Prosecution Insights
Last updated: October 02, 2026

Examiner: BERMAN, JASON

Tech Center 1700 • Art Units: 1724 1737 1756 1794 1795

This examiner grants 64% of resolved cases

Analysis

Jason Berman is an examiner in Tech Center 1700, working within Art Unit 1724. The examiner has handled 923 resolved cases, providing a view of the prosecution style. The allowance rate stands at 63.8 percent, indicating the probability of success for applicants. This 63.8 percent figure serves as the primary benchmark for evaluating the likelihood of a grant on this docket. The 923 resolved cases establish a consistent record of performance.

The interview lift is 21.0 percent, suggesting that formal discussions with the examiner provide a positive benefit. This 21.0 percent lift indicates that an interview can improve the chances of allowance compared to the 63.8 percent baseline. Practitioners should consider this impact when deciding whether to request an interview. The median days to allowance is 1239, which is the typical duration for applications that reach issuance. This 1239 median days to allowance provides a clear expectation for pendency.

The data in Art Unit 1724 shows that the interview lift is 21.0 percent, offering an additional tool for success. The 1239 median days to allowance helps set expectations for the overall timeline in Tech Center 1700. The 63.8 percent allowance rate remains a key metric for evaluating the likelihood of a grant. These metrics offer a data-driven foundation for developing a successful strategy before this examiner and managing client expectations.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

63.8%
Allow Rate
-1.2% vs TC avg
942
Total Applications
+21.0%
Interview Lift
1239
Avg Prosecution Days
Based on 923 resolved cases, 2023–2026

Rejection Statute Breakdown

0%
§101 Eligibility
18.1%
§102 Novelty
64.0%
§103 Obviousness
14.8%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18756872 PLASMA PROCESSING APPARATUS Non-Final OA Samsung Electronics Co., Ltd.
18736317 SUBSTRATE HOLDING UNIT AND SUBSTRATE PROCESSING APPARATUS Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
18672023 SUBSTRATE SUPPORTING UNIT, APPARATUS FOR TREATING SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Non-Final OA Samsung Electronics Co., Ltd.
18282021 CONDUCTIVE COOLING OF A LOW TEMPERATURE PEDESTAL OPERATING IN A HIGH TEMPERATURE DEPOSITION SEQUENCE Final Rejection LAM RESEARCH CORPORATION
18762529 HIGH TEMPERATURE PRECURSOR GAS DELIVERY MANIFOLD Non-Final OA Applied Materials, Inc.
18628349 PLASMA PROCESSING APPARATUS Non-Final OA Tokyo Electron Limited
18536789 FILM FORMING APPARATUS Final Rejection Tokyo Electron Limited
18472815 METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, RECORDING MEDIUM, AND SUBSTRATE PROCESSING APPARATUS Non-Final OA Kokusai Electric Corporation
18215757 MODULES FOR DELIVERY SYSTEMS AND RELATED METHODS Final Rejection ENTEGRIS, INC.

Facing This Examiner?

IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.

Build Your Strategy

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month