Prosecution Insights
Last updated: October 26, 2026

Moataz Khalifa, USPTO Patent Examiner

Listed by the USPTO as KHALIFA, MOATAZ

Tech Center 2800 • Art Units: 2815 2817

This examiner grants 91% of resolved cases

Analysis

KHALIFA, MOATAZ is a USPTO patent examiner in tech center 2800 and art unit 2815. The profile covers 66 resolved cases, with an allowance rate of 90.9% and a median of 1263 days to allowance. Interview lift is 2.3%, indicating only a modestly higher allowance outcome for the interview-associated cases in the recorded history.

The listed companies are Samsung Electronics Co., Ltd., International Business Machines Corporation, and Taiwan Semiconductor Manufacturing Company, Ltd. The leading firms are CANTOR COLBURN LLP, Harrity & Harrity, LLP, and RYAN, MASON & LEWIS, LLP. The allowance rate is a useful historical signal, although the relatively limited case volume makes individual matters important to assess on their own facts. The median timing remains relevant for prosecution planning.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

90.9%
Allow Rate
+22.9% vs TC avg
122
Total Applications
+2.3%
Interview Lift
1263
Avg Prosecution Days
Based on 66 resolved cases, 2023–2026

Rejection Statute Breakdown

0%
§101 Eligibility
20.5%
§102 Novelty
72.8%
§103 Obviousness
4.5%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18672227 SEMICONDUCTOR DEVICE Non-Final OA Samsung Electronics Co., Ltd.
17875208 DISPLAY PANEL AND ELECTRONIC DEVICE INCLUDING THE SAME Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
17649217 SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
17896335 DISPLAY PANEL AND DISPLAY DEVICE INCLUDING THE SAME Non-Final OA Samsung Display Co., LTD.
18840037 SOLID-STATE IMAGING DEVICE AND ELECTRONIC APPARATUS Non-Final OA SONY SEMICONDUCTOR SOLUTIONS CORPORATION
18839216 LIGHT RECEIVING DEVICE AND ELECTRONIC APPARATUS Non-Final OA SONY SEMICONDUCTOR SOLUTIONS CORPORATION
18527799 STACKED NANOSHEET DEVICES WITH INTERFACIAL LAYERS Non-Final OA International Business Machines Corporation
18061701 NANOSHEET METAL-INSULATOR-METAL CAPACITOR Non-Final OA INTERNATIONAL BUSINESS MACHINES CORPORATION
17992373 SEMICONDUCTOR STRUCTURE WITH STRAINED NANOSHEET CHANNEL Non-Final OA International Business Machines Corporation
17662859 INTERLEVEL VIA FOR STACKED FIELD-EFFECT TRANSISTOR DEVICE Non-Final OA INTERNATIONAL BUSINESS MACHINES CORPORATION
17863647 SILICIDES, ALLOYS AND INTERMETALLICS TO MINIMIZE RESISTANCE Final Rejection Applied Materials, Inc.
18789206 SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18656666 EPITAXIAL STRUCTURE FOR SEMICONDUCTOR DEVICES AND METHOD FORMING THEREOF Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
17805109 SEMICONDUCTOR PACKAGE AND METHODS OF MANUFACTURING Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
17825411 SEMICONDUCTOR DEVICE INCLUDING GRAPHENE BARRIER AND METHOD OF FORMING THE SAME Final Rejection TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
17657428 BACKSIDE METALLIZATION FOR SEMICONDUCTOR ASSEMBLY Final Rejection Qorvo US, Inc.

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Frequently Asked Questions

What is examiner Moataz Khalifa's allowance rate?

90.9% of resolved applications examined by Moataz Khalifa were allowed (66 resolved cases), compared with 61.3% across Art Unit 2815 over the last five years.

Does an interview help with examiner Moataz Khalifa?

This examiner's interview lift is +2.3 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.

How long does examiner Moataz Khalifa take to allow a patent?

Applications allowed by Moataz Khalifa took 1,263 days on average from filing to allowance.

Which art unit does examiner Moataz Khalifa work in?

Moataz Khalifa examines applications in Art Unit 2815 in Tech Center 2800 (Semiconductors, Circuits & Optics).

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