Listed by the USPTO as TRAN, TIEN
Tech Center 2800 • Art Units: 2812
This examiner grants 90% of resolved cases
TRAN, TIEN is assigned to Tech Center 2800 and Art Unit 2812. The profile contains 29 resolved cases, an 89.7% allowance rate, and a 14.3% interview lift. The median time to allowance is 1155 days. The limited record warrants caution in applying the figures broadly, but it reports a high allowance outcome and a measurable interview effect that may guide case-specific planning.
Samsung Electronics Co., Ltd., Samsung Display Co., Ltd., and Qualcomm Incorporated are the leading companies. The listed firms are HARNESS, DICKEY & PIERCE, P.L.C., NORTH AMERICA INTELLECTUAL PROPERTY CORPORATION, and Arch & Lake LLP. Counsel may emphasize technically precise written responses and use interviews where they can efficiently clarify claim scope.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18671541 | SEMICONDUCTOR PACKAGES HAVING TRENCH STRUCTURES | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18435016 | SEMICONDUCTOR CHIP AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME | Final Rejection | Samsung Electronics Co., Ltd. |
| 18799684 | DISPLAY DEVICE | Non-Final OA | LG Display Co., Ltd. |
| 18668614 | METHOD OF TRANSFERRING LIGHT EMITTING ELEMENT USING STRETCHING DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 17987640 | MASK FRAME ASSEMBLY AND METHOD OF MANUFACTURING DISPLAY APPARATUS BY USING THE SAME | Final Rejection | Samsung Display Co., Ltd. |
| 18824706 | GATE-ALL-AROUND FIELD EFFECT TRANSISTOR STRUCTURES | Non-Final OA | QUALCOMM Incorporated |
| 18469496 | GATE-ALL-AROUND FIELD EFFECT TRANSISTOR STRUCTURES | Non-Final OA | QUALCOMM Incorporated |
| 17561733 | 3D ARRAYED GLASS-BASED MMWAVE AND THZ STRUCTURES | Non-Final OA | Intel Corporation |
| 18889802 | ELECTRONIC DEVICE | Non-Final OA | InnoLux Corporation |
| 18295156 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF | Non-Final OA | SK hynix Inc. |
| 18538105 | MEMS SENSOR AND METHOD OF MANUFACTURING MEMS SENSOR | Final Rejection | ROHM CO., LTD. |
| 18411226 | STRUCTURE AND FORMATION METHOD OF SEMICONDUCTOR DEVICE WITH GATE STACK | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18408944 | TRANSISTOR STRUCTURE WITH HIGHER JUNCTION BREAKDOWN VOLTAGE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, LTD. |
| 18395789 | MOTHER SUBSTRATE FOR DISPLAY DEVICE, DISPLAY DEVICE AND MANUFACTURING METHOD OF DISPLAY DEVICE | Final Rejection | Magnolia White Corporation |
| 18797441 | CERAMIC SUBSTRATE, LIGHT SOURCE DEVICE, METHOD OF MANUFACTURING CERAMIC SUBSTRATE, AND METHOD OF MANUFACTURING LIGHT SOURCE DEVICE | Non-Final OA | NICHIA CORPORATION |
| 18821978 | CELL ARRANGEMENT FOR SEMICONDUCTOR DEVICE LAYOUT | Non-Final OA | Arm Limited |
| 18075383 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | Final Rejection | UNITED MICROELECTRONICS CORP. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy89.7% of resolved applications examined by Tien Tran were allowed (29 resolved cases), compared with 82.1% across Art Unit 2812 over the last five years.
This examiner's interview lift is +14.3 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Tien Tran took 1,155 days on average from filing to allowance.
Tien Tran examines applications in Art Unit 2812 in Tech Center 2800 (Semiconductors, Circuits & Optics).
