Listed by the USPTO as CIESLEWICZ, ANETA B
Tech Center 2800 • Art Units: 2817 2829 2893
This examiner grants 67% of resolved cases
CIESLEWICZ, ANETA B has resolved 245 cases in Tech Center 2800 and Art Unit 2817. The allowance rate is 66.9%, while the median time to allowance is 1184 days. The record shows allowance in a majority of resolved cases, but the median timeline suggests that applicants should anticipate sustained prosecution.
The interview lift is 0.2%, indicating almost no measured association between interviews and allowance in this profile. The leading companies are Taiwan Semiconductor Manufacturing Company, Ltd., Samsung Electronics Co., Ltd., and Semiconductor Components Industries LLC. The leading firms are onsemi (BHB), BIRCH STEWART KOLASCH & BIRCH, LLP, and Calfee, Halter & Griswold LLP. Written claim strategy may deserve priority over interview-centered planning.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18745431 | METHOD OF MANUFACTURING SEMICONDUCTOR PACKAGES | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18394974 | ELECTRONIC DEVICE AND MANUFACTURING METHOD THEREOF | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 17933555 | LIGHT EMITTING DEVICE, DISPLAY DEVICE, PHOTOELECTRIC CONVERSION DEVICE, ELECTRONIC APPARATUS, ILLUMINATION DEVICE, AND MOVING BODY | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18407446 | DISPLAY DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE | Non-Final OA | Samsung Display Co., Ltd. |
| 18689267 | DISPLAY PANEL AND MANUFACTURING METHOD THEREFOR, AND DISPLAY APPARATUS | Non-Final OA | BOE TECHNOLOGY GROUP CO., LTD. |
| 16210922 | METHOD OF FORMING A STRUCTURE INCLUDING SILICON NITRIDE ON TITANIUM NITRIDE AND STRUCTURE FORMED USING THE METHOD | Non-Final OA | ASM IP Holding B.V. |
| 18427756 | METHODS OF FORMING APPARATUS COMPRISING CRYSTALLINE SEMICONDUCTOR MATERIALS AND METAL SILICIDE MATERIALS, AND RELATED APPARATUS | Non-Final OA | Micron Technology, Inc. |
| 18621708 | SEMICONDUCTOR DEVICES WITH GUARD RING STRUCTURES | Non-Final OA | TEXAS INSTRUMENTS INCORPORATED |
| 18685636 | ELASTIC MEMBER AND DISPLAY DEVICE COMPRISING SAME | Final Rejection | LG INNOTEK CO., LTD. |
| 18434787 | STACKED FIELD EFFECT TRANSISTORS WITH CLADDING SILICON GERMANIUM PFET CHANNEL | Non-Final OA | International Business Machines Corporation |
| 18404233 | EPITAXIAL STRUCTURES IN SEMICONDUCTOR DEVICES | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 17460909 | SEMICONDUCTOR STRUCTURE HAVING VERTICLE CONDUCTIVE GRAPHENE AND METHOD FOR FORMING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18524386 | MODIFYING TSV LAYOUT AND THE STRUCTURES THEREOF | Final Rejection | Taiwan Semiconductor Manufacturing Co. Ltd. |
| 18592284 | CHIP PACKAGE ASSEMBLY WITH ON-PACKAGE CONTAINMENT SYSTEM | Non-Final OA | Advanced Micro Devices, Inc. |
| 18383055 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | Final Rejection | UNITED MICROELECTRONICS CORP. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy66.9% of resolved applications examined by Aneta B Cieslewicz were allowed (245 resolved cases), compared with 81.7% across Art Unit 2817 over the last five years.
This examiner's interview lift is +0.2 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Aneta B Cieslewicz took 1,184 days on average from filing to allowance.
Aneta B Cieslewicz examines applications in Art Unit 2817 in Tech Center 2800 (Semiconductors, Circuits & Optics).
