Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2851 2882 2892
This examiner grants 83% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18896980 | CONTROL METHOD OF DRIVING APPARATUS, DRIVING APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18796945 | HOLDING APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18714792 | LITHOGRAPHY SYSTEM AND RELATED METHODS FOR FORMING STRUCTURES OF DIFFERENT DEPTHS AND SHAPES | Final Rejection | Applied Materials, Inc. |
| 18568993 | DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING | Final Rejection | Applied Materials, Inc. |
| 18426549 | METHOD AND APPARATUS FOR DETERMINING OPTICAL PROPERTIES OF DEPOSITION MATERIALS USED FOR LITHOGRAPHIC MASKS | Non-Final OA | Carl Zeiss SMT GmbH |
| 18426860 | PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY HAVING A CONNECTING ELEMENT | Non-Final OA | Carl Zeiss SMT GmbH |
| 18743571 | IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | Kioxia Corporation |
| 18780663 | EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, EXPOSURE DEVICE, AND EXPOSURE SYSTEM | Non-Final OA | NIKON CORPORATION |
| 18788007 | ENHANCING LITHOGRAPHY OPERATION FOR MANUFACTURING SEMICONDUCTOR DEVICES | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18777114 | SYSTEMS FOR INSPECTION OF SEMICONDUCTOR SUBSTRATES | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18863941 | CONTAMINATION DETERMINATION | Non-Final OA | ASML Netherlands B.V. |
| 18835287 | INSPECTION APPARATUS, MOTORIZED APERTURES, AND METHOD BACKGROUND | Non-Final OA | ASML Netherlands B.V. |
| 18719902 | METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING | Non-Final OA | ASML NETHERLANDS B.V. |
| 18716383 | METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING | Non-Final OA | ASML NETHERLANDS B.V. |
| 18714728 | SYSTEMS AND METHODS FOR OPTIMIZING LITHOGRAPHIC DESIGN VARIABLES USING IMAGE-BASED FAILURE RATE MODEL | Non-Final OA | ASML NETHERLANDS B.V. |
| 18570140 | STRUCTURES FOR USE ON A SUBSTRATE HOLDER, SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS AND METHOD | Final Rejection | ASML NETHERLANDS B.V. |
| 18039484 | LITHOGRAPHIC METHOD | Non-Final OA | ASML NETHERLANDS B.V. |
| 18743118 | Multiple Pass Optical Measurements Of Semiconductor Structures | Non-Final OA | KLA Corporation |
| 18599761 | EXPOSURE APPARATUS AND CONTROL METHOD THEREOF | Non-Final OA | NANYA TECHNOLOGY CORPORATION |
| 18604063 | EXPOSURE APPARATUS | Non-Final OA | Ushio Denki Kabushiki Kaisha |
| 18570553 | Apparatus And Method For MultiPhase Flowable Medium Analysis | Final Rejection | AI Exploration Ltd |
| 18190763 | FACTORY SYSTEM AND METHOD FOR FORMING SEMICONDUCTOR STRUCTURE | Non-Final OA | TSMC CHINA COMPANY LIMITED |
| 18255784 | A STEPPER LITHOGRAPHY APPARATUS AND OPERATING METHOD THEREFOR, AND PATTERN ALIGNMENT DEVICE | Non-Final OA | PARCAN NANOTECH CO., LTD. |
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