Prosecution Insights
Prosecution Insights
Technology areas: Chemistry & Materials • Semiconductors, Circuits & Optics
8 pending office actions • 6 art units • 8 examiners • 0 of 8 (0%) have an AI response strategy ready • 5 patents granted in the last 365 days
Mattson Technology Inc. has 7 pending office actions in the Semiconductors, Circuits & Optics technology area. These 7 pending office actions are assigned to 7 distinct examiners. This distribution across 7 distinct examiners indicates that each case is handled by a different individual. The prosecution activity occurs across 6 distinct art units.
LE, TUNG X is the busiest examiner for the company. This examiner is responsible for 1 pending office action. The 1 pending office action is part of the work currently active in the Semiconductors, Circuits & Optics technology area. The 7 distinct examiners and 6 distinct art units provide the technical review for the portfolio.
Practitioners should note the specific requirements of the 7 distinct examiners and 6 distinct art units involved. The 7 pending office actions represent the current volume of ongoing legal work. LE, TUNG X and the other examiners manage the prosecution for the company. The Semiconductors, Circuits & Optics technology area is the focus for these filings.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 3 (38%) |
| §112 only | 1 (12%) |
| Double-patenting only | 1 (12%) |
| Multi-statute (no §101) | 3 (38%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| LE, TUNG X | 1 | 87.0% | +3.3% |
| MYERS, GLENN F | 1 | 77.9% | +18.8% |
| CHIN, EDWARD | 1 | 87.4% | +6.2% |
| MOORE, KARLA A | 1 | 43.1% | +13.6% |
| CHEN, KEATH T | 1 | 30.2% | +24.7% |
| MACARTHUR, SYLVIA | 1 | 65.9% | +25.7% |
| SWEELY, KURT D | 1 | 52.5% | +34.2% |
| KIM, JAY C | 1 | 49.4% | +21.6% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 19287382 | Dual Frequency Matching Circuit for Inductively Coupled Plasma (ICP) Loads | LE, TUNG X | — |
| 18779944 | Rapid Thermal Processing System With Cooling System | CHIN, EDWARD | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 3 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18677456 | Workpiece Processing Apparatus and Methods for the Treatment of Workpieces | MOORE, KARLA A | — |
| 18653280 | METHOD FOR PROCESSING WORKPIECE, PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE | CHEN, KEATH T | — |
| 18390936 | Workpiece Processing Apparatus with Contact Temperature Sensor | MACARTHUR, SYLVIA | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 6 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18802719 | Transfer Apparatus And Processing System | MYERS, GLENN F | — |
| 18677456 | Workpiece Processing Apparatus and Methods for the Treatment of Workpieces | MOORE, KARLA A | — |
| 18653280 | METHOD FOR PROCESSING WORKPIECE, PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE | CHEN, KEATH T | — |
| 18390936 | Workpiece Processing Apparatus with Contact Temperature Sensor | MACARTHUR, SYLVIA | — |
| 18460151 | Temperature Control Using Temperature Control Element Coupled to Faraday Shield | SWEELY, KURT D | — |
| 17489203 | Method For Processing Workpiece, Plasma Processing Apparatus And Semiconductor Device | KIM, JAY C | — |
| Art Unit | Apps |
|---|---|
| 1716 | 3 |
| 2845 | 1 |
| 3652 | 1 |
| 2893 | 1 |
| 1718 | 1 |
| 2815 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19287382 | Dual Frequency Matching Circuit for Inductively Coupled Plasma (ICP) Loads | LE, TUNG X | 2845 | DP | Non-Final OA | — | Pending | Jul 31, 2025 |
| 18802719 | Transfer Apparatus And Processing System | MYERS, GLENN F | 3652 | §103 | Non-Final OA | — | Pending | Aug 13, 2024 |
| 18779944 | Rapid Thermal Processing System With Cooling System | CHIN, EDWARD | 2893 | §103 | Final Rejection | — | Pending | Jul 22, 2024 |
| 18677456 | Workpiece Processing Apparatus and Methods for the Treatment of Workpieces | MOORE, KARLA A | 1716 | §102§103 | Non-Final OA | — | Pending | May 29, 2024 |
| 18653280 | METHOD FOR PROCESSING WORKPIECE, PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE | CHEN, KEATH T | 1716 | §102§103§112 | Final Rejection | — | Pending | May 02, 2024 |
| 18390936 | Workpiece Processing Apparatus with Contact Temperature Sensor | MACARTHUR, SYLVIA | 1716 | §102§103 | Non-Final OA | — | Pending | Dec 20, 2023 |
| 18460151 | Temperature Control Using Temperature Control Element Coupled to Faraday Shield | SWEELY, KURT D | 1718 | §103Other | Final Rejection | — | Pending | Sep 01, 2023 |
| 17489203 | Method For Processing Workpiece, Plasma Processing Apparatus And Semiconductor Device | KIM, JAY C | 2815 | §112 | Non-Final OA | — | Pending | Sep 29, 2021 |
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Start Free TrialMattson Technology Inc. has 8 pending office actions as of October 2026, spread across 6 art units and 8 examiners.
Tung X Le has the most, with 1 of Mattson Technology Inc.'s pending office actions.
Mostly Chemistry & Materials (USPTO Tech Center 1700), based on where its pending office actions are examined.