Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2851 2876 2882 2892
This examiner grants 83% of resolved cases
Peter B Kim, in Tech Center 2800 and Art Unit 2851, has 970 resolved cases. The allowance rate is 83.0, and the median days to allowance is 930. These metrics indicate the probability of success and the timeline for the tech center. The 930-day median is a benchmark for practitioners to use when forecasting the duration of the prosecution process.
The interview lift is 9.5, showing that interviews provide a benefit to the 83.0 allowance rate. With 970 resolved cases, the data is robust and indicates that direct engagement is a tool for resolving outstanding issues. Practitioners can rely on the 930-day median as a benchmark for the duration of the prosecution. By leveraging the 9.5 lift, applicants can improve their chances of success and manage their cases toward a resolution.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18585271 | MEASURING METHOD OF MEASURING SUBSTRATE BY CAPTURING IMAGES OF MARKS THEREON | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18780663 | EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, EXPOSURE DEVICE, AND EXPOSURE SYSTEM | Non-Final OA | NIKON CORPORATION |
| 18238027 | EXPOSURE APPARATUS AND WIRING PATTERN FORMING METHOD | Non-Final OA | NIKON CORPORATION |
| 18743571 | IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | Kioxia Corporation |
| 19025060 | EUV LIGHT SOURCE CONTAMINATION MONITORING SYSTEM | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 19002035 | FREQUENCY-PICKED METHODOLOGY FOR DIFFRACTION-BASED OVERLAY MEASUREMENT | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18968343 | RETICLE CARRIER AND ASSOCIATED METHODS | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18937811 | NANOIMPRINT LITHOGRAPHY MASK AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18808284 | APPARATUS AND METHOD FOR OPTICAL INSPECTION OF EUV PELLICLES | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18859114 | ADJUSTING EFFECTIVE DEPTH OF FOCUS | Non-Final OA | Applied Materials, Inc. |
| 18948801 | CATADIOPTRIC PROJECTION OBJECTIVE, PROJECTION ILLUMINATION SYSTEM AND PROJECTION ILLUMINATION METHOD | Non-Final OA | Carl Zeiss SMT GmbH |
| 18920238 | METHOD FOR MEASURING THE ILLUMINATION PUPIL IN A SCANNER TAKING INTO ACCOUNT A MEASUREMENT RETICLE | Final Rejection | Carl Zeiss SMT GmbH |
| 18741925 | METHOD AND APPARATUS FOR PRODUCING AT LEAST ONE HOLLOW STRUCTURE, MIRROR, EUV LITHOGRAPHY SYSTEM, FLUID FEED APPARATUS AND METHOD FOR FEEDING A FLUID | Non-Final OA | Carl Zeiss SMT GmbH |
| 18868972 | A MEMBRANE AND ASSOCIATED METHOD AND APPARATUS | Non-Final OA | ASML Netherlands B.V. |
| 18863941 | CONTAMINATION DETERMINATION | Final Rejection | ASML Netherlands B.V. |
| 18719902 | METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING | Final Rejection | ASML NETHERLANDS B.V. |
| 18570140 | STRUCTURES FOR USE ON A SUBSTRATE HOLDER, SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS AND METHOD | Non-Final OA | ASML NETHERLANDS B.V. |
| 18570289 | AN ILLUMINATION SOURCE AND ASSOCIATED METHOD APPARATUS | Non-Final OA | ASML NETHERLANDS B.V. |
| 18652438 | DYNAMIC FREEFORM OPTICS FOR LITHOGRAPHY ILLUMINATION BEAM SHAPING | Non-Final OA | KLA Corporation |
| 18954513 | INFLATION HOLDER FOR PHOTOMASK CARRIER | Non-Final OA | GUDENG EQUIPMENT CO., LTD. |
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