 examiners involved.
Based on the USPTO statutory response window for each pending office action. 2 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §112 only | 2 (50%) |
| Multi-statute (no §101) | 2 (50%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| BARAKAT, MOHAMED | 1 | 73.7% | +23.1% |
| NGUYEN, TRUNG Q | 1 | 91.0% | +6.2% |
| KIM, PETER B | 1 | 83.0% | +9.5% |
| EINHORN, MICA JILLIAN | 1 | 71.4% | +40.0% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18722417 | PROBE DEVICES AND PROBE CONTROL APPARATUS | NGUYEN, TRUNG Q | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18255784 | A STEPPER LITHOGRAPHY APPARATUS AND OPERATING METHOD THEREFOR, AND PATTERN ALIGNMENT DEVICE | KIM, PETER B | 72d overdue |
| 18838559 | DISTANCE COMPENSATION METHOD FOR OPERATING APPERATUS DURING RELATIVE MOTION OF TWO WORKPIECES | BARAKAT, MOHAMED | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18079022 | SUB-NANOSCALE HIGH-PRECISION LITHOGRAPHY WRITING FIELD STITCHING METHOD, LITHOGRAPHY SYSTEM, WAFER, AND ELECTRON BEAM DRIFT DETERMINATION METHOD | EINHORN, MICA JILLIAN | 42d overdue |
| 18838559 | DISTANCE COMPENSATION METHOD FOR OPERATING APPERATUS DURING RELATIVE MOTION OF TWO WORKPIECES | BARAKAT, MOHAMED | — |
| Art Unit | Apps |
|---|---|
| 2858 | 1 |
| 2882 | 1 |
| 2881 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18838559 | DISTANCE COMPENSATION METHOD FOR OPERATING APPERATUS DURING RELATIVE MOTION OF TWO WORKPIECES | BARAKAT, MOHAMED | — | §102§103§112 | Non-Final OA | — | Pending | Jan 14, 2025 |
| 18722417 | PROBE DEVICES AND PROBE CONTROL APPARATUS | NGUYEN, TRUNG Q | 2858 | §112 | Non-Final OA | — | Pending | Jun 20, 2024 |
| 18255784 | A STEPPER LITHOGRAPHY APPARATUS AND OPERATING METHOD THEREFOR, AND PATTERN ALIGNMENT DEVICE | KIM, PETER B | 2882 | §103§112 | Non-Final OA | 72d overdue | Pending | Jun 02, 2023 |
| 18079022 | SUB-NANOSCALE HIGH-PRECISION LITHOGRAPHY WRITING FIELD STITCHING METHOD, LITHOGRAPHY SYSTEM, WAFER, AND ELECTRON BEAM DRIFT DETERMINATION METHOD | EINHORN, MICA JILLIAN | 2881 | §112 | Non-Final OA | 42d overdue | Pending | Dec 12, 2022 |
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