Technology areas: Chemistry & Materials • Semiconductors, Circuits & Optics
5 pending office actions • 1 client • 5 examiners • 3 art units • 0 of 5 (0%) have an AI response strategy ready • 32 patents granted in the last 365 days
Foley & Lardner LLP - Tokyo Electron has 4 pending office actions in Chemistry & Materials. The profile also reports 117079 career applications, a resolved allowance rate of 87.01%, and an average of 3.23 office actions per allowance.
The historical application and outcome measures are reported at the profile level, while the pending docket is specific to the Tokyo Electron designation. Practitioners should accordingly use the allowance rate and action average as broader firm-level context, not as client-specific performance measures. The current pending workload is limited in the listed technology area, but the historical record is extensive.
Based on the USPTO statutory response window for each pending office action. 2 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 3 (60%) |
| §112 only | 1 (20%) |
| Multi-statute (no §101) | 1 (20%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| DUCLAIR, STEPHANIE P. | 1 | 72.3% | +19.6% |
| LAOBAK, ANDREW KEELAN | 1 | 75.8% | +34.7% |
| PHAM, THOMAS T | 1 | 51.5% | +15.8% |
| PATEL, REEMA | 1 | 88.8% | +6.5% |
| BAIG, ANEESA RIAZ | 1 | 91.8% | +10.3% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17893736 | METHOD OF MAKING A PLURALITY OF 3D SEMICONDUCTOR DEVICES WITH ENHANCED MOBILITY AND CONDUCTIVITY | BAIG, ANEESA RIAZ | 145d overdue |
| 18373098 | SHIFTED MULTI-VIA CONNECTION FOR HYBRID BONDING | PATEL, REEMA | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18607202 | HARC ETCH CHEMISTRY FOR SEMINCONDUCTORS | LAOBAK, ANDREW KEELAN | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 4 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17893736 | METHOD OF MAKING A PLURALITY OF 3D SEMICONDUCTOR DEVICES WITH ENHANCED MOBILITY AND CONDUCTIVITY | BAIG, ANEESA RIAZ | 145d overdue |
| 18433320 | DIRECT CURRENT SUPERPOSITION (DCS) FOR PROTECTION OF ORGANIC MANDREL DURING SPACER DEPOSITION | PHAM, THOMAS T | 27d |
| 18781793 | ETCHING SYSTEM FOR FORMING RECESSED FEATURES WITH HIGH ASPECT RATIO | DUCLAIR, STEPHANIE P. | — |
| 18607202 | HARC ETCH CHEMISTRY FOR SEMINCONDUCTORS | LAOBAK, ANDREW KEELAN | — |
| Client (Assignee) | Pending OAs |
|---|---|
| Tokyo Electron | 5 |
| Art Unit | Apps |
|---|---|
| 1713 | 3 |
| 2812 | 1 |
| 2814 | 1 |
| App # | Title | Client | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|---|
| 18781793 | ETCHING SYSTEM FOR FORMING RECESSED FEATURES WITH HIGH ASPECT RATIO | Tokyo Electron Limited | DUCLAIR, STEPHANIE P. | 1713 | §103 | Non-Final OA | — | Pending | Jul 23, 2024 |
| 18607202 | HARC ETCH CHEMISTRY FOR SEMINCONDUCTORS | Tokyo Electron Limited | LAOBAK, ANDREW KEELAN | 1713 | §102§103 | Final Rejection | — | Pending | Mar 15, 2024 |
| 18433320 | DIRECT CURRENT SUPERPOSITION (DCS) FOR PROTECTION OF ORGANIC MANDREL DURING SPACER DEPOSITION | Tokyo Electron Limited | PHAM, THOMAS T | 1713 | §103 | Final Rejection | 27d | Pending | Feb 05, 2024 |
| 18373098 | SHIFTED MULTI-VIA CONNECTION FOR HYBRID BONDING | Tokyo Electron Limited | PATEL, REEMA | 2812 | §103 | Final Rejection | — | Pending | Sep 26, 2023 |
| 17893736 | METHOD OF MAKING A PLURALITY OF 3D SEMICONDUCTOR DEVICES WITH ENHANCED MOBILITY AND CONDUCTIVITY | Tokyo Electron Limited | BAIG, ANEESA RIAZ | 2814 | §112 | Final Rejection | 145d overdue | Pending | Aug 23, 2022 |
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Start Free Trial87.0% of resolved applications prosecuted by Foley & Lardner LLP - Tokyo Electron were allowed, across 117,079 applications in USPTO records.
3.23 office actions per allowed application on average.
5 pending office actions as of October 2026, for 1 client, before 5 examiners in 3 art units.
