Prosecution Insights
Last updated: April 19, 2026

Examiner: MACARTHUR, SYLVIA

Tech Center 1700 • Art Units: 1713 1716 1792

This examiner grants 65% of resolved cases

Performance Statistics

65.1%
Allow Rate
At TC average
981
Total Applications
+25.9%
Interview Lift
1382
Avg Prosecution Days
Based on 948 resolved cases, 2023–2026

Rejection Statute Breakdown

0.3%
§101 Eligibility
29.6%
§102 Novelty
48.8%
§103 Obviousness
10.1%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18231400 SUBSTRATE PROCESSING APPARATUS Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
18239101 DEPOSITION APPARATUS Non-Final OA Samsung Display Co., LTD.
18449103 DEPOSITION SOURCE AND DEPOSITION APPARATUS INCLUDING THE SAME Non-Final OA Samsung Display Co., LTD.
18034350 HEAD FOR HOLDING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS Non-Final OA EBARA CORPORATION
18382421 LIFT PINS INCLUDING OPENING, AND RELATED COMPONENTS AND CHAMBER KITS, FOR PROCESSING CHAMBERS Non-Final OA Applied Materials, Inc.
18139057 ORIFICE SURROUNDED LOW PRESSURE HYDROXYL COMBUSTION Final Rejection Applied Materials, Inc.
17786520 SURFACE PROFILING AND TEXTURING OF CHAMBER COMPONENTS Non-Final OA APPLIED MATERIALS, INC.
18460759 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE Non-Final OA Kioxia Corporation
17652986 SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF PROCESSING OBJECT Final Rejection Kioxia Corporation
18416880 PROCESSING METHOD AND PLASMA PROCESSING APPARATUS Non-Final OA Tokyo Electron Limited
18552108 SUBSTRATE LIQUID-TREATMENT DEVICE Non-Final OA Tokyo Electron Limited
18016943 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD Non-Final OA Tokyo Electron Limited
18053031 SYSTEMS AND METHODS FOR PRODUCING SILICON CARBIDE POWDER Non-Final OA HONEYWELL INTERNATIONAL INC.
18366012 System for Processing Semiconductor Wafer Storage Cassettes, Combinations, and Method of Transporting Non-Final OA ASM IP Holding B.V.
18458491 SUBSTRATE HOLDER, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND RECORDING MEDIUM Non-Final OA Kokusai Electric Corporation
17790009 MIXED METAL BASEPLATES FOR IMPROVED THERMAL EXPANSION MATCHING WITH THERMAL OXIDE SPRAYCOAT Non-Final OA LAM RESEARCH CORPORATION
18533303 SUPPORT MEMBER FOR SUPPORTING A WAFER DURING A HEAT TREATMENT Non-Final OA PATEK PHILIPPE SA GENEVE
18288727 PRODUCING COATED TEXTILES USING PHOTO-INITIATED CHEMICAL VAPOR DEPOSITION Non-Final OA Soliyarn, Inc.
17859723 ETCHING APPARATUS AND METHOD OF CONTROLLING SAME Non-Final OA ZEUS CO., LTD.
17778824 HYBRID CMP CONDITIONING HEAD Non-Final OA Best Engineered Surface Technologies, LLC

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