Tech Center 1700 • Art Units: 1732 1752 1759 1794
This examiner grants 30% of resolved cases
Examiner JOHN LEE operates within Tech Center 1700 and Art Unit 1732. The examiner has managed 39 resolved cases. The observed allowance rate is 28.2 percent, reflecting the frequency of patent grants among all applications that reach a final disposition. This percentage serves as a baseline for understanding the current prosecution environment under this examiner in Art Unit 1732.
The median days to allowance is 1502. This value measures the typical time from the initial filing of an application to the eventual issuance of a patent. Practitioners can use the 1502 days figure to estimate the duration of the examination phase. This timeline is a critical factor for strategic planning for cases assigned to Tech Center 1700.
An interview lift of 23.0 percent is recorded for this profile. This metric indicates the difference in allowance outcomes between cases that included an interview and those that did not. A lift of 23.0 percent suggests that direct engagement with the examiner is a factor in the probability of a grant. With 39 resolved cases, these data points provide a factual summary of the examiner's historical performance.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 17907767 | POLYGONAL CONTINUOUS FLOW REACTOR FOR PHOTOCHEMICAL PROCESSES | Final Rejection | SIGNIFY HOLDING B.V. |
| 17925638 | LIGHTING DEVICE FOR PROVIDING LIGHT TO BE USED IN A PHOTOCHEMICAL REACTION | Non-Final OA | BASF SE |
| 18800246 | SYSTEMS AND METHODS FOR WATER ELECTROLYSIS WITH ELECTRODES HAVING NICKEL-COBALT-PHOSPHOROUS-BASED COMPOUNDS | Final Rejection | HONEYWELL INTERNATIONAL INC. |
| 17165726 | SYSTEMS AND METHODS FOR PROCESSING MATERIALS WITH COMPLEX ISOTOPE VECTORS FOR USE AS A NUCLEAR FUEL | Non-Final OA | Westinghouse Electric Company LLC |
| 17762924 | Liquid Flow Formation Method and Object Moving Method Using Same | Non-Final OA | The Doshisha |
| 17601271 | MICROWAVE PYROLYSIS REACTOR | Final Rejection | Pyrowave Inc. |
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