Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 1737 2825 2851
This examiner grants 87% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18210836 | PROCESS MODEL GENERATING METHOD, PROCESS PROXIMITY CORRECTION METHOD, AND COMPUTING DEVICE THEREFOR | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18206278 | SEMICONDUCTOR DESIGN OPTIMIZATION SYSTEMS AND METHODS OF OPERATION THEREOF | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18481866 | METHOD AND APPARATUS FOR SIMULATION MODELLING | Non-Final OA | TEXAS INSTRUMENTS INCORPORATED |
| 18370634 | COMPUTER-READABLE RECORDING MEDIUM, DESIGN SUPPORTING METHOD, AND DESIGN SUPPORTING APPARATUS | Non-Final OA | Fujitsu Limited |
| 18512411 | CONDUCTOR SCHEME SELECTION AND TRACK PLANNING FOR MIXED-DIAGONAL-MANHATTAN ROUTING | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18452947 | NON-RECTANGULAR CELL LAYOUT METHOD AND SYSTEM | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18355889 | PREVENTING GATE-TO-CONTACT BRIDGING BY REDUCING CONTACT DIMENSIONS IN FINFET SRAM | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18346113 | METHOD OF PRODUCING MASK DATA FOR SEMICONDUCTOR DEVICE MANUFACTURING | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18378633 | METHOD TO DERIVE THE LOCATION AND SIZE OF OXIDE SPACING AREA | Non-Final OA | UNITED MICROELECTRONICS CORP. |
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