Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1713 1716 1718 1792
This examiner grants 66% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18538419 | INTERNAL PRESSURE CONTROL APPARATUS AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18239101 | DEPOSITION APPARATUS | Non-Final OA | Samsung Display Co., LTD. |
| 18790908 | CHEMICAL MECHANICAL POLISH SLURRY AND METHOD OF MANUFACTURE | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18883149 | FACE-UP WAFER ELECTROCHEMICAL PLANARIZATION APPARATUS | Non-Final OA | Applied Materials, Inc. |
| 18632899 | COMBINED REDUCED PRESSURE -HIGH VACUUM PROCESSING CHAMBER | Non-Final OA | Applied Materials, Inc. |
| 18209649 | SUBSTRATE SUPPORT | Non-Final OA | Applied Materials, Inc. |
| 18139057 | ORIFICE SURROUNDED LOW PRESSURE HYDROXYL COMBUSTION | Non-Final OA | Applied Materials, Inc. |
| 17988083 | METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE | Non-Final OA | Applied Materials, Inc. |
| 18958534 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 18663644 | SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18612873 | SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 17876385 | PLASMA PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
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