Prosecution Insights
Last updated: October 26, 2026

David J Goodwin, USPTO Patent Examiner

Listed by the USPTO as GOODWIN, DAVID J

Tech Center 4100 • Art Units: 2817 2818 4100

This examiner grants 67% of resolved cases

Analysis

GOODWIN, DAVID J is assigned to tech center 4100 and art unit 2817. The record includes 824 resolved cases, a 67.2% allowance rate, and a median of 1179 days to allowance. The volume provides a substantial basis for evaluating likely outcomes, while the median timing should be included in portfolio and commercialization planning.

Interviews correspond to a 16.7% allowance lift. Practitioners may use interviews to focus claim amendments, explain technical distinctions, and identify issues that can be resolved without unnecessary exchanges. The principal companies are Taiwan Semiconductor Manufacturing Company, Ltd., Samsung Electronics Co., Ltd., and Micron Technology Inc. The firms listed are Morgan, Lewis & Bockius LLP (WA)(SEC), BIRCH STEWART KOLASCH & BIRCH, LLP, and Dorsey & Whitney LLP - MTI (Nelson).

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

67.2%
Allow Rate
+7.2% vs TC avg
906
Total Applications
+16.7%
Interview Lift
1179
Avg Prosecution Days
Based on 824 resolved cases, 2023–2026

Rejection Statute Breakdown

0.1%
§101 Eligibility
18.0%
§102 Novelty
59.9%
§103 Obviousness
18.9%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
17761516 DISPLAY DEVICE USING MICRO LED, AND MANUFACTURING METHOD THEREFOR Final Rejection LG ELECTRONICS INC.
18442274 GATE STRUCTURE AND SEMICONDUCTOR DEVICE INCLUDING THE SAME Final Rejection Samsung Electronics Co., Ltd.
18402021 SEMICONDUCTOR PACKAGE AND METHOD FOR MANUFACTURING THE SAME Final Rejection SAMSUNG ELECTRONICS CO., LTD.
18086086 SEMICONDUCTOR DEVICES AND DATA STORAGE SYSTEMS INCLUDING THE SAME Final Rejection SAMSUNG ELECTRONICS CO., LTD.
17659135 SEMICONDUCTOR DEVICE Final Rejection SAMSUNG ELECTRONICS CO., LTD.
18825338 LIGHT EMITTING DISPLAY DEVICE Non-Final OA LG DISPLAY CO., LTD.
18415383 Light Emitting Element Display Device Final Rejection LG Display Co., Ltd.
17749806 Display Device Non-Final OA LG Display Co., Ltd.
18745789 DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME Non-Final OA Samsung Display Co., Ltd.
18564966 SOLID-STATE IMAGING DEVICE AND ELECTRONIC DEVICE Non-Final OA SONY SEMICONDUCTOR SOLUTIONS CORPORATION
18565028 DISPLAY PANEL AND MANUFACTURING METHOD THEREOF Final Rejection BOE Technology Group Co., Ltd.
18519172 METHOD OF FORMING AN ORGANIC POLYMER COMPRISING POLYIMIDE Final Rejection ASM IP Holding B.V.
18051543 ELECTRONIC DEVICE Final Rejection InnoLux Corporation
18403007 METHODS FOR MECHANICAL SELF-ALIGNMENT AND SLIP-RESISTANCE IN BONDING SEMICONDUCTOR SUBSTRATES, AND SEMICONDUCTOR DEVICES COMPRISING MECHANICAL SELF-ALIGNMENT STRUCTURES Non-Final OA Micron Technology, Inc.
18238848 HIGH VOLTAGE DEVICE AND METHOD Final Rejection Micron Technology, Inc.
17943104 TIGHTLY-COUPLED RANDOM ACCESS MEMORY INTERFACE SHIM DIE Final Rejection Micron Technology, Inc.
17884775 FORMATION OF MEMORY DIE AND LOGIC DIE WITH WAFER-ON-WAFER BOND Non-Final OA Micron Technology, Inc.
17673309 ELASTIC BONDING LAYERS FOR SEMICONDUCTOR DIE ASSEMBLIES AND ASSOCIATED SYSTEMS AND METHODS Non-Final OA Micron Technology, Inc.
17975071 CONDUCTIVE PERFORATED PLATE FOR ELECTRICAL TEST Final Rejection TEXAS INSTRUMENTS INCORPORATED
18771873 METHOD OF FORMING HARD MASK STRUCTURE Non-Final OA Tokyo Electron Limited
18742922 INCREASED CONTACT AREA FOR SELF-ALIGNED GATE ISOLATION Non-Final OA International Business Machines Corporation
18607634 BACKSIDE SELF-ALIGNED DIFFUSION BREAKS Non-Final OA International Business Machines Corporation
17983863 DIAGONAL WIRING LEVEL WITH SKIP-LEVEL VIA CONNECTIONS Final Rejection International Business Machines Corporation
18665627 NITRIDE SEMICONDUCTOR MODULE Non-Final OA ROHM CO., LTD.
18344857 METHOD OF FABRICATING SEMICONDUCTOR STRUCTURE Final Rejection Taiwan Semiconductor Manufacturing Company, Ltd.
17729893 Metal Contact Isolation and Methods of Forming the Same Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
17105341 SEMICONDUCTOR DEVICE STRUCTURE, STACKED SEMICONDUCTOR DEVICE STRUCTURE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE STRUCTURE Final Rejection Taiwan Semiconductor Manufacturing Company, Ltd.
18782253 MULTI-LEVEL STACKING OF WAFERS AND CHIPS Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18648917 Die Stacking Structure and Method Forming Same Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18747849 SEMICONDUCTOR STRUCTURE AND METHOD OF MAKING Non-Final OA TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED

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Frequently Asked Questions

What is examiner David J Goodwin's allowance rate?

67.2% of resolved applications examined by David J Goodwin were allowed (824 resolved cases), compared with 81.7% across Art Unit 2817 over the last five years.

Does an interview help with examiner David J Goodwin?

This examiner's interview lift is +16.7 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.

How long does examiner David J Goodwin take to allow a patent?

Applications allowed by David J Goodwin took 1,179 days on average from filing to allowance.

Which art unit does examiner David J Goodwin work in?

David J Goodwin examines applications in Art Unit 2817 in Tech Center 4100.

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