Listed by the USPTO as LE, JOHN H
Tech Center 2800 • Art Units: 2117 2835 2857 2862 2863
This examiner grants 88% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18703642 | SYSTEM AND METHOD FOR MULTIDIMENSIONAL DECONVOLUTION | Non-Final OA | Schlumberger Technology Corporation |
| 18810605 | MEDICAL INFORMATION DISPLAY CONTROL APPARATUS, MEDICAL INFORMATION CONTROL METHOD, AND X-RAY DIAGNOSIS SYSTEM | Non-Final OA | Canon Kabushiki Kaisha |
| 18285130 | INFORMATION PROCESSING METHOD, INFORMATION PROCESSING APPARATUS, AND PROGRAM | Final Rejection | Sony Group Corporation |
| 18741198 | Slave BMS Inspection System and Method | Non-Final OA | LG Energy Solution, Ltd. |
| 18837426 | Permittivity Measurement Method, Permittivity Measurement System, Permittivity Measurement Program | Non-Final OA | Nippon Telegraph and Telephone Corporation |
| 18682677 | Method for Monitoring Temperature, Electrical Energy Storage System and at Least Partially Electric Vehicle | Non-Final OA | Mercedes-Benz Group AG |
| 18554900 | METHOD FOR MONITORING THE USE OF A METHANE INHIBITOR | Final Rejection | DSM IP ASSETS B.V. |
| 18248281 | IMPROVEMENTS TO QUANTUM ENTANGLEMENT GENERATION | Non-Final OA | BRITISH TELECOMMUNICATIONS PUBLIC LIMITED COMPANY |
| 17980394 | HCI WORKLOAD SIMULATION | Non-Final OA | Dell Products L.P. |
| 18603523 | MOTOR DIAGNOSTICS SYSTEMS AND METHODS | Non-Final OA | Schneider Electric USA, Inc. |
| 18039712 | A METHOD OF MONITORING A LITHOGRAPHIC PROCESS | Final Rejection | ASML NETHERLANDS B.V. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy87.7% of resolved applications examined by John H Le were allowed (1,511 resolved cases), compared with 59.5% across Art Unit 2117 over the last five years.
This examiner's interview lift is +7.0 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by John H Le took 920 days on average from filing to allowance.
John H Le examines applications in Art Unit 2117 in Tech Center 2800 (Semiconductors, Circuits & Optics).
