Listed by the USPTO as HATFIELD, MARSHALL MU-NUO
Tech Center 2800 • Art Units: 2897
This examiner grants 93% of resolved cases
HATFIELD, MARSHALL MU-NUO works in tech center 2800 and art unit 2897. The profile covers 96 resolved cases, with an allowance rate of 92.7% and a median of 1237 days to allowance. The interview lift is 4.4%, indicating a positive but limited association between interviews and allowance outcomes.
The leading companies are Samsung Electronics Co., Ltd., Samsung Display Co., Ltd., and Taiwan Semiconductor Manufacturing Company, Ltd. The listed firms are Muir Patent Law, PLLC, Akona IP PC - Intel, and FINNEGAN, HENDERSON, FARABOW, GARRETT & DUNNER. The allowance record is favorable, although the median timeline supports careful attention to pendency.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18646834 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18637650 | SEMICONDUCTOR DEVICES | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18378182 | SEMICONDUCTOR DEVICE | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18341644 | DEVICE, SYSTEM, AND MOVING BODY | Final Rejection | CANON KABUSHIKI KAISHA |
| 18669814 | APPARATUS FOR MANUFACTURING DISPLAY DEVICE, METHOD OF MANUFACTURING DISPLAY DEVICE USING APPARATUS FOR MANUFACTURING DISPLAY DEVICE, AND DISPLAY DEVICE MANUFACTURED BY METHOD OF MANUFACTURING DISPLAY DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 17676045 | DISPLAY DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 18694526 | SWITCH STRUCTURE, METHOD FOR PREPARING SAME, AND RF CHIP | Non-Final OA | BOE Technology Group Co., Ltd. |
| 17935647 | INTEGRATED CIRCUIT DEVICES WITH CONTACTS USING NITRIDIZED MOLYBDENUM | Non-Final OA | Intel Corporation |
| 18278500 | PINNED PHOTODIODE PIXEL | Final Rejection | ams-OSRAM Asia Pacific Pte. Ltd. |
| 18826180 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | Non-Final OA | SK hynix Inc. |
| 18789164 | METAL FUSE STRUCTURE BY VIA LANDING | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18782515 | TUNING GATE LENGTHS IN MULTI-GATE FIELD EFFECT TRANSISTORS | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18733434 | SEMICONDUCTOR LIGHT-EMITTING APPARATUS | Final Rejection | NIKKISO CO., LTD. |
| 18677613 | HEAT TREATMENT METHOD FOR HEATING SUBSTRATE BY LIGHT IRRADIATION | Final Rejection | SCREEN Holdings Co., Ltd. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy92.7% of resolved applications examined by Marshall Mu-Nuo Hatfield were allowed (96 resolved cases), compared with 82.9% across Art Unit 2897 over the last five years.
This examiner's interview lift is +4.4 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Marshall Mu-Nuo Hatfield took 1,237 days on average from filing to allowance.
Marshall Mu-Nuo Hatfield examines applications in Art Unit 2897 in Tech Center 2800 (Semiconductors, Circuits & Optics).
