Prosecution Insights
Last updated: October 26, 2026

Deoram Persaud, USPTO Patent Examiner

Listed by the USPTO as PERSAUD, DEORAM

Tech Center 2800 • Art Units: 2882

This examiner grants 77% of resolved cases

Analysis

Examiner Deoram Persaud has managed 777 resolved cases within Art Unit 2882, maintaining an allowance rate of 77.1 percent. This rate reflects the outcomes for major industry players such as ASML Holding N.V., Applied Materials Inc., and Taiwan Semiconductor Manufacturing Company, Ltd. Practitioners working with this examiner should note the median days to allowance of 1013, which provides a clear timeline for planning prosecution cycles and managing client expectations regarding patent issuance.

Conducting interviews appears to be a productive strategy, as the data shows an interview lift of 11.7 percent. This increase suggests that direct communication may help resolve technical issues more efficiently than written exchanges alone. Top firms like Pillsbury Winthrop Shaw Pittman, LLP, Studebaker Brackett PLLC, and EDELL, SHAPIRO & FINNAN, LLC frequently appear in this examiner's docket, navigating the 1013-day median pendency to reach final dispositions. The combination of a solid allowance rate and a positive interview lift indicates that a proactive approach is beneficial for applicants in Tech Center 2800.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

77.1%
Allow Rate
+9.1% vs TC avg
814
Total Applications
+11.7%
Interview Lift
1013
Avg Prosecution Days
Based on 777 resolved cases, 2023–2026

Rejection Statute Breakdown

3.5%
§101 Eligibility
31.6%
§102 Novelty
47.8%
§103 Obviousness
6.9%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
19049659 INSPECTION OF LITHOGRAPHIC LAYERS AND DYNAMIC DATA VIA INLINE METROLOGY Non-Final OA Applied Materials, Inc.
18942941 GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY Non-Final OA Applied Materials, Inc.
19084239 WIDTH ADJUSTMENT OF EUV RADIATION BEAM Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18889003 PHOTOLITHOGRAPHY APPARATUS AND METHOD OF OPERATING THE SAME Final Rejection Taiwan Semiconductor Manufacturing Company, Ltd.
18835571 DEVICE FOR REPLICATING A MASTER HOLOGRAPHIC OPTICAL ELEMENT WITH VARIABLE ILLUMINATION Final Rejection Carl Zeiss Jena GmbH
19092004 COOLING DEVICE FOR COOLING A POSITION-SENSITIVE COMPONENT OF A LITHOGRAPHY SYSTEM Non-Final OA ASML Netherlands B.V.
19009394 LITHOGRAPHIC APPARATUS AND METHOD Non-Final OA ASML NETHERLANDS B.V
19009546 ABERRATION IMPACT SYSTEMS, MODELS, AND MANUFACTURING PROCESSES Non-Final OA ASML NETHERLANDS B.V.
18876810 METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE Non-Final OA ASML Netherlands B.V.
18870245 SYSTEM, APPARATUS AND METHOD FOR SELECTIVE SURFACE TREATMENT Non-Final OA ASML Netherlands B.V.
18837353 SYSTEMS AND METHODS FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS Non-Final OA ASML NETHERLANDS B.V.
18749556 COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME Final Rejection ASML NETHERLANDS B.V.
18712671 SURROUNDING PATTERN AND PROCESS AWARE METROLOGY Final Rejection ASML NETHERLANDS B.V.
18233263 METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS Non-Final OA ASML NETHERLANDS B.V.

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Frequently Asked Questions

What is examiner Deoram Persaud's allowance rate?

77.1% of resolved applications examined by Deoram Persaud were allowed (777 resolved cases), compared with 72.8% across Art Unit 2882 over the last five years.

Does an interview help with examiner Deoram Persaud?

This examiner's interview lift is +11.7 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.

How long does examiner Deoram Persaud take to allow a patent?

Applications allowed by Deoram Persaud took 1,013 days on average from filing to allowance.

Which art unit does examiner Deoram Persaud work in?

Deoram Persaud examines applications in Art Unit 2882 in Tech Center 2800 (Semiconductors, Circuits & Optics).

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