Tech Center 2800 • Art Units: 2855 2877
This examiner grants 78% of resolved cases
Kaitlyn Elizabeth Kidwell, an examiner in Tech Center 2800 and Art Unit 2855, has resolved 50 cases. The allowance rate is 78.0 percent, and the median days to allowance is 899. These metrics suggest a high probability of success and an efficient path to patent issuance, with nearly eight out of ten applications reaching a grant.
The interview lift is 20.0 percent, showing that interviews are a very effective way to advance prosecution. This significant lift suggests that direct communication can help bridge the gap between the examiner's position and the applicant's claims. Practitioners should consider interviews as a standard part of their strategy to resolve any outstanding issues and secure an allowance more effectively than the 78.0 percent baseline.
For practitioners, the strategy with Kidwell should be to utilize the 20.0 percent interview lift whenever rejections are encountered. The 78.0 percent allowance rate is very favorable, and the 899 median days to allowance indicates a fast pace. Clear communication and early interviews are likely to result in a successful and efficient prosecution experience in Art Unit 2855.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18505965 | Electronic Device with Optical Angle Sensor | Final Rejection | Apple Inc. |
| 19194339 | Surface Inspection Apparatus and Method | Non-Final OA | ABB Schweiz AG |
| 18762221 | PHOTOMETRIC APPARATUS AND PHOTOMETRIC METHOD | Non-Final OA | Konica Minolta, Inc. |
| 18238051 | OPTICAL DEFECT DETECTION SYSTEM | Non-Final OA | RTX Corporation |
| 18795616 | OPTICAL FIBER CHARACTERISTICS MEASUREMENT APPARATUS | Non-Final OA | Yokogawa Electric Corporation |
| 18316199 | UTILITY POLE INTEGRITY ASSESSMENT BY DAS AND MACHINE LEARNING USING ENVIRONMENTAL NOISE | Final Rejection | NEC Laboratories America, Inc. |
| 19032136 | METHOD FOR INSPECTING SEMICONDUCTOR DEVICE AND SYSTEM THEREOF | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 18557557 | SUBSTRATE STATE MEASUREMENT DEVICE, PLATING APPARATUS, AND SUBSTRATE STATE MEASUREMENT METHOD | Final Rejection | EBARA CORPORATION |
| 18580062 | OPTICAL ELEMENT FOR USE IN METROLOGY SYSTEMS | Non-Final OA | ASML NETHERLANDS B.V. |
| 19071685 | VARIABLE WAVELENGTH INTERFEROMETRY | Non-Final OA | Onto Innovation Inc. |
| 18842802 | SPECTRUM SCANNING ASSEMBLY AND OPTICAL SEMICONDUCTOR ELEMENT | Non-Final OA | INNOLIGHT TECHNOLOGY (SUZHOU) LTD. |
| 18435533 | Waveguide Defect Control | Non-Final OA | Dualitas Ltd |
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