Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 1712 1713 1716 1718 1759 2897
This examiner grants 44% of resolved cases
Margaret D Klunk is a patent examiner currently serving in Tech Center 2800 and Art Unit 1712. Over the course of their career, this examiner has reached a final decision on 443 resolved cases. This total includes all applications that have been either granted as patents or abandoned by the applicants. This history of 443 resolved cases provides a statistical foundation for understanding the examiner's decision-making patterns within Art Unit 1712 and Tech Center 2800.
The data shows an allowance rate of 44.0 percent, which reflects the frequency with which applications are successfully prosecuted to a grant. For those applications that achieve an allowance, the median days to allowance is 1388. This duration represents the middle point of the timeline for successful cases, meaning that the prosecution process often requires a commitment of 1388 days to reach a favorable conclusion. This 44.0 percent allowance rate is a critical metric for managing applicant expectations.
Furthermore, the interview lift is 31.5 percent. This 31.5 percent lift indicates the increase in the probability of receiving a grant when an interview is conducted compared to the baseline allowance rate of 44.0 percent. The relationship between the allowance rate and the interview lift suggests that direct engagement with the examiner is a productive strategy. Practitioners may find that this lift is a vital tool for navigating the typical prosecution timeline.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18224312 | DEPOSITION APPARATUS | Final Rejection | Samsung Display Co., LTD. |
| 17896218 | CVD APPARATUS AND METHOD FOR CLEANING CHAMBER OF CVD APPARATUS | Final Rejection | ASM IP Holding B.V. |
| 17895370 | SEALING SYSTEM FOR A REACTOR SYSTEM | Non-Final OA | ASM IP Holding B.V. |
| 18531857 | SHIELDING PLASMA ETCHING DATA COLLECTION WINDOWS USING POSITIVELY CHARGED CONDUCTIVE FILMS | Non-Final OA | International Business Machines Corporation |
| 18758576 | EDGE RING ARRANGEMENT WITH MOVEABLE EDGE RINGS | Non-Final OA | LAM RESEARCH CORPORATION |
| 17912358 | CERAMIC ADDITIVE MANUFACTURING TECHNIQUES FOR GAS INJECTORS | Non-Final OA | Lam Research Corporation |
| 18282292 | ETCHING PLASMA PROCESSING APPARATUS INCLUDING CONSUMABLE METAL MEMBER | Final Rejection | Research & Business Foundation SUNGKYUNKWAN UNIVERSITY |
| 17232563 | VALVE BOX MODULE, SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 18787915 | SYSTEM AND METHOD FOR PLASMA ENHANCED ATOMIC LAYER DEPOSITION WITH PROTECTIVE GRID | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18646597 | NOZZLE ASSEMBLY FOR A FLUID RECOVERY SYSTEM | Non-Final OA | Applied Materials, Inc. |
| 18442378 | METHOD AND APPARATUS FOR SUBSTRATE NOTCH SENSING ON CMP HEAD FOR LOCAL PLANARIZATION | Non-Final OA | Applied Materials, Inc. |
| 18484165 | PEDESTAL HEATER WITH SUBSTRATE TEMPERATURE MEASUREMENT SYSTEM | Non-Final OA | Applied Materials, Inc. |
| 18233760 | APPARATUS DESIGN FOR FILM REMOVAL FROM THE BEVEL AND EDGE OF THE SUBSTRATE | Non-Final OA | Applied Materials, Inc. |
| 17893430 | CLAMPED DUAL-CHANNEL SHOWERHEAD | Final Rejection | Applied Materials, Inc. |
| 17831781 | PLASMA CHAMBER WITH A MULTIPHASE ROTATING CROSS-FLOW WITH UNIFORMITY TUNING | Non-Final OA | Applied Materials, Inc. |
| 19082746 | SUBSTRATE PROCESSING APPARATUS, NOZZLE, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | Non-Final OA | KOKUSAI ELECTRIC CORPORATION |
| 18521813 | POLISHING APPARATUS | Final Rejection | EBARA CORPORATION |
| 18458866 | SUBSTRATE PROCESSING APPARATUS AND PROTECTIVE LAYER FORMING METHOD | Final Rejection | Ebara Corporation |
| 17522897 | SYSTEM FOR PROCESSING SUBSTRATE | Non-Final OA | EUGENE TECHNOLOGY CO., LTD. |
| 18381647 | PROCESSING APPARATUS AND PROCESSING METHOD | Non-Final OA | United Semiconductor (Xiamen) Co., Ltd. |
| 18394198 | APPARATUS AND METHOD FOR TREATING SUBSTRATE | Final Rejection | SEMES CO., LTD. |
| 18507065 | FOCUS RING INSPECTION DEVICE AND FOCUS RING INSPECTION METHOD | Non-Final OA | SEMES CO., LTD. |
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