Technology area: Chemistry & Materials
8 pending office actions • 4 art units • 7 examiners • 0 of 8 (0%) have an AI response strategy ready • 10 patents granted in the last 365 days
Rohm and Haas Electronic Materials LLC maintains a patent portfolio in the Chemistry & Materials technology area, currently featuring 8 pending office actions. These actions are distributed across 7 distinct examiners and 4 distinct art units. This distribution indicates a range of technical subject matter and multiple parallel prosecution tracks.
CHAMPION, RICHARD DAVID is the busiest examiner, handling 2 busiest examiner pending actions. The remaining pending office actions are spread among the other 7 distinct examiners. This level of activity requires a coordinated management strategy across the 4 distinct art units involved. With 8 pending office actions, the portfolio reflects a distributed prosecution effort.
Based on the USPTO statutory response window for each pending office action. 4 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 4 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 5 (62%) |
| Multi-statute (no §101) | 3 (38%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| CHAMPION, RICHARD DAVID | 2 | 46.2% | +11.1% |
| ANGEBRANNDT, MARTIN J | 1 | 55.5% | +34.1% |
| KARST, DAVID THOMAS | 1 | 64.8% | +9.7% |
| LEE, RIP A | 1 | 83.5% | -4.0% |
| TRAYWICK, ANDREW PRESTON | 1 | 71.9% | +26.9% |
| SHUKLA, KRUPA | 1 | 15.2% | +22.5% |
| MALLOY, ANNA E | 1 | 46.7% | -4.0% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 3 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17631527 | THIN FLEXIBLE GLASS COVER WITH A FRAGMENT RETENTION HARD COATING | SHUKLA, KRUPA | 14d |
| 18537020 | PHOTORESIST UNDERLAYER COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES | ANGEBRANNDT, MARTIN J | — |
| 18482295 | HIGH REFRACTIVE INDEX MATERIALS | LEE, RIP A | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 5 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17631527 | THIN FLEXIBLE GLASS COVER WITH A FRAGMENT RETENTION HARD COATING | SHUKLA, KRUPA | 14d |
| 17462216 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | CHAMPION, RICHARD DAVID | 42d |
| 16731666 | POLYMERS AND PHOTORESIST COMPOSITIONS | CHAMPION, RICHARD DAVID | 42d |
| 18537020 | PHOTORESIST UNDERLAYER COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES | ANGEBRANNDT, MARTIN J | — |
| 18082025 | PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS | TRAYWICK, ANDREW PRESTON | — |
| Art Unit | Apps |
|---|---|
| 1737 | 5 |
| 1767 | 1 |
| 1766 | 1 |
| 1787 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18537020 | PHOTORESIST UNDERLAYER COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES | ANGEBRANNDT, MARTIN J | 1737 | §102§103 | Non-Final OA | — | Pending | Dec 12, 2023 |
| 18521544 | POLYMERS USEFUL AS SURFACE LEVELING AGENTS | KARST, DAVID THOMAS | 1767 | §103 | Final Rejection | — | Pending | Nov 28, 2023 |
| 18482295 | HIGH REFRACTIVE INDEX MATERIALS | LEE, RIP A | 1766 | §102§103 | Non-Final OA | — | Pending | Oct 06, 2023 |
| 18082025 | PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS | TRAYWICK, ANDREW PRESTON | 1737 | §103 | Final Rejection | — | Pending | Dec 15, 2022 |
| 17631527 | THIN FLEXIBLE GLASS COVER WITH A FRAGMENT RETENTION HARD COATING | SHUKLA, KRUPA | 1787 | §103§112 | Final Rejection | 14d | Pending | Jan 31, 2022 |
| 17490923 | IODINE-CONTAINING ACID CLEAVABLE COMPOUNDS, POLYMERS DERIVED THEREFROM, AND PHOTORESIST COMPOSITIONS | MALLOY, ANNA E | 1737 | §103 | Final Rejection | 35d | Pending | Sep 30, 2021 |
| 17462216 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | CHAMPION, RICHARD DAVID | 1737 | §103 | Final Rejection | 42d | Pending | Aug 31, 2021 |
| 16731666 | POLYMERS AND PHOTORESIST COMPOSITIONS | CHAMPION, RICHARD DAVID | 1737 | §103 | Final Rejection | 42d | Pending | Dec 31, 2019 |
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Start Free TrialRohm and Haas Electronic Materials LLC has 8 pending office actions as of October 2026, spread across 4 art units and 7 examiners.
Richard David Champion has the most, with 2 of Rohm and Haas Electronic Materials LLC's pending office actions.
Mostly Chemistry & Materials (USPTO Tech Center 1700), based on where its pending office actions are examined.
