Prosecution Insights
Last updated: October 01, 2026

Examiner: HARBOTTLE, CHARLOTTE ELIZABETH

Tech Center 4100 • Art Units: 2814 2818 4100

This examiner grants 100% of resolved cases

Analysis

Charlotte Elizabeth Harbottle is an examiner in Tech Center 4100 and Art Unit 2814. The data shows 1 resolved case, which resulted in an allowance rate of 100.0%. The median days to allowance for this single case was 945. Because there is only 1 resolved case, these figures represent a very limited sample size for evaluating the examiner's long-term tendencies.

The interview lift is 0.0%, indicating that no change in the allowance probability was observed in this single instance. The 100.0% allowance rate and 945-day median are the only available metrics for this examiner. Practitioners should note that with only 1 resolved case, these numbers may not predict future performance in Art Unit 2814.

The 945-day timeline for the single resolved case provides a solitary data point for pendency. In Tech Center 4100, this 100.0% allowance rate reflects a successful outcome for the applicant involved. However, the 0.0% interview lift and the single case resolution mean that more data is needed to establish a reliable profile.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

100.0%
Allow Rate
+40.0% vs TC avg
7
Total Applications
+0.0%
Interview Lift
945
Avg Prosecution Days
Based on 1 resolved cases, 2023–2026

Rejection Statute Breakdown

0%
§101 Eligibility
11.6%
§102 Novelty
74.4%
§103 Obviousness
14.0%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18603426 ELECTROSTATIC DISCHARGE PROTECTION DEVICE Non-Final OA MEDIATEK INC.
18740625 MEMORY DEVICE WITH MULTIPLE MEMORY CELL ARCHITECTURES Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18600172 INTEGRATED CIRCUIT PACKAGES WITH THERMAL RESERVOIR DIES AND METHODS OF FORMING THE SAME Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18618354 INTEGRATING NITRIDE STRESS COMPENSATION LAYERS FOR THICK OXIDE WAFER CREATION Final Rejection Tokyo Electron Limited
18594605 SEMICONDUCTOR DEVICE FOR AUDIO Final Rejection ROHM CO., LTD.
18736843 METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURE INCLUDING NITROGEN TREATMENT AND SEMICONDUCTOR STRUCTURE THEREOF Final Rejection NANYA TECHNOLOGY CORPORATION
18839510 SOLID-STATE IMAGING ELEMENT, AND METHOD FOR MANUFACTURING SOLID-STATE IMAGING ELEMENT Non-Final OA HAMAMATSU PHOTONICS K.K.

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