Prosecution Insights
Prosecution Insights
Technology area: Chemistry & Materials
7 pending office actions • 4 art units • 6 examiners • 0 of 7 (0%) have an AI response strategy ready • 9 patents granted in the last 365 days
Rohm and Haas Electronic Materials LLC currently faces 7 pending office actions in the Chemistry & Materials technology area. These matters are assigned to 6 distinct examiners across 4 distinct art units. This structure indicates that while the portfolio is concentrated within a specific technology sector, the prosecution is spread across several specialized groups at the patent office.
CHAMPION, RICHARD DAVID serves as the busiest examiner for the company, managing 2 pending office actions. The remaining pending actions are distributed among the other distinct examiners, contributing to the total of 6 involved in the portfolio. This distribution suggests that most examiners are handling a single case each, providing a broad exposure to different examiner perspectives within the 4 distinct art units.
The presence of 7 pending office actions across these units implies that some groups are handling multiple filings. Practitioners should evaluate the specific requirements of the Chemistry & Materials field to optimize responses. The reliance on 2 pending actions for the busiest examiner ensures that the portfolio's success is not overly dependent on the discretion of a single individual.
Based on the USPTO statutory response window for each pending office action. 4 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 4 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 5 (71%) |
| Multi-statute (no §101) | 2 (29%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| CHAMPION, RICHARD DAVID | 2 | 45.7% | +11.9% |
| KARST, DAVID THOMAS | 1 | 64.7% | +9.8% |
| LEE, RIP A | 1 | 83.5% | -4.2% |
| TRAYWICK, ANDREW PRESTON | 1 | 71.7% | +27.3% |
| SHUKLA, KRUPA | 1 | 15.2% | +22.6% |
| MALLOY, ANNA E | 1 | 46.5% | -3.9% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17631527 | THIN FLEXIBLE GLASS COVER WITH A FRAGMENT RETENTION HARD COATING | SHUKLA, KRUPA | 14d |
| 18482295 | HIGH REFRACTIVE INDEX MATERIALS | LEE, RIP A | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 4 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17631527 | THIN FLEXIBLE GLASS COVER WITH A FRAGMENT RETENTION HARD COATING | SHUKLA, KRUPA | 14d |
| 17462216 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | CHAMPION, RICHARD DAVID | 42d |
| 16731666 | POLYMERS AND PHOTORESIST COMPOSITIONS | CHAMPION, RICHARD DAVID | 42d |
| 18082025 | PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS | TRAYWICK, ANDREW PRESTON | — |
| Art Unit | Apps |
|---|---|
| 1737 | 4 |
| 1767 | 1 |
| 1766 | 1 |
| 1787 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18521544 | POLYMERS USEFUL AS SURFACE LEVELING AGENTS | KARST, DAVID THOMAS | 1767 | §103 | Final Rejection | — | Pending | Nov 28, 2023 |
| 18482295 | HIGH REFRACTIVE INDEX MATERIALS | LEE, RIP A | 1766 | §102§103 | Non-Final OA | — | Pending | Oct 06, 2023 |
| 18082025 | PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS | TRAYWICK, ANDREW PRESTON | 1737 | §103 | Final Rejection | — | Pending | Dec 15, 2022 |
| 17631527 | THIN FLEXIBLE GLASS COVER WITH A FRAGMENT RETENTION HARD COATING | SHUKLA, KRUPA | 1787 | §103§112 | Final Rejection | 14d | Pending | Jan 31, 2022 |
| 17490923 | IODINE-CONTAINING ACID CLEAVABLE COMPOUNDS, POLYMERS DERIVED THEREFROM, AND PHOTORESIST COMPOSITIONS | MALLOY, ANNA E | 1737 | §103 | Final Rejection | 35d | Pending | Sep 30, 2021 |
| 17462216 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | CHAMPION, RICHARD DAVID | 1737 | §103 | Final Rejection | 42d | Pending | Aug 31, 2021 |
| 16731666 | POLYMERS AND PHOTORESIST COMPOSITIONS | CHAMPION, RICHARD DAVID | 1737 | §103 | Final Rejection | 42d | Pending | Dec 31, 2019 |
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