Listed by the USPTO as TALBOT, BRIAN K
Tech Center 2800 • Art Units: 1712 1715 1717 1764 1784 1788 1792 1794 1795 2893
This examiner grants 59% of resolved cases
TALBOT, BRIAN K is assigned to tech center 2800 and art unit 1712. The profile includes 1185 resolved cases, an allowance rate of 59.2%, and a median of 1212 days to allowance. The interview lift is 30.9%, showing that interview activity is associated with a meaningful shift in the observed results.
Applied Materials Inc., LG Energy Solution Ltd., and Canon Inc. are the leading companies in the profile. The leading firms are BIRCH STEWART KOLASCH & BIRCH, LLP, BakerHostetler, and BENNETT JONES LLP. The large resolved-case record supports using these figures as a broad prosecution reference, while the median timing suggests that applicants should budget for extended pendency before allowance.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19063033 | VAPOR DEPOSITION MASK AND METHOD FOR MANUFACTURING ORGANIC ELECTRONIC DEVICE | Final Rejection | CANON KABUSHIKI KAISHA |
| 18456066 | SOLID-STATE ELECTROLYTE AND PREPARATION METHOD THEREOF, AND SECONDARY BATTERY | Final Rejection | HUAWEI TECHNOLOGIES CO., LTD. |
| 18786895 | METHOD, SYSTEM AND APPARATUS FOR TREATING SUBSTRATE SURFACE | Non-Final OA | ASM IP Holding B.V. |
| 18290046 | BATTERY PACK | Final Rejection | LG ENERGY SOLUTION, LTD. |
| 18287628 | BATTERY PACK CONFIGURED SUCH THAT SELECTIVE SEPARATION OF BATTERY MODULES IS POSSIBLE | Final Rejection | LG ENERGY SOLUTION, LTD. |
| 18196904 | NEGATIVE ELECTRODE SHEET OF SODIUM-ION BATTERY, ELECTROCHEMICAL APPARATUS AND ELECTRONIC DEVICE | Non-Final OA | CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED |
| 18263740 | METHOD FOR FORMING POSITIVE ELECTRODE ACTIVE MATERIAL AND SECONDARY BATTERY AND VEHICLE | Final Rejection | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
| 18539451 | FILM FORMING METHOD AND FILM FORMING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 19208337 | CYCLIC PLASMA AND THERMAL PROCESS TO IMPROVE PECVD TI SILICIDE DEPOSITION SELECTIVITY | Non-Final OA | Applied Materials, Inc. |
| 19070718 | METHODS OF DEPOSITING SILICON NITRIDE | Final Rejection | Applied Materials, Inc. |
| 18272438 | Deposition Of Piezoelectric Films | Non-Final OA | Applied Materials, Inc. |
| 17819982 | SYSTEM FOR PROCESSING SEMICONDUCTOR DEVICE, METHOD FOR FORMING SEMICONDUCTOR DEVICE, AND METHOD FOR FORMING PROTECTIVE STRUCTURE ON CHAMBER | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 19053587 | METHOD AND ARRANGEMENT FOR APPLYING A COATING TO A BEARING COMPONENT | Non-Final OA | AKTIEBOLAGET SKF |
| 18729241 | SURFACE-TREATED GAS BARRIER FILM | Non-Final OA | Stora Enso OYJ |
| 17876540 | SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE | Final Rejection | SCREEN Holdings Co., Ltd. |
| 18910065 | METHOD OF COATING A CATALYST ON FLAT OR TEXTURED SUBSTRATES | Final Rejection | JOHNSON MATTHEY PUBLIC LIMITED COMPANY |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy59.2% of resolved applications examined by Brian K Talbot were allowed (1,185 resolved cases), compared with 43.3% across Art Unit 1712 over the last five years.
This examiner's interview lift is +30.9 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Brian K Talbot took 1,212 days on average from filing to allowance.
Brian K Talbot examines applications in Art Unit 1712 in Tech Center 2800 (Semiconductors, Circuits & Optics).
