Listed by the USPTO as PAGE, STEVEN MITCHELL CHR
Tech Center 4100 • Art Units: 2812 4100
This examiner grants 84% of resolved cases
Steven Mitchell Chr. Page works in Tech Center 4100 and art unit 2812. His record covers 466 resolved cases, with an 83.7% allowance rate and a median of 840 days to allowance. The data provides a meaningful basis for evaluating a docket with frequent allowance outcomes and a defined prosecution timeline.
The recorded interview lift is 8.8%, indicating that interviews have a limited associated effect relative to the overall allowance result. Samsung Electronics Co., Ltd., Applied Materials Inc., and Sony Group Corporation are the leading companies. The leading firms are NORTH AMERICA INTELLECTUAL PROPERTY CORPORATION, Barron & Young PLLC, and CHIP LAW GROUP. Counsel may concentrate on precise written responses while using interviews for targeted clarification.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18816236 | SEMICONDUCTOR DEVICE INCLUDING ACTIVE PATTERN AND CONDUCTIVE PAD PATTERN | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18746308 | IMAGE SENSOR AND METHOD OF FABRICATING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18425196 | SEMICONDUCTOR DEVICES | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18854903 | SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND ELECTRONIC APPARATUS | Non-Final OA | SONY SEMICONDUCTOR SOLUTIONS CORPORATION |
| 18780788 | METHOD OF MANUFACTURING AN ELECTRONIC COMPONENT | Non-Final OA | Commissariat à l'Énergie Atomique et aux Énergies Alternatives |
| 18076130 | LINED CONDUCTIVE STRUCTURES FOR TRENCH CONTACT | Non-Final OA | Intel Corporation |
| 18630206 | Tapered Superjunction with Ultrathin P-Type Material Layer | Non-Final OA | Applied Materials, Inc. |
| 18590102 | METHODS OF FORMING LOW RESISTIVITY FILMS USING Microwave treatment | Non-Final OA | Applied Materials, Inc. |
| 18784638 | NOVEL MIM STRUCTURE | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18631791 | SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME | Final Rejection | NANYA TECHNOLOGY CORPORATION |
| 18706010 | 3D FLASH MEMORY AND MANUFACTURING METHOD THEREOF | Non-Final OA | IUCF-HYU (Industry-University Cooperation Foundation Hanyang University) |
| 18780504 | CONTACT STRUCTURE, CONTACT PAD LAYOUT AND STRUCTURE, MASK COMBINATION AND MANUFACTURING METHOD THEREOF | Non-Final OA | Fujian Jinhua Integrated Circuit Co., Ltd. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy83.7% of resolved applications examined by Steven Mitchell Chr Page were allowed (466 resolved cases), compared with 82.1% across Art Unit 2812 over the last five years.
This examiner's interview lift is +8.8 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Steven Mitchell Chr Page took 840 days on average from filing to allowance.
Steven Mitchell Chr Page examines applications in Art Unit 2812 in Tech Center 4100.
