Listed by the USPTO as CHIN, EDWARD
Tech Center 3700 • Art Units: 2813 2821 2893 3729
This examiner grants 87% of resolved cases
CHIN, EDWARD works in Tech Center 3700 and Art Unit 2813. The record covers 705 resolved cases, with an 87.4% allowance rate and a median of 890 days to allowance. Interview activity corresponds to a 6.2% lift, providing a positive outcome signal in this profile.
Samsung Display Co., Ltd., BOE Technology Group Co., Ltd., and Texas Instruments Incorporated are the listed leading companies. BIRCH STEWART KOLASCH & BIRCH, LLP, CANTOR COLBURN LLP, and Calfee, Halter & Griswold LLP are the listed leading firms. Practitioners may consider interviews as one component of prosecution strategy.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18807904 | SYSTEM AND METHODS FOR A BACKSIDE PACKAGE ARCHITECTURE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18629799 | SEMICONDUCTOR DEVICE | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18388119 | DISPLAY DEVICE | Final Rejection | LG Display Co., Ltd. |
| 18740133 | DISPLAY DEVICE AND METHOD OF MANUFACTURING THE DISPLAY DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 18652992 | DISPLAY DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE | Final Rejection | Samsung Display Co., LTD. |
| 18731568 | QUANTUM DEVICE AND QUANTUM DEVICE MANUFACTURING METHOD | Non-Final OA | NEC Corporation |
| 18766710 | LIGHT-EMITTING SUBSTRATE AND DISPLAY APPARATUS | Non-Final OA | BOE Technology Group Co., Ltd. |
| 18603999 | ION SENSOR AND METHOD FOR DETECTING SUBSTANCE BEING DETECTED | Final Rejection | DENSO CORPORATION |
| 18921100 | Light-Emitting Element | Non-Final OA | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
| 18623929 | MEMORY DEVICE HAVING 2-TRANSISTOR VERTICAL MEMORY CELL AND SHIELD STRUCTURES | Final Rejection | Micron Technology, Inc. |
| 18731206 | INTEGRATED CIRCUIT LASER MARKING SYSTEM | Non-Final OA | Texas Instruments Incorporated |
| 16808922 | Dicing A Wafer | Non-Final OA | Texas Instruments Incorporated |
| 18791429 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | Non-Final OA | SK hynix Inc. |
| 18649331 | SEMICONDUCTOR DEVICE | Non-Final OA | Rohm Co., Ltd. |
| 18917730 | METHOD TO IMPROVE WAFER EDGE UNIFORMITY | Non-Final OA | Applied Materials, Inc. |
| 18667148 | MICROWAVE PLASMA-ENHANCED DEPOSITION OF SILICON OXIDE | Final Rejection | Applied Materials, Inc. |
| 18789069 | SEMICONDUCTOR DEVICE STRUCTURE WITH DIELECTRIC STRESSOR | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18737239 | METHOD FOR MANUFACTURING LIGHT-EMITTING DEVICE | Non-Final OA | NICHIA CORPORATION |
| 18196144 | PACKAGES WITH A SHORTEST DISTANCE BETWEEN PACKAGE CONNECTORS AND A SEATING PLANE OF AT LEAST 6 MILS | Non-Final OA | Microchip Technology Incorporated |
| 18734480 | HIGH VOLTAGE CAPACITOR ASSEMBLY | Non-Final OA | Allegro MicroSystems, LLC |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy87.4% of resolved applications examined by Edward Chin were allowed (705 resolved cases), compared with 80.3% across Art Unit 2813 over the last five years.
This examiner's interview lift is +6.2 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Edward Chin took 890 days on average from filing to allowance.
Edward Chin examines applications in Art Unit 2813 in Tech Center 3700 (Medical Devices & Mechanical Engineering).
