Listed by the USPTO as ROLLAND, ALEX A
Tech Center 3600 • Art Units: 1712 1759 1784 1792 1794 1796 2893 3653
This examiner grants 48% of resolved cases
ROLLAND, ALEX A is assigned to tech center 3600 and art unit 1712. The record includes 616 resolved cases, a 47.7% allowance rate, and a median of 1366 days to allowance. The 27.0% interview lift indicates a strong association between interviews and allowance outcomes in this profile.
The listed companies are Applied Materials Inc., ASM IP Holding B.V., and Tokyo Electron Limited. The listed firms are Snell & Wilmer (ASM IP Holding B.V.), VOLPE KOENIG, and CANTOR COLBURN LLP-BAKER HUGHES OILFIELD. Applicants should anticipate extended prosecution based on the median timing and consider interviews early enough to address the issues reflected in the allowance pattern.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18900571 | SELECTIVE DEPOSITION OF INHIBITOR MATERIAL AND DEPOSITION ASSEMBLIES | Non-Final OA | ASM IP Holding B.V. |
| 18149700 | METHODS FOR FORMING A SEMICONDUCTOR STRUCTURE INCLUDING A DIPOLE LAYER | Non-Final OA | ASM IP Holding B.V. |
| 18232466 | DEPOSITION OF ETC MATERIALS ONTO SUBSTRATES VIA INKJET PRINTING | Non-Final OA | CORNING INCORPORATED |
| 19351692 | METHOD OF DEPOSITING FILM | Non-Final OA | Tokyo Electron Limited |
| 19093922 | METHOD FOR OPERATING FILM FORMING DEVICE AND FILM FORMING DEVICE | Final Rejection | Tokyo Electron Limited |
| 18569248 | METAL-CONTAINING FILM AND METHOD FOR PRODUCING METAL-CONTAINING FILM | Final Rejection | Tokyo Electron Limited |
| 19349960 | SELECTIVE DEPOSITION METHOD OF THIN FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | Hongik University Industry-Academia Cooperation Foundation |
| 19103609 | METHOD FOR FORMING MULTILAYERED COATING FILM | Non-Final OA | KANSAI PAINT CO., LTD. |
| 19051679 | HIGH DENSITY AMORPHOUS CARBON FILM WITH REDUCED HYDROGEN CONTENT | Non-Final OA | Applied Materials, Inc. |
| 18378828 | OLIGOMER FILM FOR BOTTOM-UP GAP FILL PROCESSES | Final Rejection | Applied Materials, Inc. |
| 18337294 | FORMING OPTICAL DEVICE USING MIXED-PARTICLE LAYER | Non-Final OA | Applied Materials, Inc. |
| 18336157 | METHOD FOR FORMATION OF CONFORMAL ALD SIO2 FILMS | Final Rejection | Applied Materials, Inc. |
| 18093156 | PLASMA-ENHANCED MOLYBDENUM DEPOSITION | Non-Final OA | Applied Materials, Inc. |
| 18564975 | ENGINEERED WOOD ADHESIVES AND ENGINEERED WOOD PRODUCT THEREFROM | Non-Final OA | CARGILL, INCORPORATED |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy47.7% of resolved applications examined by Alex A Rolland were allowed (616 resolved cases), compared with 43.3% across Art Unit 1712 over the last five years.
This examiner's interview lift is +27.0 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Alex A Rolland took 1,366 days on average from filing to allowance.
Alex A Rolland examines applications in Art Unit 1712 in Tech Center 3600 (Transportation, E-Commerce & Mechanical Systems).
