Prosecution Insights
Last updated: October 27, 2026

Eliza W Osenbaugh-Stewart, USPTO Patent Examiner

Listed by the USPTO as OSENBAUGH-STEWART, ELIZA W

Tech Center 2800 • Art Units: 2881 2896

This examiner grants 73% of resolved cases

Analysis

OSENBAUGH-STEWART, ELIZA W is assigned to Tech Center 2800 and Art Unit 2881. The profile includes 690 resolved cases and an allowance rate of 73.0%. The median time to allowance is 925 days. Interview lift is 16.8%, which indicates a positive relationship between interviews and allowance outcomes in the recorded cases.

The company list includes ASML Holding N.V., Hitachi Ltd., and Dh Technologies Development Pte. Ltd. The firms appearing most often are CROWELL & MORING LLP, GOODWIN PROCTER LLP, and Troutman Pepper Locke LLP. For practitioners, the data supports attention to interview strategy, while the median duration provides a concrete timing consideration for portfolio planning.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

73.0%
Allow Rate
+5.0% vs TC avg
742
Total Applications
+16.8%
Interview Lift
925
Avg Prosecution Days
Based on 690 resolved cases, 2023–2026

Rejection Statute Breakdown

3.4%
§101 Eligibility
18.4%
§102 Novelty
47.8%
§103 Obviousness
25.7%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18622598 NONDESTRUCTIVE DETERMINATION OF COATING MATERIAL COMPOSITION Non-Final OA The Boeing Company
18606289 GRID-LESS ION ENERGY DETECTOR Final Rejection Tokyo Electron Limited
18267281 HIGH-FREQUENCY ENHANCED ELECTROCHEMICAL STRAIN MICROSCOPE AND HIGH-FREQUENCY ENHANCED ELECTROCHEMICAL STRAIN MICROSCOPY USING THE SAME Final Rejection TOHOKU UNIVERSITY
18843158 Analysis System, Analysis Method, and Analysis Program Non-Final OA Hitachi High-Tech Corporation
18034929 Vacuum Treatment Apparatus and Vacuum Treatment Method Final Rejection Hitachi High-Tech Corporation
16887885 Charged Particle Beam System and Overlay Shift Amount Measurement Method Non-Final OA Hitachi High-Tech Corporation
18374531 INVERTING IMPLANTER PROCESS MODEL FOR PARAMETER GENERATION Final Rejection Applied Materials, Inc.
18845206 VACUUM CHAMBER SYSTEM INCLUDING TEMPERATURE CONDITIONING PLATE Non-Final OA ASML Netherlands B.V.
18064110 REPLACEABLE MODULE FOR A CHARGED PARTICLE APPARATUS Non-Final OA ASML Netherlands B.V.
17798538 CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD Non-Final OA ASML NETHERLANDS B.V.
17794435 CHARGED PARTICLE MANIPULATOR DEVICE Non-Final OA ASML NETHERLANDS B.V.
18098215 METHOD AND DEVICE FOR DETERMINING AN ALIGNMENT OF A PHOTOMASK ON A SAMPLE STAGE WHICH IS DISPLACEABLE ALONG AT LEAST ONE AXIS AND ROTATABLE ABOUT AT LEAST ONE AXIS Non-Final OA Carl Zeiss SMT GmbH
18845161 OSCILLATION DEVICE, OSCILLATION SYSTEM, EXTRACTION/IONIZATION SYSTEM, MASS SPECTROMETRY SYSTEM, AND OSCILLATION METHOD Non-Final OA OSAKA UNIVERSITY
18538840 VACUUM SYSTEM FOR A MASS SPECTROMETER Final Rejection Thermo Finnigan LLC
18468892 CONDITIONAL OPERATIONS IN QUANTUM OBJECT CONFINEMENT APPARATUS USING BROADCASTED CONTROL VOLTAGE SIGNALS Final Rejection Quantinuum LLC

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Frequently Asked Questions

What is examiner Eliza W Osenbaugh-Stewart's allowance rate?

73.0% of resolved applications examined by Eliza W Osenbaugh-Stewart were allowed (690 resolved cases), compared with 69.6% across Art Unit 2881 over the last five years.

Does an interview help with examiner Eliza W Osenbaugh-Stewart?

This examiner's interview lift is +16.8 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.

How long does examiner Eliza W Osenbaugh-Stewart take to allow a patent?

Applications allowed by Eliza W Osenbaugh-Stewart took 925 days on average from filing to allowance.

Which art unit does examiner Eliza W Osenbaugh-Stewart work in?

Eliza W Osenbaugh-Stewart examines applications in Art Unit 2881 in Tech Center 2800 (Semiconductors, Circuits & Optics).

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