Prosecution Insights
Prosecution Insights
Technology area: Chemistry & Materials
8 pending office actions • 7 art units • 8 examiners • 0 of 8 (0%) have an AI response strategy ready • 6 patents granted in the last 365 days
Yield Engineering Systems Inc. has 8 pending office actions across the Chemistry & Materials technology area. These matters are distributed among 8 distinct examiners, meaning the count of actions matches the count of examiners. The portfolio spans 7 distinct art units, suggesting a broad technical focus within its primary sector. RICE, STEVEN is the busiest examiner, though they are only responsible for 1 pending action.
This distribution shows that no examiner holds a significant portion of the company's active cases. The presence of 8 distinct examiners across 7 distinct art units implies that the prosecution strategy is decentralized, requiring engagement with a variety of USPTO personnel. With 8 pending office actions, the company maintains a steady presence in the Chemistry & Materials area. Because the actions are spread across 7 distinct art units, the company must navigate multiple examination groups simultaneously.
Based on the USPTO statutory response window for each pending office action. 2 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 4 (50%) |
| §102 only | 1 (12%) |
| §112 only | 1 (12%) |
| Multi-statute (no §101) | 2 (25%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| RICE, STEVEN | 1 | 39.3% | +43.7% |
| KURPLE, KARL | 1 | 51.9% | +63.6% |
| MACARTHUR, SYLVIA | 1 | 65.7% | +25.9% |
| REMAVEGE, CHRISTOPHER | 1 | 58.4% | +26.0% |
| SWEELY, KURT D | 1 | 52.8% | +33.9% |
| MOSCOSO, JUAN SALVADOR | 1 | 87.5% | +16.7% |
| LEE, AIDEN Y | 1 | 47.8% | +25.3% |
| SAMUELS, LAWRENCE H | 1 | 56.3% | +37.7% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18223112 | APPARATUS AND METHOD FOR SEPARATING WAFER SLICES | MOSCOSO, JUAN SALVADOR | 70d |
| 18227025 | DUAL CHANNEL FLOW PLATE FOR WET PROCESSING | SWEELY, KURT D | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18223112 | APPARATUS AND METHOD FOR SEPARATING WAFER SLICES | MOSCOSO, JUAN SALVADOR | 70d |
| 18095726 | SUBSTRATE HANDLING DEVICE | LEE, AIDEN Y | 84d |
| 19410608 | Sulfur-Containing Surface Polymers | RICE, STEVEN | — |
| 18975085 | WET PROCESSING DEVICE WITH GAS-LIQUID MIXING | KURPLE, KARL | — |
| 18765916 | WET ETCHING SYSTEM FOR SEMICONDUCTOR SUBSTRATES | MACARTHUR, SYLVIA | — |
| 18373394 | WET PROCESSING WITH AUTOMATIC PROCESS CONTROL | REMAVEGE, CHRISTOPHER | — |
| 18227025 | DUAL CHANNEL FLOW PLATE FOR WET PROCESSING | SWEELY, KURT D | — |
| 18053980 | PLATE GAS HEATER | SAMUELS, LAWRENCE H | — |
| Art Unit | Apps |
|---|---|
| 1718 | 2 |
| 1787 | 1 |
| 1717 | 1 |
| 1716 | 1 |
| 1713 | 1 |
| 3652 | 1 |
| 3761 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19410608 | Sulfur-Containing Surface Polymers | RICE, STEVEN | 1787 | §102 | Final Rejection | — | Pending | Dec 05, 2025 |
| 18975085 | WET PROCESSING DEVICE WITH GAS-LIQUID MIXING | KURPLE, KARL | 1717 | §103 | Non-Final OA | — | Pending | Dec 10, 2024 |
| 18765916 | WET ETCHING SYSTEM FOR SEMICONDUCTOR SUBSTRATES | MACARTHUR, SYLVIA | 1716 | §103 | Non-Final OA | — | Pending | Jul 08, 2024 |
| 18373394 | WET PROCESSING WITH AUTOMATIC PROCESS CONTROL | REMAVEGE, CHRISTOPHER | 1713 | §112 | Non-Final OA | — | Pending | Sep 27, 2023 |
| 18227025 | DUAL CHANNEL FLOW PLATE FOR WET PROCESSING | SWEELY, KURT D | 1718 | §103§112 | Final Rejection | — | Pending | Jul 27, 2023 |
| 18223112 | APPARATUS AND METHOD FOR SEPARATING WAFER SLICES | MOSCOSO, JUAN SALVADOR | 3652 | §102§103 | Final Rejection | 70d | Pending | Jul 18, 2023 |
| 18095726 | SUBSTRATE HANDLING DEVICE | LEE, AIDEN Y | 1718 | §103 | Non-Final OA | 84d | Pending | Jan 11, 2023 |
| 18053980 | PLATE GAS HEATER | SAMUELS, LAWRENCE H | 3761 | §103 | Final Rejection | — | Pending | Nov 09, 2022 |
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