Prosecution Insights
Prosecution Insights
Technology areas: Chemistry & Materials • Semiconductors, Circuits & Optics • Medical Devices & Mechanical Engineering
4 pending office actions • 3 art units • 4 examiners • 0 of 4 (0%) have an AI response strategy ready • 6 patents granted in the last 365 days
Beijing E-Town Semiconductor Technology Co., Ltd. has 4 pending office actions in the Medical Devices & Mechanical Engineering technology area. These actions are distributed across 3 distinct art units, indicating a varied technical focus within the mechanical field. The prosecution involves 4 distinct examiners, meaning each of the 4 pending office actions is being handled by a different person. This spread across 3 distinct art units suggests that the company's innovations are being evaluated by several different technical divisions at the USPTO.
ROST, ANDREW J is the busiest examiner with 1 pending office action. Since there are 4 distinct examiners for the 4 pending office actions, the company must manage four separate examiner relationships. This distribution across 3 distinct art units ensures that the company's prosecution experience is relatively decentralized. The legal team should focus on the individual tendencies of these 4 distinct examiners to optimize outcomes across the 3 distinct art units.
Based on the USPTO statutory response window for each pending office action. 1 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 3 (75%) |
| Multi-statute (no §101) | 1 (25%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| ROST, ANDREW J | 1 | 65.6% | +19.9% |
| MILLER, JR, JOSEPH ALBERT | 1 | 68.4% | +16.2% |
| FIN, CAROLYN | 1 | 62.0% | +29.6% |
| CHEN, KEATH T | 1 | 30.2% | +24.7% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18934952 | Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid Thermal Activation Process | MILLER, JR, JOSEPH ALBERT | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 4 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18731662 | HEAT TREATMENT APPARATUS AND ACCURATE TEMPERATURE MEASUREMENT METHOD FOR SEMICONDUCTOR WORKPIECE | FIN, CAROLYN | 40d |
| 19135245 | REACTION CHAMBER AND WAFER ETCHING DEVICE | ROST, ANDREW J | — |
| 18934952 | Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid Thermal Activation Process | MILLER, JR, JOSEPH ALBERT | — |
| 17551244 | Directly Driven Hybrid ICP-CCP Plasma Source | CHEN, KEATH T | — |
| Art Unit | Apps |
|---|---|
| 3753 | 1 |
| 2884 | 1 |
| 1716 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19135245 | REACTION CHAMBER AND WAFER ETCHING DEVICE | ROST, ANDREW J | 3753 | §103 | Non-Final OA | — | Pending | Jun 03, 2025 |
| 18934952 | Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid Thermal Activation Process | MILLER, JR, JOSEPH ALBERT | — | §102§103 | Non-Final OA | — | Pending | Nov 01, 2024 |
| 18731662 | HEAT TREATMENT APPARATUS AND ACCURATE TEMPERATURE MEASUREMENT METHOD FOR SEMICONDUCTOR WORKPIECE | FIN, CAROLYN | 2884 | §103 | Non-Final OA | 40d | Pending | Jun 03, 2024 |
| 17551244 | Directly Driven Hybrid ICP-CCP Plasma Source | CHEN, KEATH T | 1716 | §103 | Non-Final OA | — | Pending | Dec 15, 2021 |
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