Listed by the USPTO as GASSEN, CHRISTOPHER J
Tech Center 2800 • Art Units: 2863 2881
This examiner grants 80% of resolved cases
GASSEN, CHRISTOPHER J is assigned to USPTO tech center 2800 and art unit 2863. The profile includes 142 resolved cases, an allowance rate of 80.3%, and a median of 1027 days to allowance. The interview lift is 24.1%, indicating that interviews can be a useful component of prosecution planning alongside written responses.
The listed companies are ASML Holding N.V., Applied Materials Inc., and Sharp Display Technology Corporation. The listed firms are FOLEY & LARDNER LLP, Pillsbury Winthrop Shaw Pittman, LLP, and Advent, LLP. The 1027-day median gives practitioners a concrete timing reference, while the allowance and interview figures support proactive issue resolution.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18888725 | QUANTUM RANDOM NUMBER GENERATION DEVICE | Non-Final OA | Mitsubishi Electric Corporation |
| 18634129 | USE OF OPTICAL POLARIZATION STATES TO CONTROL A PONDEROMOTIVE PHASE PLATE | Non-Final OA | The Regents of the University of California |
| 18593000 | PATTERN SHAPE MEASUREMENT METHOD, PATTERN SHAPE MEASUREMENT DEVICE, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | Final Rejection | Kioxia Corporation |
| 18261484 | LIGHT IRRADIATOR | Non-Final OA | KYOCERA CORPORATION |
| 18838013 | Ion Milling Device | Final Rejection | Hitachi High-Tech Corporation |
| 18257941 | ION SOURCE, MASS SPECTROMETER, AND CAPILLARY INSERTION METHOD | Final Rejection | HITACHI HIGH-TECH CORPORATION |
| 18904192 | APPARATUS FOR ION ENERGY ANALYSIS OF PLASMA PROCESSES | Non-Final OA | Applied Materials, Inc. |
| 18388490 | ION ANGLE SENSOR | Non-Final OA | Applied Materials, Inc. |
| 18384253 | SEMICONDUCTOR PROCESS APPARATUS AND METHOD | Non-Final OA | Taiwan Semiconductor Manufacturing Company LTD |
| 18360170 | METHOD FOR ATTACHING AN OBJECT TO A MANIPULATOR AND FOR MOVING THE OBJECT IN A PARTICLE BEAM APPARATUS, COMPUTER PROGRAM PRODUCT, AND PARTICLE BEAM APPARATUS | Final Rejection | Carl Zeiss Microscopy GmbH |
| 18871448 | ISOLATING SPACER FOR ELECTRON-OPTICAL ASSEMBLY | Non-Final OA | ASML NETHERLANDS B.V. |
| 18702508 | FUEL DROPLET NOZZLE ASSEMBLY | Non-Final OA | ASML Netherlands B.V. |
| 18016811 | METHOD AND APPARATUS FOR IDENTIFYING CONTAMINATION IN A SEMICONDUCTOR FAB | Non-Final OA | ASML NETHERLANDS B.V. |
| 19006759 | Ion Source | Non-Final OA | SHIMADZU CORPORATION |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy80.3% of resolved applications examined by Christopher J Gassen were allowed (142 resolved cases), compared with 67.8% across Art Unit 2863 over the last five years.
This examiner's interview lift is +24.1 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Christopher J Gassen took 1,027 days on average from filing to allowance.
Christopher J Gassen examines applications in Art Unit 2863 in Tech Center 2800 (Semiconductors, Circuits & Optics).
