Listed by the USPTO as CHI, SUBERR L
Tech Center 2800 • Art Units: 2800 2817 2818 2829 2893 2898
This examiner grants 85% of resolved cases
CHI, SUBERR L works in tech center 2800 and art unit 2800, with 663 resolved cases. The allowance rate is 84.6%, and the median time to allowance is 1017 days. The interview lift is 2.7%, indicating only a small positive association compared with the favorable allowance rate.
The leading companies are Samsung Electronics Co., Ltd., Taiwan Semiconductor Manufacturing Company, Ltd., and United Microelectronics Corp. The leading firms are CHRISTENSEN O'CONNOR JOHNSON KINDNESS PLLC, CROWE & DUNLEVY - ST, and F. CHAU & ASSOCIATES, LLC. Practitioners can prioritize clear written prosecution and use interviews selectively.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18637849 | MAGNETIC TUNNELING JUNCTION DEVICE AND MEMORY DEVICE INCLUDING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18628099 | IMAGE SENSORS AND METHODS OF FABRICATING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18649886 | FIELD-EFFECT TRANSISTOR AND METHOD FOR PRODUCING A FIELD-EFFECT TRANSISTOR | Non-Final OA | Robert Bosch GmbH |
| 18427571 | DISPLAY DEVICE | Non-Final OA | LG Display Co., Ltd. |
| 18732807 | DISPLAY DEVICE AND A METHOD FOR MANUFACTURING THE SAME | Non-Final OA | SAMSUNG DISPLAY CO., LTD. |
| 18577992 | Display Substrate, Manufacturing Method therefor, and Display Device | Non-Final OA | BOE Technology Group Co., Ltd. |
| 17886278 | ALTERNATING HIGH K LAYERS ON GLASS PILLARS FOR SUPER CAPACITORS ON GLASS SUBSTRATES | Non-Final OA | Intel Corporation |
| 17883736 | THICK GATE OXIDE TRANSISTOR DEVICE AND METHOD | Non-Final OA | Micron Technology, Inc. |
| 18618447 | OPTICAL PACKAGE WITH ELECTROMAGNETIC SHIELDING | Non-Final OA | STMicroelectronics International N.V. |
| 18582288 | BACK END LINE OF MEMORY DEVICE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18488953 | MANUFACTURING METHOD OF LAYOUT STRUCTURE OF STORAGE CELL | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 18673546 | ISOLATION STRUCTURES IN TRANSISTOR DEVICES AND METHODS OF FORMING | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18519092 | SEMICONDUCTOR DEVICE | Final Rejection | UNITED MICROELECTRONICS CORP. |
| 18502091 | MEMORY STRUCTURE AND MANUFACTURING METHOD THEREOF | Final Rejection | United Microelectronics Corp. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy84.6% of resolved applications examined by Suberr L Chi were allowed (663 resolved cases), compared with 69.7% across Art Unit 2800 over the last five years.
This examiner's interview lift is +2.7 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Suberr L Chi took 1,017 days on average from filing to allowance.
Suberr L Chi examines applications in Art Unit 2800 in Tech Center 2800 (Semiconductors, Circuits & Optics).
