Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2851 2876 2882 2892
This examiner grants 83% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18813621 | METHOD OF CONFIGURING EXTREME ULTRAVIOLET ILLUMINATION SYSTEM AND EXTREME ULTRAVIOLET EXPOSURE METHOD USING THE ILLUMINATION SYSTEM | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18783620 | FIRST HOLDING APPARATUS, THIRD HOLDING APPARATUS, FIFTH HOLDING APPARATUS, TRANSPORT SYSTEM, EXPOSURE SYSTEM, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD | Non-Final OA | NIKON CORPORATION |
| 18780663 | EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, EXPOSURE DEVICE, AND EXPOSURE SYSTEM | Non-Final OA | NIKON CORPORATION |
| 18238027 | EXPOSURE APPARATUS AND WIRING PATTERN FORMING METHOD | Non-Final OA | NIKON CORPORATION |
| 19002035 | FREQUENCY-PICKED METHODOLOGY FOR DIFFRACTION-BASED OVERLAY MEASUREMENT | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18937811 | NANOIMPRINT LITHOGRAPHY MASK AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18797233 | AIRFLOW ADJUST SYSTEM FOR WORKPIECE TOOL AND METHOD OF OPERATING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18743571 | IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | Kioxia Corporation |
| 18741925 | METHOD AND APPARATUS FOR PRODUCING AT LEAST ONE HOLLOW STRUCTURE, MIRROR, EUV LITHOGRAPHY SYSTEM, FLUID FEED APPARATUS AND METHOD FOR FEEDING A FLUID | Non-Final OA | Carl Zeiss SMT GmbH |
| 18604063 | EXPOSURE APPARATUS | Final Rejection | Ushio Denki Kabushiki Kaisha |
| 18652438 | DYNAMIC FREEFORM OPTICS FOR LITHOGRAPHY ILLUMINATION BEAM SHAPING | Final Rejection | KLA Corporation |
| 18388405 | STAGE MOTION PROFILE SYSTEM AND METHOD | Non-Final OA | KLA Corporation |
| 18835287 | INSPECTION APPARATUS, MOTORIZED APERTURES, AND METHOD BACKGROUND | Non-Final OA | ASML Netherlands B.V. |
| 18719902 | METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING | Final Rejection | ASML NETHERLANDS B.V. |
| 18570140 | STRUCTURES FOR USE ON A SUBSTRATE HOLDER, SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS AND METHOD | Final Rejection | ASML NETHERLANDS B.V. |
| 18570289 | AN ILLUMINATION SOURCE AND ASSOCIATED METHOD APPARATUS | Non-Final OA | ASML NETHERLANDS B.V. |
| 18954513 | INFLATION HOLDER FOR PHOTOMASK CARRIER | Non-Final OA | GUDENG EQUIPMENT CO., LTD. |
| 18883817 | METHODS AND APPARATUSES FOR MICROFABRICATION AND LASER WRITING ALIGNMENT | Non-Final OA | IonQ, Inc. |
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