Tech Center 1700 • Art Units: 1724 1737 1756 1794 1795
This examiner grants 63% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18215916 | SUBSTRATE STAGE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18459587 | DEPOSITION APPARATUS | Non-Final OA | Samsung Display Co., Ltd. |
| 18332895 | MASK FRAME ASSEMBLY, MASK ASSEMBLY AND DEPOSITION APPARATUS INCLUDING MASK ASSEMBLY | Non-Final OA | Samsung Display Co., Ltd. |
| 18303391 | SIDE PUMPING CHAMBER AND DOWNSTREAM RESIDUE MANAGEMENT HARDWARE | Non-Final OA | Applied Materials, Inc. |
| 19170372 | METHOD FOR COATING A SUBSTRATE | Non-Final OA | Carl Zeiss SMT GmbH |
| 18536789 | FILM FORMING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18992549 | DYNAMIC VACUUM SEAL SYSTEM FOR PHYSICAL VAPOR DEPOSITION SPUTTER APPLICATIONS | Final Rejection | TOSOH SMD, INC. |
| 18999547 | SPUTTERING TARGET, METHOD OF BONDING TARGET MATERIAL AND BACKING PLATE, AND METHOD OF MANUFACTURING SPUTTERING TARGET | Non-Final OA | SUMITOMO CHEMICAL COMPANY, LIMITED |
| 18282021 | CONDUCTIVE COOLING OF A LOW TEMPERATURE PEDESTAL OPERATING IN A HIGH TEMPERATURE DEPOSITION SEQUENCE | Non-Final OA | LAM RESEARCH CORPORATION |
| 17433203 | METHOD FOR PRODUCING TARGETS FOR PHYSICAL VAPOR DEPOSITION (PVD) | Final Rejection | Oerlikon Surface Solutions AG, Pfäffikon |
| 16979697 | Sputtering Target and Method for Producing Sputtering Target | Non-Final OA | JX Advanced Metals Corporation |
| 18785683 | METHOD FOR FORMING ROBUST HYDROPHOBIC SURFACES ON STEEL WORKPIECE | Non-Final OA | Nano and Advanced Materials Institute Limited |
| 18274348 | THERMAL LASER EVAPORATION SYSTEM | Non-Final OA | MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E.V. |
| 18726294 | SURFACE TREATMENT APPARATUS | Non-Final OA | Shibaura Machine Co., Ltd. |
| 18690746 | ROTARY CATHODE END BLOCK | Non-Final OA | NCS VACUUM TECHNOLOGY (HEFEI) CO., LTD. |
| 18248405 | AN ATOMIC LAYER DEPOSITION APPARATUS | Final Rejection | BENEQ OY |
| 18258022 | METHOD AND DEVICE FOR CHANGING TEST SUBSTRATES IN A CONTINUOUS-FLOW VACUUM SYSTEM, TREATMENT METHOD, AND CONTINUOUS-FLOW VACUUM SYSTEM | Non-Final OA | Solayer GmbH |
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