Listed by the USPTO as ADROVEL, WILLIAM
Tech Center 2800 • Art Units: 2483 2800 2898
This examiner grants 44% of resolved cases
ADROVEL, WILLIAM has 162 resolved cases in tech center 2800 and art unit 2483. The allowance rate is 44.4%, and the interview lift is 52.9%. The median time to allowance is 1,449 days. The profile indicates a comparatively demanding allowance environment, but also a strong recorded association between interviews and improved outcomes.
Taiwan Semiconductor Manufacturing Company, Ltd., Western Digital Technologies Inc., and Azimuth Industrial Company, Inc. are the leading companies. BIRCH STEWART KOLASCH & BIRCH, LLP, FOLEY & LARDNER LLP, and Harrity & Harrity, LLP are the leading firms. Practitioners may want to prepare interview materials early and tie them to precise amendment proposals.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18397325 | SEMICONDUCTOR DEVICE INCLUDING TWO-DIMENSIONAL MATERIAL AND ELECTRONIC DEVICE INCLUDING THE SEMICONDUCTOR DEVICE | Final Rejection | Samsung Electronics Co., Ltd. |
| 18397483 | INTEGRATED CIRCUIT INCLUDING BACKSIDE WIRING AND METHOD OF DESIGNING THE SAME | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18468362 | PACKAGING DEVICE, PACKAGING MODULE, AND ELECTRONIC DEVICE | Final Rejection | Huawei Digital Power Technologies Co., Ltd. |
| 18404584 | ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING THE SAME | Non-Final OA | InnoLux Corporation |
| 18663327 | SEMICONDUCTOR DEVICE | Non-Final OA | DENSO CORPORATION |
| 18523477 | Compound Semiconductor Device for High Power and High Frequency Operation | Non-Final OA | Mitsubishi Electric Research Laboratories, Inc. |
| 18618930 | Memory Circuitry Comprising Strings Of Memory Cells And Method Used In Forming Memory Circuitry Comprising Strings Of Memory Cells | Non-Final OA | Micron Technology, Inc. |
| 18457645 | SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR MEMORY DEVICE | Final Rejection | Kioxia Corporation |
| 18712735 | RADIATION-EMITTING COMPONENT AND METHOD FOR PRODUCING A RADIATION-EMITTING COMPONENT | Non-Final OA | ams-OSRAM International GmbH |
| 18584130 | BACKSIDE VIA FOR BACKSIDE POWER SCHEME | Final Rejection | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18498305 | OXYGEN CONTROL DURING GATE FORMATION FOR IMPROVED CHANNEL MOBILITY | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18469094 | SEMICONDUCTOR MEMORY CELL STRUCTURE INCLUDING A HYDROGEN ABSORPTION LAYER | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18367605 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18434222 | EMBEDDED PASSIVE DEVICES FOR INTEGRATED CIRCUITS AND METHODS OF FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18403418 | SEMICONDUCTOR PACKAGE STRUCTURE AND METHOD OF FORMING SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy44.4% of resolved applications examined by William Adrovel were allowed (162 resolved cases), compared with 63.2% across Art Unit 2483 over the last five years.
This examiner's interview lift is +52.9 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by William Adrovel took 1,449 days on average from filing to allowance.
William Adrovel examines applications in Art Unit 2483 in Tech Center 2800 (Semiconductors, Circuits & Optics).
