Tech Center 1700 • Art Units: 1712 1716
This examiner grants 44% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18224312 | DEPOSITION APPARATUS | Non-Final OA | Samsung Display Co., LTD. |
| 18521813 | POLISHING APPARATUS | Non-Final OA | EBARA CORPORATION |
| 16207958 | POLISHING APPARATUS AND POLISHING METHOD | Non-Final OA | EBARA CORPORATION |
| 17893430 | CLAMPED DUAL-CHANNEL SHOWERHEAD | Non-Final OA | Applied Materials, Inc. |
| 17874873 | SUSCEPTOR SUPPORT ASSEMBLY FOR CHEMICAL VAPOR DEPOSITION CHAMBERS | Final Rejection | Applied Materials, Inc. |
| 17831781 | PLASMA CHAMBER WITH A MULTIPHASE ROTATING CROSS-FLOW WITH UNIFORMITY TUNING | Non-Final OA | Applied Materials, Inc. |
| 17380788 | FACE-UP WAFER EDGE POLISHING APPARATUS | Non-Final OA | Applied Materials, Inc. |
| 17232563 | VALVE BOX MODULE, SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 18171683 | TOOLS AND METHODS FOR SURFACE LEVELING | Final Rejection | Intel Corporation |
| 18044184 | GAS SUPPLY SYSTEM AND GAS SUPPLY METHOD | Non-Final OA | FUJIKIN INCORPORATED |
| 18181295 | SUBSTRATE PROCESSING APPARATUS | Non-Final OA | SCREEN Holdings Co., Ltd. |
| 18175995 | SUBSTRATE PROCESSING APPARATUS | Final Rejection | SCREEN Holdings Co., Ltd. |
| 18325423 | ETCHING METHOD AND PLASMA PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 17342809 | STAGE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD | Final Rejection | Tokyo Electron Limited |
| 17883128 | METHOD FOR MANUFACTURING SEMICONDUCTOR WAFER WITH WAFER CHUCK HAVING FLUID GUIDING STRUCTURE | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
| 18394198 | APPARATUS AND METHOD FOR TREATING SUBSTRATE | Non-Final OA | SEMES CO., LTD. |
| 18408369 | ETCHING DEVICE AND ETCHING METHOD | Non-Final OA | ULVAC, INC. |
| 18181152 | COMPONENT FOR FILM FORMATION APPARATUS OR ETCHING APPARATUS | Non-Final OA | AGC Inc. |
| 18187342 | ELECTRON EXCITATION ATOMIC LAYER ETCH | Non-Final OA | Lam Research Corporation |
| 18516653 | CARRIER DEVICE AND SEMICONDUCTOR PROCESSING EQUIPMENT | Non-Final OA | BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD. |
| 16761642 | OPTICAL ELEMENTS HOLDER DEVICE FOR A COATING STATION | Non-Final OA | SATISLOH AG |
| 18562791 | GAS-INLET ELEMENT FOR A CVD REACTOR | Non-Final OA | AIXTRON SE |
| 17758667 | LIQUID CHEMICAL PROCESSING DEVICE | Final Rejection | DAIKIN FINETECH, LTD. |
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