Listed by the USPTO as CAMPBELL, NATASHA N.
Tech Center 1700 • Art Units: 1714 1792
This examiner grants 68% of resolved cases
CAMPBELL, NATASHA N. is assigned to tech center 1700 and art unit 1714. Across 849 resolved cases, the allowance rate is 67.8% and the interview lift is 14.4%. The median days to allowance are 1057.
The listed companies are Applied Materials Inc., ASM IP Holding B.V., and LG Energy Solution Ltd. The listed firms are BANNER & WITCOFF, LTD., Dinsmore & Shohl LLP, and HARNESS, DICKEY & PIERCE, P.L.C. The substantial case volume makes the profile useful for planning. Its positive interview lift supports considering interviews alongside written responses when prosecution issues are suitable for discussion.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18904974 | METHODS AND SYSTEMS FOR PREVENTIVE MAINTENANCE OF SEMICONDUCTOR PROCESSING EQUIPMENT | Non-Final OA | ASM IP Holding B.V. |
| 18852771 | Sealing Tool Cleaning Device and Sealing Tool Cleaning Method Using the Same | Non-Final OA | LG Energy Solution, Ltd. |
| 18428526 | AUTOMATED DE-POWDERING OF ADDITIVE MANUFACTURING BUILD | Non-Final OA | General Electric Company |
| 18612375 | Cleaning System | Non-Final OA | Anker Innovations Technology Co., Ltd. |
| 18946110 | SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING DEVICE | Non-Final OA | Tokyo Electron Limited |
| 19070247 | APPARATUS AND METHOD FOR CLEANING SUSCEPTORS WITH PLASMA | Non-Final OA | Applied Materials, Inc. |
| 18647587 | PROCESSING MODULE HAVING A PRIMING SYSTEM | Non-Final OA | Applied Materials, Inc. |
| 18815475 | INDUCTION HEATED FAN FOR DISHWASHER | Final Rejection | Midea Group Co., Ltd. |
| 18901094 | MANUFACTURING METHOD, SUBSTRATE PROCESSING METHOD, AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | SEMES CO., LTD. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy67.8% of resolved applications examined by Natasha N. Campbell were allowed (849 resolved cases), compared with 50.6% across Art Unit 1714 over the last five years.
This examiner's interview lift is +14.4 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Natasha N. Campbell took 1,057 days on average from filing to allowance.
Natasha N. Campbell examines applications in Art Unit 1714 in Tech Center 1700 (Chemistry & Materials).
